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Electron beam lithography over topography
Microelectronic Engineering, 1996An investigation of electron beam lithography will be presented to structure resist over a topographical surface of a metallization layer. The investigation shows the influence of different accelerating voltages (2.5 and 20 kV) on resist profiles over topographical steps. Simulation methods are used to illustrate the experimental behaviour.
L. Bauch, U. Jagdhold, M. Böttcher
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1984
Over the past decade, the trend in integrated circuits for computers always has been a doubling of the circuit density every year. To-day’s products have 64.000 memory cells or 700 logic circuits on a 5 × 5 mm2 sized chip. For to-morrow, we can expect 288.000 and 516.000 memory cells or 5000 logic circuits on a chip.
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Over the past decade, the trend in integrated circuits for computers always has been a doubling of the circuit density every year. To-day’s products have 64.000 memory cells or 700 logic circuits on a 5 × 5 mm2 sized chip. For to-morrow, we can expect 288.000 and 516.000 memory cells or 5000 logic circuits on a chip.
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Scanning electron beam lithography
Proceedings, annual meeting, Electron Microscopy Society of America, 1983This paper discusses the role of scanning electron beam lithography in semiconductor microcircuit production and in the experimental fabrication of devices in the laboratory. It also describes the electron optical equipment developed for these applications.Electron beam lithography has found an important place in integrated circuit production through ...
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Multiple scattered electron-beam effect in electron-beam lithography
SPIE Proceedings, 1991The multiple electron beam scattering effect is studied experimentally in an electron optical column. This effect causes a serious problem on the critical dimension of LSI pattern when the whole area of a wafer is exposed to an electron beam. This paper discusses the quantitative analysis and a method of reducing this effect.
Norio Saitou, Teruo Iwasaki, Fumio Murai
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Cell projection electron-beam lithography
SPIE Proceedings, 1994The HL-800D cell-projection e-beam lithography system was developed to meet the need for quarter-micron direct writing. It is the first commercially available cell projection system. Using the original HL-700 series concepts and Hitachi's more than 20 years of experience with HL-series manufacturing, most of the subsystems were redesigned.
Norio Saitou, Yoshio Sakitani
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Nanometric-Scale Electron Beam Lithography
1992Publisher Summary This chapter focuses on electronbeam microlithography. Emphasis is on system design and the various ways of exploiting the interaction between focusing and deflecting fields. A comprehensive comparison of the various approaches is given, as well as a detailed study of the author's own contribution to the field, namely, the swinging ...
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Thermal scanning probe lithography
Nature Reviews Methods Primers, 2022Edoardo Albisetti +2 more
exaly