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Triple probe mesurements in HiPIMS plasma
2016 IEEE International Conference on Plasma Science (ICOPS), 2016Triple probes are a useful diagnostic tool to measure the ion density ni and electron temperature Te in low-pressure plasmas without the necessity to obtain a probe I-V characteristic. This can give advantages over single and double Langmuir probes for the measurement of fast, non-periodic events1.
Francis Lockwood Estrin +1 more
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HIPIMS: The New PVD Technology
Vakuum in Forschung und Praxis, 2008HIPIMS (high power impulse magnetron sputtering) represents the most recent development in the field of PVD pulse sputtering technology. Utilizing extreme high pulse power densities (4-6MW) discharge conditions are created similar to the well-known cathodic arc discharge, yet completely avoiding the appearance of droplets. High metal ion concentrations
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Enhanced ionized sputtering in HIPIMS
Vakuum in Forschung und Praxis, 2013AbstractThe present paper aims to shortly review a relatively new approach to magnetron sputtering, namely “enhanced ionization sputtering” (EIS) or as it is more commonly known “High Power Pulsed Magnetron Sputtering“ (HIPIMS). The EIS concept describes a range of plasmas that have the common features of exhibiting a higher (than what is commonly ...
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, 2020
The deposition of ternary nitrides with the incorporation of carbon atoms into its structure has demonstrated to be a promising approach in the pursuit of wear-resistant and self-lubricating coatings.
W. Tillmann +6 more
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The deposition of ternary nitrides with the incorporation of carbon atoms into its structure has demonstrated to be a promising approach in the pursuit of wear-resistant and self-lubricating coatings.
W. Tillmann +6 more
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Characterization of electromagnetic fluctuations in a HiPIMS plasma
Plasma Sources Science and Technology, 2016A high power impulse magnetron sputtering (HiPIMS) plasma has been characterized by means of Langmuir probes measuring floating potential, electron temperature and density. Moreover, magnetic sensors have been employed in the analysis of the magnetic fluctuations.
Spagnolo S +6 more
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HiPIMS-deposited thermochromic VO2 films on polymeric substrates
Solar Energy Materials and Solar Cells, 2016Abstract Thermochromic vanadium dioxide, VO 2 , is a semi-conductor of major interest for energy control applications. Generally, the fabrication of high-quality VO 2 films requires a high deposition temperature over 400 °C which limits its large scale implementation as well as its compatibility with temperature-sensitive substrates.
S. Loquai +4 more
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HIPIMS: Die neue PVD‐Technologie
Vakuum in Forschung und Praxis, 2007AbstractHIPIMS (High Power Impulse Magnetron Sputtering) stellt die neueste Entwicklung auf dem Gebiet der PVD‐Puls‐Sputter‐Technik dar. Unter dem Einfluss extrem hoher Puls‐Leistungen (4–6 MW) gelingt es, Gasentladungen zu erzeugen, die der weithin bekannten Arc‐Entladung, unter völliger Vermeidung von Droplets, sehr ähnlich sind.
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HiPIMS induced high-purity Ti3AlC2 MAX phase coating at low-temperature of 700 °C
Journal of the European Ceramic Society, 2023Zhongchang Li +5 more
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