Magneto-Ellipsometry Investigations of Multilayer Nanofilms of Fe and Co [PDF]
Журнал нано- та електронної фізики, 2013 Spectral ellipsometry technique is demonstrated to be a useful tool for the investigation of optical and magneto-optical parameters of magnetic heterostructures. Ellipsometry parameters ψ, Δ were measured in the range of 350-1000 nm.
A.T. Morchenko +7 more
doaj
Data Acquisition of TiO2 for Optical Material by using Spectroscopic Ellipsometry Technique [PDF]
Engineering and Technology Journal, 2010 An Ellipsometric experimental set up of SOPRA ES4G type with a powerfulWVASE software for the theoretical calculus of the Ellipsometry parameters. TheEllipsometry Technique can determine amplitude and phase information Ψ( and Δ)dependent on wavelength ...
Asad Sabih Mohammad Raouf
doaj +1 more source
Anisotropy, phonon modes, and lattice anharmonicity from dielectric function tensor analysis of monoclinic cadmium tungstate [PDF]
, 2017 We determine the frequency dependence of four independent CdWO$_4$ Cartesian dielectric function tensor elements by generalized spectroscopic ellipsometry within mid-infrared and far-infrared spectral regions.
Knight, S. +3 more
core +3 more sources
Reflectivity from electrochemically protected Nb surfaces
Zaštita Materijala, 2015 Corrosion resistance of fine mechanically polished and electro-polished Nb surfaces were tested by elliposmetric measurements the reflectivity at various angle of incidence.
Irena Mickova
doaj +1 more source
Developments in THz range ellipsometry
, 2013 Ellipsometry is a technique whereby the measurement of the two orthogonal polarization components of light reflected at glancing incidence allows a characterization of the optical properties of a material at a particular frequency.
Armitage, N. P., Neshat, M.
core +1 more source
On circular Bragg regimes in ellipsometry spectra of ambichiral sculptured thin films
, 2013 The generalized ellipsometry formalism is used for a right handed ambichiral sculptured thin film.The amplitude ratios and phase differences of this structure are extracted from the amplitude transmission ratios.
Babaei, F
core +1 more source
Surface disorder production during plasma immersion implantation and high energy ion implantation [PDF]
, 1996 High-depth-resolution Rutherford Backscattering Spectrometry (RBS) combined with channeling technique was used to analyze the surface layer formed during plasma immersion ion implantation (PIII) of single crystal silicon substrates.
El-Sherbiny, M.A. +6 more
core +3 more sources
SYNTHESIS AND INVESTIGATION OF THIN TiO2 FILMS, DOPED WITH COPPER NANOPARTICLES
Вестник Северо-Кавказского федерального университета, 2022 Thin films of titanium dioxide, doped with copper nanoparticles, were synthesized by the method of deposition on the rotating substrate. The obtained films were dried at room temperature and at temperature of TiO2 calcination and studied by ellipsometry,
Aleksander Kravtsov +3 more
doaj
Characterization of highly anisotropic three-dimensionally nanostructured surfaces
, 2013 Generalized ellipsometry, a non-destructive optical characterization technique, is employed to determine geometrical structure parameters and anisotropic dielectric properties of highly spatially coherent three-dimensionally nanostructured thin films ...
Schmidt, Daniel
core +1 more source
Comparative investigation of damage induced by diatomic and monoatomic ion implantation in silicon [PDF]
, 1994 The damaging effect of mono- and diatomic phosphorus and arsenic ions implanted into silicon was investigated by spectroscopic ellipsometry (SE) and high-depth-resolution Rutherford backscattering and channeling techniques.
Fried, M. +9 more
core +3 more sources