Results 201 to 210 of about 18,197 (240)

Focused, Nanoscale Electron-Beam-Induced Deposition and Etching

Critical Reviews in Solid State and Materials Sciences, 2006
Focused electron-beam-induced (FEB-induced) deposition and etching are versatile, direct-write nanofabrication schemes that allow for selective deposition or removal of a variety of materials. Fundamentally, these processes are governed by an electron-induced reaction with a precursor vapor, which may either result in decomposition to a solid deposit ...
S. J. Randolph, J. D. Fowlkes, P. D. Rack   +2 more
openaire   +1 more source

Focused electron beam-induced deposition at cryogenic temperatures

Journal of Materials Research, 2011
Abstract
M. Bresin, B.L. Thiel, M. Toth, K.A. Dunn   +3 more
openaire   +1 more source

Focused electron beam induced deposition as a tool to create electron vortices

Micron, 2016
Focused electron beam induced deposition (FEBID) is a microscopic technique that allows geometrically controlled material deposition with very high spatial resolution. This technique was used to create a spiral aperture capable of generating electron vortex beams in a transmission electron microscope (TEM). The vortex was then fully characterized using
A. Béché, R. Winkler, H. Plank, F. Hofer, J. Verbeeck   +4 more
openaire   +3 more sources

Technology basis and perspectives on focused electron beam induced deposition and focused ion beam induced deposition

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 2014
Abstract The main characteristics of focused electron beam induced deposition (FEBID) and focused ion beam induced deposition (FIBID) are presented. FEBID and FIBID are two nanopatterning techniques that allow the fabrication of submicron patterns with nanometer resolution on selected locations of any kind of substrate, even on highly structured ...
openaire   +1 more source

Periodic structure formation by focused electron-beam-induced deposition

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 2004
Focused electron-beam-induced deposition from a copper precursor is shown to allow self-formation of periodic features when the beam is scanned at lateral speeds of the order of the vertical deposition rate. The period of the structures can be tuned by the scan speed.
T. Bret, I. Utke, C. Gaillard, P. Hoffmann   +3 more
openaire   +1 more source

Fabrication of nanofigures by focused electron beam-induced deposition

Thin Solid Films, 2004
Contamination lithography has been performed on various metal substrates by focused electron beam-induced deposition (EBID) technique in a field emission scanning electron microscope (FE-SEM). We used pump oil (hydrocarbon) as precursors for EBID. It was found that the growth rate was independent of primary electron energy (500 to 30 keV) but was ...
Kazuyuki Ueda, Masamichi Yoshimura
openaire   +1 more source

Optimization of postgrowth electron-beam curing for focused electron-beam-induced Pt deposits

Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, 2011
The authors use focused electron-beam-induced Pt deposition from a gaseous (CH3)3CH3C5H4Pt precursor for the fabrication of electrically conductive structures consisting of Pt nanocrystals embedded in a carbon containing matrix. Recently it has been demonstrated that the electrical resistivity of such deposits can be strongly improved via postgrowth ...
Harald Plank, Gerald Kothleitner, Ferdinand Hofer, Stephan G. Michelitsch, Christian Gspan, Andreas Hohenau, Joachim Krenn   +6 more
openaire   +1 more source

Binary Pt–Si Nanostructures Prepared by Focused Electron-Beam-Induced Deposition

ACS Nano, 2011
Binary systems of Pt-Si are prepared by electron-beam-induced deposition using the two precursors, trimethyl(methylcyclopentadienyl)platinum(IV) (MeCpPt(Me)(3)) and neopentasilane (Si(SiH(3))(4)), simultaneously. By varying the relative flux of the two precursors during deposition, we are able to study composites containing platinum and silicon in ...
Marcel, Winhold, Christian H, Schwalb, Fabrizio, Porrati, Roland, Sachser, Achilleas S, Frangakis, Britta, Kämpken, Andreas, Terfort, Norbert, Auner, Michael, Huth   +8 more
openaire   +2 more sources

Controlled nano-patterning using focused electron beam induced deposition

2023
ImPhys/Hagen ...
openaire   +3 more sources

A comparison of focused ion beam and electron beam induced deposition processes

Microelectronics Reliability, 1996
Focused ion and electron beams are used for local deposition of conducting or insulating films. Major applications are integrated circuit design edit, prototype modification, repair of masks, and machining of microsystems. In this paper, the dependence of the deposition rates versus the beam parameters for both, ion beam and electron beam induced ...
S. Lipp, L. Frey, C. Lehrer, E. Demm, S. Pauthner, H. Ryssel   +5 more
openaire   +1 more source