Results 181 to 190 of about 2,236 (212)
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HIPIMS: Die neue PVD‐Technologie
Vakuum in Forschung und Praxis, 2007AbstractHIPIMS (High Power Impulse Magnetron Sputtering) stellt die neueste Entwicklung auf dem Gebiet der PVD‐Puls‐Sputter‐Technik dar. Unter dem Einfluss extrem hoher Puls‐Leistungen (4–6 MW) gelingt es, Gasentladungen zu erzeugen, die der weithin bekannten Arc‐Entladung, unter völliger Vermeidung von Droplets, sehr ähnlich sind.
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Copper thin films deposited using different ion acceleration strategies in HiPIMS
Surface and Coatings Technology, 2021Rommel Paulo B Viloan +2 more
exaly
Sputter Cathode Design Consideration with HiPIMS
Annual Technical Conference Proceedings, 2022openaire +1 more source
Thin Films for Extreme Conditions by HiPIMS
2015The need for materials with special functionalities is particularly felt in forefront domains. In the field of refractory hard compounds, the development of new materials is restricted by various metallurgical criticisms, which force the use of sophisticated and expensive production methods.
Deambrosis S. M, Miorin E. +4 more
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Game Changing HIPIMS Technology
Annual Technical Conference Proceedings, 2019openaire +1 more source
Time resolved study of the HiPIMS postdischarge
2014This study deals with the investigation of post-discharges resulting from a pulsed magnetron sputtering process. To vary the working conditions in a large range, different sputtering targets and gases are used. The diagnosis of the post-discharge is mainly achieved by a Retarded Field Energy Analyzer (RFEA) and a mass spectrometer. These two techniques
Cuynet, Stéphane +7 more
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Multinary HiPIMS for Cutting Tools
Annual Technical Conference Proceedings, 2019openaire +1 more source
Effect of bias voltage on TiAlSiN nanocomposite coatings deposited by HiPIMS
Applied Surface Science, 2017Liuhe Li, Ye Xu, Jiabin Gu
exaly