Results 1 to 10 of about 2,429 (94)

Fixed Abrasive Polishing in an Anhydrous Environment: A Material Removal Model for Fused Silica

Machines, 2022
Due to the prevalent randomness and uncertainties associated with traditional loose polishing, fixed abrasive polishing in an anhydrous environment has been chosen as a new polishing method. In this paper, cerium oxide is the main component for polishing
Yuan Qian, Wei Yang, Chaoxu Chen, Xiaoluo Yu   +3 more
doaj   +3 more sources

ELID Polishing of Glass Substrates Using a Grainless Iron-Bonded Wheel with Free Abrasive Particles [PDF]

Micromachines
Conventional polishing of glass substrates often results in surface scratches caused by passivated abrasive particles, leading to defects and reduced yield. To overcome this limitation, an iron-bonded wheel with free abrasive grains was proposed in ELID (
Huali Zhang, Xu Yan, Jicai Kuai, Dmitrii V. Ardashev   +3 more
doaj   +2 more sources

Influences of Nonaqueous Slurry Components on Polishing 4H-SiC Substrate with a Fixed Abrasive Pad

Crystals, 2023
4H-SiC wafers are more likely to sustain a lower material removal rate (MRR) and severe subsurface damage in conventional chemical mechanical polishing (CMP) methods.
Jiyuan Zhong, Jiapeng Chen, Hanqiang Wang, Haibo Chen, Yunyun Gu, Juanfen Shen, Tao Sun   +6 more
doaj   +3 more sources

Research on the Preparation and Application of Fixed-Abrasive Tools Based on Solid-Phase Reactions for Sapphire Wafer Lapping and Polishing

Micromachines, 2023
Single-crystal sapphire specimen (α-Al2O3) have been widely applied in the semiconductor industry, microelectronics, and so on. In order to shorten the production time and improve the processing efficiency of sapphire processing, an integrated fixed ...
Linlin Cao, Xiaolong Zhou, Yingjie Wang, Zhilun Yang, Duowen Chen, Wei Wei, Kaibao Wang   +6 more
doaj   +3 more sources

Effect of pad and slurry on fixed abrasive polishing of gallium oxide crystal

Jin'gangshi yu moliao moju gongcheng, 2022
Gallium oxide crystal is one of the most representative fourth generation semiconductor materials with the advantages of high band gap, high voltage resistance and short absorption cutoff edge. It has broad application prospects.
WU Cheng, LI Jun, HOU Tianyi, YU Ningbin, GAO Xiujuan   +4 more
doaj   +3 more sources

Effect of air abrasive polishing on nickel release, stainless steel corrosion, and nickel-titanium archwires [PDF]

Journal of Dental Research, Dental Clinics, Dental Prospects, 2023
Background. Orthodontic treatment is becoming more and more popular. However, using fixed orthodontic devices for treatment affects oral hygiene and raises the risk of corrosion, plaque-related illnesses, and dental discoloration-related issues.
Mohanad Ali Mohammed, Alan Issa Saleem
doaj   +1 more source

Development of a New Finishing Process Combining a Fixed Abrasive Polishing with Magnetic Abrasive Finishing Process

Machines, 2021
High quality, highly efficient finishing processes are required for finishing difficult-to-machine materials. Magnetic abrasive finishing (MAF) process is a finishing method that can obtain a high accuracy surface using fine magnetic particles and ...
Yanhua Zou, Ryunosuke Satou, Ozora Yamazaki, Huijun Xie   +3 more
doaj   +1 more source

Acceleration mechanism of abrasive particle in ultrasonic polishing under synergistic physical vibration and cavitation: Numerical study

Ultrasonics Sonochemistry, 2023
Ultrasonic technology is widely applied in the engineering ceramic polishing processes without the limitation of material properties and ideally integrated into computer numerical control system.
Xin Chen, Shucong Xu, Juan Ignacio Ahuir-Torres, Zixuan Wang, Xun Chen, Tianbiao Yu, Ji Zhao   +6 more
doaj   +1 more source

Study on the Preparation and Performance of Self-Regressive Fixed Abrasive Chemical Mechanical Polishing Pad

Machines, 2022
Chemical mechanical polishing (CMP) technology is one of the key technologies to realize the global planarization of semiconductor wafer surfaces. With the increasing popularity and universality of its application, more and higher requirements are put ...
Jianguo Yao, Haixu Liu, Zhankui Wang, Yongwei Zhu, Jianxiu Su   +4 more
doaj   +1 more source

Optimal design and experimental study of fixed abrasive pads based on coupling of damping regulation and pellet arrangement [PDF]

Mechanical Sciences, 2021
Lapping and polishing technology is an efficient processing method for wafer planarization processing. The structure of the fixed abrasive pad (FAP) is one of the most concerning issues in the research. The FAP structure affects the pressure distribution
C. Xu, C. Fang, Y. Li, C. Liu
doaj   +1 more source