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Writing with a 3D nanopen : magnetic applications of focused electron beam induced deposition
Nidhi Sharma
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Sensitivity and Contrast Characterization of PMMA 950K Resist Under 30 keV Focused Ga<sup>+</sup> Ion Beam Exposure. [PDF]
Muratov M +4 more
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Enhanced Secondary-Electron Detection of Single-Ion Implants in Silicon through Thin SiO<sub>2</sub> Layers. [PDF]
Schneider EB +9 more
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Integrated Strategies for Overcoming Resolution Limits in Electron Beam Lithography of Chemically Amplified Resists. [PDF]
Wu X, Tiwale N, Stein A, Nam CY.
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Dual-Functional 3D-Nanoprinted AFM Probes for Correlative Magnetic and Conductive Characterization. [PDF]
Seewald LM +3 more
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Focused electron beam induced deposition of gold
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 2000Codeposition of hydrocarbons is a severe problem during focused electron beam writing of pure metal nanostructures. When using organometallic precursors, a low metal content carbonaceous matrix embedding and separating numerous nanosized metal clusters is formed. In this work, we present a new and easy approach to obtain high purity gold lines: the use
I. Utke +5 more
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Ultralow-energy focused electron beam induced deposition
Applied Physics Letters, 1994We have studied focused electron beam induced deposition from W(CO)6 at beam primary energies between 20 and 0.06 keV. Submicrometer resolution with 4 nA beam current was maintained at very low primary energies using a retarding field configuration. Decomposition cross sections of W(CO)6 for primary energies below about 1 keV were found to be about a ...
P. C. Hoyle, J. R. A. Cleaver, H. Ahmed
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