Results 11 to 20 of about 2,759 (235)

Study on the Mechanism of Solid-Phase Oxidant Action in Tribochemical Mechanical Polishing of SiC Single Crystal Substrate

open access: yesMicromachines, 2021
Na2CO3—1.5 H2O2, KClO3, KMnO4, KIO3, and NaOH were selected for dry polishing tests with a 6H-SiC single crystal substrate on a polyurethane polishing pad.
Wanting Qi   +4 more
doaj   +1 more source

Influences of Nonaqueous Slurry Components on Polishing 4H-SiC Substrate with a Fixed Abrasive Pad

open access: yesCrystals, 2023
4H-SiC wafers are more likely to sustain a lower material removal rate (MRR) and severe subsurface damage in conventional chemical mechanical polishing (CMP) methods.
Jiyuan Zhong   +6 more
doaj   +1 more source

Influence of preparation parameters on the properties of SiC abrasive stones and their applications

open access: yesInternational Journal of Ceramic Engineering & Science, 2023
The preparation of highly efficient and low cost abrasive stones has gained considerable interest in the last few years from the industrial and academic research societies.
S. B. Hanna, N. A. Ajiba, T. S. Mansour
doaj   +1 more source

Research on the Preparation and Application of Fixed-Abrasive Tools Based on Solid-Phase Reactions for Sapphire Wafer Lapping and Polishing

open access: yesMicromachines, 2023
Single-crystal sapphire specimen (α-Al2O3) have been widely applied in the semiconductor industry, microelectronics, and so on. In order to shorten the production time and improve the processing efficiency of sapphire processing, an integrated fixed ...
Linlin Cao   +6 more
doaj   +1 more source

Polishing characteristics of micron particles aggregated by nanosilica

open access: yesJournal of Advanced Mechanical Design, Systems, and Manufacturing, 2015
Colloidal silica slurry has been widely used in mirror finishing of various microelectronic materials, including Si wafer. However, in the last decade, there has been a tendency to replace the polishing slurry with fixed-abrasive pads because of ...
Qi GAO, Yasuhiro TANI, Gang DONG
doaj   +1 more source

Path planning for blade polishing with fixed abrasive tool base on robotic platform

open access: yesJin'gangshi yu moliao moju gongcheng, 2021
The 6R robotic and the fixed abrasive polishing technology were combined to develop a robotic-based fixed abrasive polishing system.The constant chord-height error method and the improved constant residual-height method were used for planning blade ...
LIU Jidong, XU Chengyu, ZHU Yongwei
doaj  

Investigation on the Basic Characteristics of Semi-Fixed Abrasive Grains Polishing Technique for Polishing Sapphire (α-Al2O3)

open access: yesMaterials, 2022
Single-crystal sapphire (α-Al2O3) is an important material and widely used in many advanced fields. The semi-fixed abrasive grain processing method based on solid-phase reaction theory is a prominent processing method for achieving ultra-precision damage-free surfaces.
Lei, Yang   +5 more
openaire   +2 more sources

Improved cemented carbide tool edge formed by solid phase chemical–mechanical polishing

open access: yesJournal of Materials Research and Technology, 2022
When a diamond grinding wheel is used to create the cutting edge of a carbide tool, it induces latent flaws in the tool material. We developed a fixed abrasive wheel for solid phase chemical–mechanical polishing (SPCMP) and successfully sharpened the ...
Yayoi Tanaka, Hisashi Sato, Osamu Eryu
doaj   +1 more source

Effect of abrasive size and matrix hardness on fixed abrasive polishing of YAG crystal

open access: yesJin'gangshi yu moliao moju gongcheng, 2020
Yttrium aluminum garnet (YAG) is a kind of hard-brittle and difficult-to-machine material with wide application. Its polishing process is complicated and inefficient.
MING Shun   +5 more
doaj  

Investigation of Polishing Pads Impregnated with Fe and Al2O3 Particles for Single-Crystal Silicon Carbide Wafers

open access: yesApplied Sciences, 2016
This study focuses on the development of a novel polishing pad for SiC wafers. Fe and Al2O3 particles were impregnated in a polyurethane matrix, thus forming a fixed abrasive polishing pad.
Jihng-Kuo Ho   +3 more
doaj   +1 more source

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