Results 11 to 20 of about 2,759 (235)
Na2CO3—1.5 H2O2, KClO3, KMnO4, KIO3, and NaOH were selected for dry polishing tests with a 6H-SiC single crystal substrate on a polyurethane polishing pad.
Wanting Qi +4 more
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Influences of Nonaqueous Slurry Components on Polishing 4H-SiC Substrate with a Fixed Abrasive Pad
4H-SiC wafers are more likely to sustain a lower material removal rate (MRR) and severe subsurface damage in conventional chemical mechanical polishing (CMP) methods.
Jiyuan Zhong +6 more
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Influence of preparation parameters on the properties of SiC abrasive stones and their applications
The preparation of highly efficient and low cost abrasive stones has gained considerable interest in the last few years from the industrial and academic research societies.
S. B. Hanna, N. A. Ajiba, T. S. Mansour
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Single-crystal sapphire specimen (α-Al2O3) have been widely applied in the semiconductor industry, microelectronics, and so on. In order to shorten the production time and improve the processing efficiency of sapphire processing, an integrated fixed ...
Linlin Cao +6 more
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Polishing characteristics of micron particles aggregated by nanosilica
Colloidal silica slurry has been widely used in mirror finishing of various microelectronic materials, including Si wafer. However, in the last decade, there has been a tendency to replace the polishing slurry with fixed-abrasive pads because of ...
Qi GAO, Yasuhiro TANI, Gang DONG
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Path planning for blade polishing with fixed abrasive tool base on robotic platform
The 6R robotic and the fixed abrasive polishing technology were combined to develop a robotic-based fixed abrasive polishing system.The constant chord-height error method and the improved constant residual-height method were used for planning blade ...
LIU Jidong, XU Chengyu, ZHU Yongwei
doaj
Single-crystal sapphire (α-Al2O3) is an important material and widely used in many advanced fields. The semi-fixed abrasive grain processing method based on solid-phase reaction theory is a prominent processing method for achieving ultra-precision damage-free surfaces.
Lei, Yang +5 more
openaire +2 more sources
Improved cemented carbide tool edge formed by solid phase chemical–mechanical polishing
When a diamond grinding wheel is used to create the cutting edge of a carbide tool, it induces latent flaws in the tool material. We developed a fixed abrasive wheel for solid phase chemical–mechanical polishing (SPCMP) and successfully sharpened the ...
Yayoi Tanaka, Hisashi Sato, Osamu Eryu
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Effect of abrasive size and matrix hardness on fixed abrasive polishing of YAG crystal
Yttrium aluminum garnet (YAG) is a kind of hard-brittle and difficult-to-machine material with wide application. Its polishing process is complicated and inefficient.
MING Shun +5 more
doaj
This study focuses on the development of a novel polishing pad for SiC wafers. Fe and Al2O3 particles were impregnated in a polyurethane matrix, thus forming a fixed abrasive polishing pad.
Jihng-Kuo Ho +3 more
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