Results 161 to 170 of about 2,236 (212)

Synthesis and Characterization of Boron Nitride Thin Films Deposited by High-Power Impulse Reactive Magnetron Sputtering. [PDF]

Molecules
Stankus V, Vasiliauskas A, Guobienė A, Andrulevičius M, Meškinis Š.   +4 more
europepmc   +1 more source

Life Cycle Assessment and Critical Raw Materials Analysis of Innovative Palladium-Substituted Membranes for Hydrogen Separation. [PDF]

Membranes (Basel)
Mohtashamifar A, Battiston S, Fasolin S, Fiameni S, Visentin F, Barison S.   +5 more
europepmc   +1 more source

Synthesis and Characterization of Multilayered CrAlN/Al₂O₃ Tandem Coating Using HiPIMS for Solar Selective Applications at High Temperature. [PDF]

ACS Appl Energy Mater
Sanchez-Perez M, Rojas TC, Reyes DF, Ferrer FJ, Farchado M, Morales A, Escobar-Galindo R, Sanchez-Lopez JC.   +7 more
europepmc   +1 more source

Novel Cemented Carbide Inserts for Metal Grooving Applications. [PDF]

Materials (Basel)
Konstanty J, Layyous A, Furtak Ł.
europepmc   +1 more source

Comparative Study of Nanostructured Multilayer Cr/(Cr/a-C)ml Coatings Deposited on HS6-5-2 Steel by Magnetron Sputtering. [PDF]

Materials (Basel)
Dimitrova R, Petrov K, Sofronov Y, Mishev V, Angelov M, Tzaneva B, Dochev B, Nikolov A, Yordanov M, Marchev K.   +9 more
europepmc   +1 more source

Nanoelectronics: Materials, Devices and Applications. [PDF]

Nanomaterials (Basel)
Wang C.
europepmc   +1 more source

Applications of HIPIMS metal oxides

Thin Solid Films, 2013
Abstract The high degree of ionization of the sputtered material during the coating process is one of the main features of HIPIMS (high power impulse magnetron sputtering). The use of HIPIMS leads to better film quality for hard coatings based on metal nitrides and to more conformal coatings during via fillings with high aspect ratios used in ...
V Sittinger, M Vergöhl, B Szyszka
exaly   +3 more sources

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Improving HiPIMS deposition rates by hybrid RF/HiPIMS co-sputtering, and its relevance for NbSi films

Surface and Coatings Technology, 2014
Abstract High Power Impulse Magnetron Sputtering (HiPIMS) with pre-ionization was successfully used for metal deposition at very low-pressures by feeding one cathode of a conventional dual magnetron deposition system, the other one being radio frequency (RF) supplied.
Tiberiu Minea, S Marnieros, D Bouchier   +2 more
exaly   +2 more sources

HiPIMS ‐ Technologie und Anwendungsfelder

Vakuum in Forschung und Praxis, 2009
AbstractSeit der Einführung der planaren Magnetronkatode Mitte der siebziger Jahre hat die Magnetronzerstäubung fast alle Industriezweige, für die dünne Schichten eine Rolle spielen, im Sturm erobert. Zahlreiche Meilensteine wurden in den zurückliegenden 30 Jahren gesetzt.
Ralf Bandorf, Michael Vergöhl, Oliver Werner, Volker Sittinger, Günter Bräuer   +4 more
openaire   +2 more sources

An investigation of c-HiPIMS discharges during titanium deposition

Surface and Coatings Technology, 2014
A modified version of high power impulse magnetron sputtering (HiPIMS) has been used to deposit titanium films at higher deposition rates than for conventional HiPIMS whilst maintaining similar pulse voltages and peak currents.
Stephanos Konstantinidis, Erik Lewin, Nikolay Britun   +2 more
exaly   +2 more sources