Results 51 to 60 of about 81,648 (296)

Spectrally Tunable 2D Material‐Based Infrared Photodetectors for Intelligent Optoelectronics

Advanced Functional Materials, EarlyView.
Intelligent optoelectronics through spectral engineering of 2D material‐based infrared photodetectors. Abstract The evolution of intelligent optoelectronic systems is driven by artificial intelligence (AI). However, their practical realization hinges on the ability to dynamically capture and process optical signals across a broad infrared (IR) spectrum.
Junheon Ha, Yingshan Ma, Yong Nam An, Sung‐Un An, Hyeon Hak Jung, Suvi‐Tuuli Varjamo, Jiwon Yoo, Junho Min, Hanvit Kim, Faisal Ahmed, Sang Hoon Chae, Young Min Song, Weiwei Cai, Tawfique Hasan, Zhipei Sun, Dong‐Ho Kang, Hyeon‐Jin Shin, Yunyun Dai, Hoon Hahn Yoon   +18 more
wiley   +1 more source

LITHOGRAPHIC TECHNOLOGIES FOR SUBMICRONIC PATTERNS DESIGN APPLIED IN MICROSENSORS DOMAIN

Nonconventional Technologies Review, 2019
The present article is based on the results of a project that had as main objective to achieve submicronic patterns using different lithography techniques - electron beam lithography and atomic force microscopy lithography. Ways to obtain these patterns
Liliana Laura Badita, Gheorghe Gheorghe, Valentin Gornoava, Aurel Zapciu   +3 more
doaj  

Intra-level mix and match lithography with electron beam lithography and i-line stepper combined with resolution enhancement for structures below the CD-limit

Micro and Nano Engineering, 2023
Herein, an Intra-level Mix & Match approach (ILM&M) was investigated to combine electron beam lithography (EBL) and i-line stepper lithography on the same resist layer.
C. Helke, C.H. Canpolat-Schmidt, G. Heldt, S. Schermer, S. Hartmann, A. Voigt, D. Reuter   +6 more
doaj   +1 more source

Characterization of PECVD Silicon Nitride Photonic Components at 532 and 900 nm Wavelength [PDF]

, 2014
Low temperature PECVD silicon nitride photonic waveguides have been fabricated by both electron beam lithography and 200 mm DUV lithography. Propagation losses and bend losses were both measured at 532 and 900 nm wavelength, revealing sub 1dB/cm ...
Baets, Roel, Chen, C, Claes, Tom, Deshpande, P, Dhakal, Ashim, Du Bois, B, Hasan, M Ul, Helin, P, Jansen, R, Lagae, L, Leyssens, K, Neutens, P, Peyskens, Frédéric, Rottenberg, X, Severi, S, Subramanian, Ananth, Van Dorpe, P   +16 more
core   +2 more sources

Spatiotemporal Plasma–Mediated Laser Fabrication of Ultrahigh‐Aspect‐Ratio Nanochannel Arrays for Vertical Perovskite Nanowire Semiconductor Devices

Advanced Functional Materials, EarlyView.
A spatiotemporal plasma–mediated laser processing approach is developed to fabricate ultrahigh–aspect ratio nanochannel arrays and corresponding perovskite nanowire arrays within transparent materials for optoelectronics devices. The laser‐fabricated nanochannels serve as templates for controlled perovskite infiltration and crystallization, enabling ...
Taijin Wang, Lingfeng Wang, Feng Liu, Gary J. Cheng   +3 more
wiley   +1 more source

Deterministic integration of quantum dots into on-chip multi-mode interference beamsplitters using in-situ electron beam lithography

, 2017
The development of multi-node quantum optical circuits has attracted great attention in recent years. In particular, interfacing quantum-light sources, gates and detectors on a single chip is highly desirable for the realization of large networks.
Bounouar, Samir, Burger, Sven, Heindel, Tobias, Höhne, Theresa, Park, Suk-In, Reitzenstein, Stephan, Rodt, Sven, Ryu, Geun-Hwan, Schall, Johannes, Schnauber, Peter, Song, Jin-Dong   +10 more
core   +2 more sources

Microphotonic parabolic light directors fabricated by two-photon lithography [PDF]

, 2011
We have fabricated microphotonic parabolic light directors using two-photon lithography, thin-film processing, and aperture formation by focused ion beam lithography. Optical transmission measurements through upright parabolic directors 22 μm high and 10 
Atwater, H. A., Atwater, J. H., Garcia de Abajo, J., Kosten, E., Parsons, J., Polman, A., Spinelli, P., Van de Groep, J., Van Lare, C.   +8 more
core   +1 more source

Broadband, Flexible, Skin‐Compatible Carbon Dots/Graphene Photodetectors for Wearable Applications

Advanced Functional Materials, EarlyView.
Broadband, flexible photodetectors integrating nitrogen‐rich carbon dots with single‐layer graphene on plastic substrates are demonstrated. A biocompatible chitosan–glycerol electrolyte enables efficient low‐voltage gating and on‐skin operation. The devices exhibit ultraviolet‐to‐near‐infrared response, mechanical robustness under bending, and verified
Nouha Loudhaief, Petr Rozhin, Ilaria Bertuol, Ali Raza, Leonardo Viti, Subhankar Roy, Enrico Cavarzerani, Luca Sbuelz, Matteo Brilli, Andrea Serinolli, Jacopo Nicoletti, Riccardo Piccoli, Sebastián Castilla, Simone Dal Zilio, Enrique Rodríguez‐Castellón, Miriam Serena Vitiello, Maurizio Selva, Flavio Rizzolio, Alvise Perosa, Giovanni Antonio Salvatore, Domenico De Fazio   +20 more
wiley   +1 more source

Real-time generation of circular patterns in electron beam lithography

Nanotechnology and Precision Engineering
Electron beam lithography (EBL) involves the transfer of a pattern onto the surface of a substrate by first scanning a thin layer of organic film (called resist) on the surface by a tightly focused and precisely controlled electron beam (exposure) and ...
Zhengjie Li, Bohua Yin, Botong Sun, Jingyu Huang, Pengfei Wang, Li Han   +5 more
doaj   +1 more source

Lithographic band gap tuning in photonic band gap crystals [PDF]

, 1996
We describe the lithographic control over the spectral response of three-dimensional photonic crystals. By precise microfabrication of the geometry using a reproducible and reliable procedure consisting of electron beam lithography followed by dry ...
Arbet-Engels, V., Cheng, C. C., Scherer, A., Yablonovitch, E.   +3 more
core   +1 more source