Results 21 to 30 of about 24,227 (270)

Argon irradiation effects on the structural and optical properties of reactively sputtered CrN films [PDF]

Science of Sintering, 2015
The present study deals with CrN films irradiated at room temperature (RT) with 200 keV Ar+ ions. The CrN layers were deposited by d.c. reactive sputtering on Si (100) wafers, at nitrogen partial pressure of 5×10-4 mbar, to a total thickness of ...
Novaković M., Popović M., Bibić N.
doaj   +1 more source

Surface and Subsurface Quality Assessment of Polished Lu2O3 Single Crystal Using Quasi-Brewster Angle Technique

Frontiers in Physics, 2021
The sesquioxide Lu2O3 single crystal has attracted tremendous attention as potential host material for high-power solid-state lasers. As polishing is the terminal process of conventional ultra-precision machining, the quality of polished crystal directly
Chengyuan Yao, Wanfu Shen, Wanfu Shen, Xiaodong Hu, Chunguang Hu   +4 more
doaj   +1 more source

Thickness mapping and layer number identification of exfoliated van der Waals materials by Fourier imaging micro-ellipsometry

, 2022
As properties of mono- to few layers of exfoliated van der Waals heterostructures are heavily dependent on their thicknesses, accurate thickness measurement becomes imperative in their study.
Kenji Watanabe (75040), Saptarshi Ghosh (1656340), Ronen Rapaport (1460674), Ralfy Kenaz (14364015), Takashi Taniguchi (331592), Pradheesh Ramachandran (14364018), Hadar Steinberg (2246053)   +6 more
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Ellipsometry, transmission, and photoluminescence characterization of Mn-doped ITO thin films deposited by DC magnetron sputtering

Materials Research Express, 2023
Manganese-doped indium tin oxide (ITO) thin films (0–12.8 at% Mn) were deposited by DC magnetron sputtering. The structural, electrical, and optical properties of the films were studied.
Masoud Kaveh, David Lawrence, Scott Bender, Daniel Hirt, William Riffe, Costel Constantin   +5 more
doaj   +1 more source

Biosensor with Total Internal reflection Imaging Ellipsometry [PDF]

, 2007
In order to monitor multiple protein reaction processes simultaneously, a biosensor based on imaging ellipsometry operated in the total internal reflection mode is proposed.
王战会, 孟永宏, 陈艳艳, Jin, G (reprint author), Chinese Acad Sci, Inst Mech, 15 Beisihuan W Rd, Beijing 100080, Peoples R China.   +3 more
core   +1 more source

Magneto-Ellipsometry Investigations of Multilayer Nanofilms of Fe and Co [PDF]

Журнал нано- та електронної фізики, 2013
Spectral ellipsometry technique is demonstrated to be a useful tool for the investigation of optical and magneto-optical parameters of magnetic heterostructures. Ellipsometry parameters ψ, Δ were measured in the range of 350-1000 nm.
A.T. Morchenko, L.V. Panina, V.G. Kostishyn, N.A. Yudanov, S.P. Kurochka, A.A. Sergienko, R.D. Piliposyan, N.N. Krupa   +7 more
doaj  

Data Acquisition of TiO2 for Optical Material by using Spectroscopic Ellipsometry Technique [PDF]

Engineering and Technology Journal, 2010
An Ellipsometric experimental set up of SOPRA ES4G type with a powerfulWVASE software for the theoretical calculus of the Ellipsometry parameters. TheEllipsometry Technique can determine amplitude and phase information Ψ( and Δ)dependent on wavelength ...
Asad Sabih Mohammad Raouf
doaj   +1 more source

Rotating compensator sampling for spectroscopic imaging ellipsometry [PDF]

, 2011
In this work, a rotating compensator sampling for spectroscopic imaging ellipsometry (SIE) is presented and demonstrated by characterization of a SiO(2) nanofilm pattern on Si substrate.
孟永宏, 靳刚, Jin, G (reprint author), Chinese Acad Sci, Inst Mech, 15 Bei Si Huan W Rd, Beijing 100190, Peoples R China   +2 more
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Spectroscopic ellipsometry and ellipsometric porosimetry studies of CVD low-k dielectric films

, 2022
12531256Aurora ELK, a porous low-k SiCOH film deposited by CVD, was used to study the effect of UV curing. Samples were cured for various curing times and the purpose of this work is to observe the effects of UV curing on optical, mechanical and ...
Verdonck, Patrick, Schneider, Dieter, Kaneko, Shinya, Roest, David de, Marsik, Prokop, Baklanov, Mikhail   +5 more
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Temperature dependent optical constants for SiO2 film on Si substrate by ellipsometry

Materials Research Express, 2017
In situ ellipsometry measurements in the spectra range from 246 to 1000 nm were performed on a SiO _2 /Si system at temperatures varying from 25 to 600 °C.
Junbo Gong, Ruchen Dai, Zhongping Wang, Chuanchao Zhang, Xiaodong Yuan, Zengming Zhang   +5 more
doaj   +1 more source