Results 221 to 230 of about 8,377,275 (246)

Ultrasmall Functional Ferromagnetic Nanostructures Grown by Focused Electron-Beam-Induced Deposition [PDF]

ACS Nano, 2011
We have successfully grown ultrasmall cobalt nanostructures (lateral size below 30 nm) by optimization of the growth conditions using focused electron-beam-induced deposition techniques. This direct-write nanolithography technique is thus shown to produce unprecedented resolution in the growth of magnetic nanostructures.
Christophe Gâtel, Luis Serrano-Ramón, J M de Teresa   +2 more
exaly   +5 more sources

Focused Electron and Ion Beam Induced Deposition on Flexible and Transparent Polycarbonate Substrates

ACS Nano, 2015
The successful application of focused electron (and ion) beam induced deposition techniques for the growth of nanowires on flexible and transparent polycarbonate films is reported here. After minimization of charging effects in the substrate, sub-100 nm-wide Pt, W, and Co nanowires have been grown and their electrical conduction is similar compared to ...
J M de Teresa, Soraya Sangiao
exaly   +4 more sources

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Focused Electron Beam Induced Deposition of Gold and Rhodium

MRS Proceedings, 2000
ABSTRACTElectron beam induced deposition with two noble metal precursors (Rhodium and Gold) having the same halogeno and trifluorophosphine ligands is presented. The deposit geometry of lines and freestanding bridges is discussed with respect to electron energy, beam shape, and backscattered electron distribution.
Hoffmann, Patrik, Utke, Ivo, Cicoira, Fabio, Dwir, Benjamin, Leifer, Klaus, Kapon, Eli, Doppelt, Pascal   +6 more
openaire   +5 more sources

Focused electron beam induced deposition meets materials science [PDF]

Microelectronic Engineering, 2018
Focused electron beam induced deposition (FEBID) is a direct-write method for the fabrication of nanostructures whose lateral resolution rivals that of advanced electron lithography but is in addition capable of creating complex three-dimensional nano-architectures.
Michael Huth, Fabrizio Porrati
exaly   +3 more sources

Fundamental Proximity Effects in Focused Electron Beam Induced Deposition

ACS Nano, 2011
Fundamental proximity effects for electron beam induced deposition processes on nonflat surfaces were studied experimentally and via simulation. Two specific effects were elucidated and exploited to considerably increase the volumetric growth rate of this nanoscale direct write method: (1) increasing the scanning electron pitch to the scale of the ...
Harald, Plank, Daryl A, Smith, Thomas, Haber, Philip D, Rack, Ferdinand, Hofer   +4 more
openaire   +2 more sources

A critical literature review of focused electron beam induced deposition

Journal of Applied Physics, 2008
An extensive review is given of the results from literature on electron beam induced deposition. Electron beam induced deposition is a complex process, where many and often mutually dependent factors are involved. The process has been studied by many over many years in many different experimental setups, so it is not surprising that there is a great ...
Cornelis Wouter Hagen
exaly   +5 more sources

Fabrication of nanofigures by focused electron beam-induced deposition

Thin Solid Films, 2004
Contamination lithography has been performed on various metal substrates by focused electron beam-induced deposition (EBID) technique in a field emission scanning electron microscope (FE-SEM). We used pump oil (hydrocarbon) as precursors for EBID. It was found that the growth rate was independent of primary electron energy (500 to 30 keV) but was ...
Kazuyuki Ueda, Masamichi Yoshimura
openaire   +1 more source

Ultralow-energy focused electron beam induced deposition

Applied Physics Letters, 1994
We have studied focused electron beam induced deposition from W(CO)6 at beam primary energies between 20 and 0.06 keV. Submicrometer resolution with 4 nA beam current was maintained at very low primary energies using a retarding field configuration. Decomposition cross sections of W(CO)6 for primary energies below about 1 keV were found to be about a ...
P. C. Hoyle, J. R. A. Cleaver, H. Ahmed
openaire   +1 more source

Focused electron beam-induced deposition at cryogenic temperatures

Journal of Materials Research, 2011
Abstract
M. Bresin, B.L. Thiel, M. Toth, K.A. Dunn   +3 more
openaire   +1 more source

Binary Pt–Si Nanostructures Prepared by Focused Electron-Beam-Induced Deposition

ACS Nano, 2011
Binary systems of Pt-Si are prepared by electron-beam-induced deposition using the two precursors, trimethyl(methylcyclopentadienyl)platinum(IV) (MeCpPt(Me)(3)) and neopentasilane (Si(SiH(3))(4)), simultaneously. By varying the relative flux of the two precursors during deposition, we are able to study composites containing platinum and silicon in ...
Michael Huth, Fabrizio Porrati, Andreas Terfort   +2 more
exaly   +3 more sources