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Atomic Layer Etching: Rethinking the Art of Etch [PDF]
The Journal of Physical Chemistry Letters, 2018 Atomic layer etching (ALE) is the most advanced etching technique in production today. In this Perspective, we describe ALE in comparison to long-standing conventional etching techniques, relating it to the underlying principles behind the ancient art of etching.
Keren J. Kanarik +2 more
openaire +4 more sources
Faraday cage angled-etching of nanostructures in bulk dielectrics [PDF]
, 2016 For many emerging optoelectronic materials, heteroepitaxial growth techniques do not offer the same high material quality afforded by bulk, single-crystal growth. However, the need for optical, electrical, or mechanical isolation at the nanoscale level often necessitates the use of a dissimilar substrate, upon which the active device layer stands ...
Burek, Michael J. +3 more
arxiv +3 more sources
Valențe artistice și simbolice în creația grafică a lui Gheorghe Vrabie [PDF]
Dialogica: Revistă de Studii Culturale și Literatură, 2021 Master of arts Gheorghe Vrabie is counting among those who played a significant role in the development of the national contemporary school of graphics. He outlined the symbolic identity of the country by elaborating its main attributes – the State Coat
Elena MUSTEAȚĂ
doaj +1 more source
Multi-silicon ridge nanofabrication by repeated edge lithography [PDF]
, 2009 We present a multi-Si nanoridge fabrication scheme and its application in nanoimprint\ud lithography (NIL). Triple Si nanoridges approximately 120 nm high and 40 nm wide separated\ud by 40 nm spacing are fabricated and successfully applied as a stamp in ...
Berenschot, J.W. +5 more
core +13 more sources
Ambient‐Stable Two‐Dimensional Titanium Carbide (MXene) Enabled by Iodine Etching
Angewandte Chemie, 2021 MXene (e.g., Ti3C2) represents an important class of two‐dimensional (2D) materials owing to its unique metallic conductivity and tunable surface chemistry.
Huanhuan Shi +8 more
semanticscholar +1 more source
Recent Advances in Reactive Ion Etching and Applications of High-Aspect-Ratio Microfabrication
Micromachines, 2021 This paper reviews the recent advances in reaction-ion etching (RIE) for application in high-aspect-ratio microfabrication. High-aspect-ratio etching of materials used in micro- and nanofabrication has become a very important enabling technology ...
M. Huff
semanticscholar +1 more source
Frontiers in Physics, 2022 Helicon plasma sources produce high-density discharges without the need of electrodes in direct contact with the plasma, which is thought to provide them with long operational lifetimes.
Juan I. Del Valle +4 more
doaj +1 more source
A Review: Inductively Coupled Plasma Reactive Ion Etching of Silicon Carbide
Materials, 2021 The inductively coupled plasma reactive ion etching (ICP-RIE) is a selective dry etching method used in fabrication technology of various semiconductor devices.
K. Racka-Szmidt +4 more
semanticscholar +1 more source
Iodide‐Mediated Rapid and Sensitive Surface Etching of Gold Nanostars for Biosensing
Angewandte Chemie, 2021 Iodide‐mediated surface etching can tailor the surface plasmon resonance of gold nanostars through etching of the high‐energy facets of the nanoparticle protrusions in a rapid and sensitive way.
Yunlei Xianyu +5 more
semanticscholar +1 more source
The growth of sapphire single crystals [PDF]
Journal of the Serbian Chemical Society, 2001 Sapphire (Al2O3) single crystals were grown by the Czochralski technique both in air and argon atmospheres. The conditions for growing sapphire single crystals were calculated by using a combination of Reynolds and Grash of numbers.
Golubović Aleksandar +3 more
doaj +3 more sources