Results 31 to 40 of about 859 (172)

Broadband Mode Converter With Customizable Modal Ratio Leveraging Subwavelength Engineering for Advanced Multimode Silicon Photonics

Laser &Photonics Reviews, EarlyView.
This work introduces a customizable mode converter for multimode silicon photonics, enabling precise control over the conversion ratio between optical modes. The device operates across a broad wavelength range (1350–1700 nm) with 15 distinct conversion levels.
Raquel Fernández de Cabo, Alejandro Sánchez‐Sánchez, Paula Nuño Ruano, Roy Ronald Prosopio Galarza, Daniele Melati, Carlos Alonso‐Ramos, Aitor V. Velasco, David González‐Andrade   +7 more
wiley   +1 more source

Stellar Library of Differential Emission Measures and Extreme Ultraviolet Spectra: Dwarf Stars Observed by the Extreme Ultraviolet Explorer

The Astrophysical Journal
Extreme ultraviolet (EUV; 100–912 Å) photons influence the formation and evolution of planets by ionizing hydrogen and other species, but the EUV radiation of most exoplanet host stars is poorly constrained.
Girish M. Duvvuri, Zachory K. Berta-Thompson, J. Sebastian Pineda, Kevin France, Alexander Brown, Allison Youngblood, David J. Wilson, Cynthia S. Froning, P. Christian Schneider, Thomas Ayres, Keivan G. Stassun   +10 more
doaj   +1 more source

Polarity‐engineered Sn‐Ti cluster photoresists for sub‐10‐nm high‐resolution lithography

Smart Molecules, EarlyView.
Enhancing the polarity of clusters can optimize their patterning performance; inspired by this strategy, we designed polarity‐enhanced Sn‐Ti oxo clusters via ligand engineering. The optimal TS‐3 with exposure‐induced polarity switch achieves 8 nm patterning in lithography and achieves simultaneous improvement in resolution and patterning performance ...
Daohan Wang, Runfeng Xu, Min Zhang, Xiaofeng Gong, Wenzheng Li, Danhong Zhou, Jun Zhao, Huie Zhu, Zhan Lu, Pengzhong Chen, Xiaojun Peng   +10 more
wiley   +1 more source

Fluorinated copolymer resists for high‐resolution negative‐tone lithography: Preparation and patterning performance

Smart Molecules, EarlyView.
Electron‐beam induced C–F cleavage in –CF3 generates F−, which abstracts a proton to form the acid that catalyzes tBMA deprotection during post‐exposure baking. This self‐sensitization mechanism enables the precise formation of high‐resolution negative‐tone patterns with enhanced sensitivity and resolution.
Yuting Tang, Wenzheng Li, Xinyan Huang, Min Zhang, Han Han, Jialong Zhang, Qinyu Luo, Jiangli Fan, Pengzhong Chen, Xiaojun Peng   +9 more
wiley   +1 more source

A Semiempirical Estimate of Solar Extreme-ultraviolet Evolution from 10 Myr to 10 Gyr

The Astronomical Journal
The extreme-ultraviolet (EUV; 100–911 Å) spectra of F, G, K, and M stars provide diagnostics of the stellar chromosphere through the corona, with line and continuum formation temperatures spanning roughly 10 ^4 –10 ^7 K.
Kevin France, Girish Duvvuri, Cynthia S. Froning, Alexander Brown, P. Christian Schneider, J. Sebastian Pineda, David Wilson, Allison Youngblood, Vladimir S. Airapetian, Kosuke Namekata, Yuta Notsu, Tristen Sextro   +11 more
doaj   +1 more source

Application of Ag‐Enriched Nanostructures Through Ga+ Irradiation of Silver Butyrate Films in Surface‐Enhanced Raman Spectroscopy (SERS)

Small Methods, EarlyView.
We report a direct‐writing method for patterning silver‐enriched nanostructures with dual functionality: High electrical conductivity, with a resistivity of 95 µΩ·cm, and strong SERS activity, achieving enhancement factors exceeding 107. This approach enables an easy and cost‐effective alternative for the production of microstructures with applications
Juan Ignacio Ocaña‐Parral, Lucía Herrer, Inés Tejedor, Alba Salvador‐Porroche, Sven Barth, Pilar Cea, Soraya Sangiao, José María De Teresa   +7 more
wiley   +1 more source

RCI Simulation for EUV spectra from Sn ions

Journal of Physics: Conference Series, 2007
Using the relativistic-configuration-interaction atomic structure code, RCI simulations for EUV spectra from Sn10+, Sn11+ and Sn12+ ions are carried out, where it is assumed that each ion is embedded in a LTE plasma with the electron temperature of 30 eV. To make clear assignment of the measured spectra, the value of the excitation energy limit, which
T Kagawa, H Tanuma, H Ohashi, K Nishihara   +3 more
openaire   +1 more source

Dry Development of Dry Coated Sn‐Based Inorganic Resist for Defect‐Suppressed and High‐Resolution Patterning Process

Small Methods, EarlyView.
This work compares conventional wet development and asynchronously pulsed plasma development for Sn‐based inorganic resists under delay and AMC exposure. While wet development induces CD variation, scumming, and bridging, pulsed plasma enables selective removal of non‐exposed regions, mitigating contamination effects and achieving defect‐suppressed ...
Hee Ju Kim, Min Cheol Kim, Geun Young Yeom   +2 more
wiley   +1 more source

The Soft X-Ray and EUV Spectra of Solar Flares [PDF]

International Astronomical Union Colloquium, 1984
The Japanese solar maximum satellite HINOTORI was launched on 21 February 1981, and so far 720 Solar flares were detected including many large flares; the largest observed was a X12 class flare occurred on June 6, 1982. Unfortunately, the data recorder malfunctioned in June, 1982, since then the real time basis observation has been possible to continue.
K. Nishi, K. Tanaka
openaire   +1 more source

Energy Deposition into the Ionosphere during a Solar Flare with Extreme-ultraviolet Late Phase

The Astrophysical Journal Letters
Solar extreme-ultraviolet (EUV) irradiance is the dominant energy source for ionizing and heating the Earth’s upper atmosphere. It is common to assume that the spectra of different EUV lines have the same trend to fill the solar EUV irradiance gap for ...
Jing Liu, Liying Qian, Wenbin Wang, Kevin Pham, Xiangliang Kong, Yao Chen, Wenlong Liu, Libo Liu, Xuanqing Liu   +8 more
doaj   +1 more source