Alignment verification for electron beam lithography [PDF]
, 2014 Alignment between lithography layers is essential for device fabrication. A minor defect in a single marker can lead to incorrect alignment and this can be the source of wafer reworks.
Anderson +8 more
core +1 more source
Analysis of issues in gate recess etching in the InAlAs/InGaAs HEMT manufacturing process
ETRI Journal, 2023 We have developed an InAlAs/InGaAs metamorphic high electron mobility transistor device fabrication process where the gate length can be tuned within the range of 0.13 μm–0.16 μm to suit the intended application.
Byoung-Gue Min +7 more
doaj +1 more source
Fabrication of Nano-Gapped Single-Electron Transistors for Transport Studies of Individual Single-Molecule Magnets [PDF]
, 2007 Three terminal single-electron transistor devices utilizing Al/Al2O3 gate electrodes were developed for the study of electron transport through individual single-molecule magnets.
Christou, G. +4 more
core +3 more sources
Metrology for electron-beam lithography and resist contrast at the sub-10 nm scale [PDF]
, 2010 Exploring the resolution limit of electron-beam lithography is of great interest both scientifically and technologically. However, when electron-beam lithography approaches its resolution limit, imaging and metrology of the fabricated structures by using
Berggren, Karl K. +5 more
core +1 more source
Surface micromachined membranes for tunnel transducers [PDF]
, 1997 We have developed low-temperature surface micromachining procedures for the fabrication of suspended SiO2/Si3N4 membranes. This fabrication method was integrated with electron beam lithography, anisotropic ion etching, and electroplating to construct ...
George, Thomas +2 more
core +1 more source
Assessment of lithographic process variation effects in InGaAsP annular Bragg resonator lasers [PDF]
, 2004 Optical microresonators based on an annular geometry of radial Bragg reflectors have been designed and fabricated by electron-beam lithography, reactive ion etching, and an epitaxial transfer process. Unlike conventional ring resonators that are based on
DeRose, Guy A. +4 more
core +1 more source
Exploiting atomic layer deposition for fabricating sub-10 nm X-ray lenses
, 2018 Moving towards significantly smaller nanostructures, direct structuring techniques such as electron beam lithography approach fundamental limitations in feature size and aspect ratios.
Belkhou, Rachid +14 more
core +1 more source
Two-dimensional Bragg grating lasers defined by electron-beam lithography [PDF]
, 2006 Two-dimensional Bragg grating (2DBG) lasers with two quarter-wave slip line defects have been designed and fabricated by electron-beam lithography and reactive ion etching.
Choi, John M. +5 more
core +1 more source
Charged particle single nanometre manufacturing
Beilstein Journal of Nanotechnology, 2018 Following a brief historical summary of the way in which electron beam lithography developed out of the scanning electron microscope, three state-of-the-art charged-particle beam nanopatterning technologies are considered. All three have been the subject
Philip D. Prewett +14 more
doaj +1 more source
Nanometer-spaced platinum electrodes with calibrated separation
, 2002 We have fabricated pairs of platinum electrodes with separation between 20 and 3.5 nm. Our technique combines electron beam lithography and chemical electrodeposition. We show that the measurement of the conductance between the two electrodes through the
Gurevich, L. +4 more
core +3 more sources