Results 181 to 190 of about 923 (213)
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The Investigation of the Electrolytic Etching Parameters for a Gold Alloy
Practical Metallography, 2005Abstract Goldsmith has been practiced since as early as 4000 BC but the microstructure examination of precious metals is still an enigma to many metallographers. The precious metal industry, historically secretive, was slow to share technology.
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Effects of plasma parameters on etching characteristics with ECR plasma
Microelectronic Engineering, 1989Abstract In order to realize submicron patterns for VLSI devices, it is necessary to form patterns having anisotropic profiles, without damage and contamination. In this paper, we report the results of the study on etching characteristics of poly-Si and parameters of Electron Cyclotron Resonance (ECR) plasma.
K. Nishioka +3 more
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Plasma Etching Parameters Impact To Low-k Damage
ECS Transactions, 2011Mechanical strength of low-k material greatly decreases; material composition change will also give dry etching a lot of problems which have never met before. This paper explores the approaches to solve new problems when plasma etching low-k material, such as avoiding low-k damage and other defects, keeping anisotropic and needed selectivity; finding ...
Jihong Zhang, Huiyuan Pei, LH Cheng
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Parameter optimization for an ICP deep silicon etching system
Microsystem Technologies, 2006The paper aims at investigating the parameter optimization of silicon micro- and nano-sized etching by an inductive coupled plasma-reactive ion etching system. The source power and the SF6 gas pressure are two main parameters that dominate etching.
S. C. Chen +4 more
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On parameter estimation using level sets [plasma etching]
Proceedings of the 1998 American Control Conference. ACC (IEEE Cat. No.98CH36207), 1998Consider the problem of selecting the member of a parametrized family of curves that best matches a given curve. This is a key step in determining proper values for adjustable parameters in low-order plasma etching and deposition models. Level set methods offer several attractive features for treating such problems.
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A generic approach of polishing metals via isotropic electrochemical etching
International Journal of Machine Tools and Manufacture, 2020XinQuan Zhang, Hui Deng, Fengzhou Fang
exaly
Method to change an etch parameter
2022VAN HAREN RICHARD JOHANNES FRANCISCUS +9 more
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Iodide-Mediated Rapid and Sensitive Surface Etching of Gold Nanostars for Biosensing
Angewandte Chemie - International Edition, 2021Alexis Belessiotis-Richards +2 more
exaly
MULTIPLE REFLECTOMETRY FOR MEASURING ETCH PARAMETERS
2022ERICKSON BLAKE +6 more
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