Results 71 to 80 of about 81,648 (296)

Enhancement of superconductivity in NbN nanowires by negative electron-beam lithography with positive resist

, 2017
We performed comparative experimental investigation of superconducting NbN nanowires which were prepared by means of positive-and negative electron-beam lithography with the same positive tone Poly-methyl-methacrylate (PMMA) resist.
A. Kuzmin, A. Semenov, B. Bachowsky, D. Roditchev, D. Yu. Vodolazov, I. Charaev, K. Ilin, Kupriyanov M. Y., Kupriyanov M. Y., M. Siegel, S. Doerner, T. Silbernagel   +11 more
core   +2 more sources

Scalable Thermal Engineering via Femtosecond Laser‐Direct‐Written Phononic Nanostructures

Advanced Functional Materials, EarlyView.
This study demonstrates that femtosecond laser‐induced periodic surface structures (fs‐LIPSS) can function as phononic metasurfaces, reducing thermal conductivity below the plain thin‐film limit. Phonon Monte Carlo analysis reveals that the periodic structures restrict phonon mean free paths.
Hiroki Hamma, Roman Anufriev, Kazuyoshi Fushinobu, Masahiro Nomura, Byunggi Kim   +4 more
wiley   +1 more source

Design and fabrication of densely integrated silicon quantum dots using a VLSI compatible hydrogen silsesquioxane electron beam lithography process

, 2012
Hydrogen silsesquioxane (HSQ) is a high resolution negative-tone electron beam resist allowing for direct transfer of nanostructures into silicon-on-insulator.
A.J. Ferguson, Angus, Averin, Daves, F.M. Alkhalil, Fujishima, Grigorescu, Grigorescu, H. Mizuta, H.M.H. Chong, Hanson, J. Perez-Barraza, Kawata, Kodera, M.K. Husain, N. Lambert, Nishiguchi, Rossi, Word, Y. Tsuchiya, Y.P. Lin, Yamahata   +21 more
core   +1 more source

Reversible writing of high-mobility and high-carrier-density doping patterns in two-dimensional van der Waals heterostructures [PDF]

, 2020
A key feature of two-dimensional materials is that the sign and concentration of their carriers can be externally controlled with techniques such as electrostatic gating.
Crommie, MF, Jiang, L, Kahn, S, Shi, W, Taniguchi, T, Tsai, HZ, Wang, F, Wang, SY, Watanabe, K, Wong, D, Zettl, A   +10 more
core  

Tin‐Oxo Nanocluster Extreme UV Photoresists Equipped with Chemical Features for Atmospheric Stability and High EUV Sensitivity

Advanced Functional Materials, EarlyView.
Fluoroalkyl‐functionalized tin–oxo nanoclusters (N‐TOC6) enable robust pattern formation through ligand crosslinking under EUV exposure without thermal processing. Sn–F coordination mitigates the Lewis acidity of Sn centers, suppressing reactions with airborne molecules and improving post‐exposure pattern stability.
Yejin Ku, Gayoung Kim, Minseung Kim, Hyungju Ahn, Jin‐Kyun Lee, Jiho Kim, Byeong‐Gyu Park, Dohyun Moon, Sangsul Lee, Seohyeon Lee, Yu Ha Jang, Byung Jun Jung, Hyunseok Kim, Changhyeon Lee, Su‐Mi Hur, Ji Young Park, Chawon Koh, Tsunehiro Nishi, Hyun‐Woo Kim   +18 more
wiley   +1 more source

Enhancing the photon-extraction efficiency of site-controlled quantum dots by deterministically fabricated microlenses

, 2017
We report on the realization of scalable single-photon sources (SPSs) based on single site-controlled quantum dots (SCQDs) and deterministically fabricated microlenses.
Fischbach, Sarah, Heindel, Tobias, Kaganskiy, Arsenty, Reitzenstein, Stephan, Rodt, Sven, Strittmatter, Andre   +5 more
core   +1 more source

Switchable Thermal Mid‐IR Conducting Polymer Antenna Arrays

Advanced Functional Materials, EarlyView.
This study presents switchable mid‐infrared plasmonic resonances in PEDOT antenna arrays. Their optical extinction peaks can be reversibly switched ‘OFF’ and ‘ON’ by tuning the polaronic charge carrier concentration via the polymer's redox state, offering modulation of optical responses in the thermal mid‐infrared range including around 10 µm ...
Pravallika Bandaru, Mohammad Shaad Ansari, Suraya Kazi, Dongqing Lin, Alexander Yu Polyakov, Magnus P. Jonsson   +5 more
wiley   +1 more source

Grayscale Lithography and a Brief Introduction to Other Widely Used Lithographic Methods: A State-of-the-Art Review

Micromachines
Lithography serves as a fundamental process in the realms of microfabrication and nanotechnology, facilitating the transfer of intricate patterns onto a substrate, typically in the form of a wafer or a flat surface.
Svetlana N. Khonina, Nikolay L. Kazanskiy, Muhammad A. Butt   +2 more
doaj   +1 more source

Changes in the near edge X-ray absorption fine structure of hybrid organic-inorganic resists upon exposure

, 2018
We report on the near edge X-ray absorption fine structure (NEXAFS) spectroscopy of hybrid organic-inorganic resists. These materials are nonchemically amplified systems based on Si, Zr, and Ti oxides, synthesized from organically modified precursors and
Brigo, Laura, Brusatin, Giovanna, Della Giustina, Gioia, Ekinci, Yasin, Fallica, Roberto, Rösner, Benedikt, Watts, Benjamin   +6 more
core   +1 more source

Patterned Nanomagnetic Films [PDF]

, 2006
Nano-fabrication technologies for realising patterned structures from thin films are reviewed. A classification is made to divide the patterning technologies in two groups namely with and without the use of masks. The more traditional methods as well as
Lodder, J.C.
core   +2 more sources