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Atomic Layer Etching: Rethinking the Art of Etch [PDF]
The Journal of Physical Chemistry Letters, 2018 Atomic layer etching (ALE) is the most advanced etching technique in production today. In this Perspective, we describe ALE in comparison to long-standing conventional etching techniques, relating it to the underlying principles behind the ancient art of etching.
Keren J. Kanarik +2 more
openaire +3 more sources
Overview of atomic layer etching in the semiconductor industry [PDF]
, 2015 Atomic layer etching (ALE) is a technique for removing thin layers of material using sequential reaction steps that are self-limiting. ALE has been studied in the laboratory for more than 25 years.
Keren J. Kanarik +7 more
openalex +2 more sources
Multi-silicon ridge nanofabrication by repeated edge lithography [PDF]
, 2009 We present a multi-Si nanoridge fabrication scheme and its application in nanoimprint\ud lithography (NIL). Triple Si nanoridges approximately 120 nm high and 40 nm wide separated\ud by 40 nm spacing are fabricated and successfully applied as a stamp in ...
Berenschot, J.W. +5 more
core +16 more sources
Valențe artistice și simbolice în creația grafică a lui Gheorghe Vrabie [PDF]
Dialogica: Revistă de Studii Culturale și Literatură, 2021 Master of arts Gheorghe Vrabie is counting among those who played a significant role in the development of the national contemporary school of graphics. He outlined the symbolic identity of the country by elaborating its main attributes – the State Coat
Elena MUSTEAȚĂ
doaj +1 more source
Silicon flower structures by maskless plasma etching
Heliyon, 2023 Silicon nano/microstructures are widely utilized in the semiconductor industry, and plasma etching is the most prominent method for fabricating silicon nano/microstructures.
Geng Zhao +6 more
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Nano-Micro Letters, 2023 Since the discovery in 2011, MXenes have become the rising star in the field of two-dimensional materials. Benefiting from the metallic-level conductivity, large and adjustable gallery spacing, low ion diffusion barrier, rich surface chemistry, superior ...
Pengfei Huang, W. Han
semanticscholar +1 more source
Battery Energy, 2023 MXenes are mentioned in many applications due to their unique properties. However, the traditional etching method has a lengthy synthesis time, dangerous process, and high cost.
Wei Hu +9 more
semanticscholar +1 more source
Ambient‐Stable Two‐Dimensional Titanium Carbide (MXene) Enabled by Iodine Etching
Angewandte Chemie, 2021 MXene (e.g., Ti3C2) represents an important class of two‐dimensional (2D) materials owing to its unique metallic conductivity and tunable surface chemistry.
Huanhuan Shi +8 more
semanticscholar +1 more source
Recent Advances in Reactive Ion Etching and Applications of High-Aspect-Ratio Microfabrication
Micromachines, 2021 This paper reviews the recent advances in reaction-ion etching (RIE) for application in high-aspect-ratio microfabrication. High-aspect-ratio etching of materials used in micro- and nanofabrication has become a very important enabling technology ...
M. Huff
semanticscholar +1 more source
Development of technology for the process of neutralization of pickling solution of metallurgical production [PDF]
Научно-технический вестник Брянского государственного университета, 2016 The leading branch of territorial-production complex of Russia - mechanical engineering. Companies of the industry throw dirt in the form of used organic solvents, toxic compounds of metals with waste galvanic and etching solutions, cutting fluids ...
Lamzina I.V. +2 more
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