Results 51 to 60 of about 536,254 (376)

Effect of Resin Infiltration and Various Etching Techniques on the Bond Strength of Sound and Demineralized Enamel

European Annals of Dental Sciences, 2023
Purpose: The objective was to assess the effect of various etching techniques on the shear bond strength(SBS) of resin infiltrated sound/ demineralized enamel.
Duygu Tuncer, Zümrüt Ceren Özduman
doaj   +1 more source

Atomic process of oxidative etching in monolayer molybdenum disulfide

, 2017
The microscopic process of oxidative etching of two-dimensional molybdenum disulfide (2D MoS2) at an atomic scale is investigated using a correlative TEM-etching study.
Jin, Chuanhong, Lin, Fang, Lin, Jie, Lv, Danhui, Wang, Hulian, Yin, Guoli, Zhang, Ze, Zhu, Dancheng   +7 more
core   +1 more source

Ultranarrow conducting channels defined in GaAs-AlGaAs by low-energy ion damage [PDF]

, 1987
We have laterally patterned the narrowest conducting wires of two-dimensional electron gas (2DEG) material reported to date. The depletion induced by low-energy ion etching of GaAs-AlGaAs 2DEG structures was used to define narrow conducting channels.
Beebe, E. D., Craighead, H. G., Harbison, J. P., Roukes, M. L., Ruthen, R. M., Scherer, A.   +5 more
core   +1 more source

Fabrication of sharp silicon hollow microneedles by deep-reactive ion etching towards minimally invasive diagnostics

Microsystems & Nanoengineering, 2019
Microneedle technologies have the potential for expanding the capabilities of wearable health monitoring from physiology to biochemistry. This paper presents the fabrication of silicon hollow microneedles by a deep-reactive ion etching (DRIE) process ...
Yan Li, Hang Zhang, Ruifeng Yang, Yohan Laffitte, Ulises Schmill, Wenhan Hu, Moufeed Kaddoura, Eric J. M. Blondeel, B. Cui   +8 more
semanticscholar   +1 more source

Iodide Salt Surface Etching Reduces Energy Loss in CdTe Nanocrystal Solar Cells

Nanomaterials
CdTe nanocrystals (NCs) have emerged as a promising active layer for efficient thin-film solar cells due to their outstanding optical properties and simple processing techniques.
Jielin Huang, Xuyang Wang, Yilin Chen, Zhenyu Chen, Qiaochu Lin, Qichuan Huang, Donghuan Qin   +6 more
doaj   +1 more source

Shear bond strength between porcelain and nano filler composite resin with or without 9% hydrofluoric acid etching

Dental Journal, 2009
Background: Reparation technique on restorations with broken or damaged porcelain which are still attached with the teeth are difficult, because it is very hard to remove the porcelain restoration without damaging it, and it needs a long time.
Kun Ismiyatin
doaj   +1 more source

Evaluation of sample temperature and applied power on degradation of stearic acid in inductively coupled radio frequency plasma [PDF]

Materials Research, 2014
Plasma cleaning is a promising technology in surface treatments, despite technological interest its use is limited because its mechanisms still are not entirely understood.
Carlos Eduardo Farias, José Carlos Bianchi, Paulo Roberto de Oliveira, Paulo César Borges, Euclides Alexandre Bernardelli, Thierry Belmonte, Márcio Mafra   +6 more
doaj   +2 more sources

Manipulating etch selectivities in XeF2 vapour etching [PDF]

, 2021
The vapour etching of silicon sacrificial layers is often a critical process in the fabrication of micro/nanosystems. This method has a number of attractive features, in particular, high etch rates of sacrificial silicon layers and good selectivities associated with photoresist, SiO₂, stoichiometric Si₃N₄ and a number of regularly used metal films ...
Rondé, Markus, Walton, Anthony, Terry, Jonathan   +2 more
openaire   +1 more source

Atomic layer etching of SiO2 with Ar and CHF 3 plasmas: A self-limiting process for aspect ratio independent etching [PDF]

, 2019
With ever increasing demands on device patterning to achieve smaller critical dimensions, the need for precise, controllable atomic layer etching (ALE) is steadily increasing.
Cabrini, S, Cooke, M, Dallorto, S, Goodyear, A, Kastl, C, Rangelow, IW, Schwartzberg, A, Szornel, JE, Ward, C   +8 more
core   +1 more source

Metal etching composition [PDF]

, 1991
The present invention is directed to a chemical etching composition for etching metals or metallic alloys. The composition includes a solution of hydrochloric acid, phosphoric acid, ethylene glycol, and an oxidizing agent.
Foster, Robert E., Otousa, Joseph E., Thomas, Clark S.   +2 more
core   +1 more source