Atomic Layer Etching: Rethinking the Art of Etch [PDF]
The Journal of Physical Chemistry Letters, 2018 Atomic layer etching (ALE) is the most advanced etching technique in production today. In this Perspective, we describe ALE in comparison to long-standing conventional etching techniques, relating it to the underlying principles behind the ancient art of etching.
Keren J. Kanarik +2 more
openaire +4 more sources
Multi-silicon ridge nanofabrication by repeated edge lithography [PDF]
, 2009 We present a multi-Si nanoridge fabrication scheme and its application in nanoimprint\ud lithography (NIL). Triple Si nanoridges approximately 120 nm high and 40 nm wide separated\ud by 40 nm spacing are fabricated and successfully applied as a stamp in ...
Berenschot, J.W. +5 more
core +16 more sources
Silicon flower structures by maskless plasma etching
Heliyon, 2023 Silicon nano/microstructures are widely utilized in the semiconductor industry, and plasma etching is the most prominent method for fabricating silicon nano/microstructures.
Geng Zhao +6 more
doaj +1 more source
Nano-Micro Letters, 2023 Since the discovery in 2011, MXenes have become the rising star in the field of two-dimensional materials. Benefiting from the metallic-level conductivity, large and adjustable gallery spacing, low ion diffusion barrier, rich surface chemistry, superior ...
Pengfei Huang, W. Han
semanticscholar +1 more source
Ambient‐Stable Two‐Dimensional Titanium Carbide (MXene) Enabled by Iodine Etching
Angewandte Chemie, 2021 MXene (e.g., Ti3C2) represents an important class of two‐dimensional (2D) materials owing to its unique metallic conductivity and tunable surface chemistry.
Huanhuan Shi +8 more
semanticscholar +1 more source
CHANGES IN VALUES MEASURED WITH A LASER FLUORESCENCE SYSTEM FOR ENAMEL AND DENTIN ETHCED FOR DIFFERNT TIME INTERVALS - pilot study. [PDF]
Journal of IMAB, 2014 Purpose: The aim of the presented in vitro study was to evaluate the effectiveness of the laser fluorescent device DIAGNOdent in measuring changes in the level of mineralization of intact enamel surfaces etched for different time intervals and intact ...
Radostina Anastasova +2 more
doaj +1 more source
Recent Advances in Reactive Ion Etching and Applications of High-Aspect-Ratio Microfabrication
Micromachines, 2021 This paper reviews the recent advances in reaction-ion etching (RIE) for application in high-aspect-ratio microfabrication. High-aspect-ratio etching of materials used in micro- and nanofabrication has become a very important enabling technology ...
M. Huff
semanticscholar +1 more source
A Review: Inductively Coupled Plasma Reactive Ion Etching of Silicon Carbide
Materials, 2021 The inductively coupled plasma reactive ion etching (ICP-RIE) is a selective dry etching method used in fabrication technology of various semiconductor devices.
K. Racka-Szmidt +4 more
semanticscholar +1 more source
A general Lewis acidic etching route for preparing MXenes with enhanced electrochemical performance in non-aqueous electrolyte [PDF]
Nature Materials, 2019 Two-dimensional carbides and nitrides of transition metals, known as MXenes, are a fast-growing family of materials that have attracted attention as energy storage materials.
Youbing Li +18 more
semanticscholar +1 more source
Hard-Templated Porous Niobia Films for Optical Sensing Applications
Photonics, 2023 Porous Nb2O5 films obtained by a modified hard-template method were studied and their optical and sensing properties were optimized in order to find applications in chemo-optical sensing. Porous films were prepared by following three steps: liquid mixing
Venelin Pavlov +4 more
doaj +1 more source