Results 171 to 180 of about 2,236 (212)
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Spoke behaviour in reactive HiPIMS
Plasma Sources Science and Technology, 2021Abstract Plasma in high-power impulse magnetron sputtering discharge, similarly to other discharges utilising E × B field (Hall thrusters, homopolar devices), undergoes self-organisation into the ionisation zones predominantly rotating
P Klein +4 more
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Dynamics of HiPIMS Discharge Operated in Oxygen
IEEE Transactions on Plasma Science, 2011We report on time- and species-resolved plasma imaging analysis of high-power impulse magnetron sputtering discharge operated above a Cr target in pure oxygen. It was found that the discharge emission is dominated by oxygen species. No metal-dominated sputtering has been detected, in contrast to the discharges in Ar, N2, and N2/Ar mixtures investigated
M. Hala +3 more
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Spoke transitions in HiPIMS discharges
Plasma Sources Science and Technology, 2015Spokes, localised light emission patterns appearing during the HiPIMS discharge, are investigated using optical emission diagnostic and electrical probes. Both, temporal and spatial aspects of the spoke phenomenon have been investigated. The evolution from stochastic to self-organised patterns consisting of a finite number of spokes along the racetrack
A Hecimovic +4 more
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A review of metal-ion-flux-controlled growth of metastable TiAlN by HIPIMS/DCMS co-sputtering
We review results on the growth of metastable Ti1-xAlxN alloy films by hybrid high-power pulsed and dc magnetron co-sputtering (HIPIMS/DCMS) using the time domain to apply substrate bias either in synchronous with the entire HIPIMS pulse or just the ...
Grzegorz Greczynski +2 more
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Triple probe mesurements in HiPIMS plasma
2016 IEEE International Conference on Plasma Science (ICOPS), 2016Triple probes are a useful diagnostic tool to measure the ion density ni and electron temperature Te in low-pressure plasmas without the necessity to obtain a probe I-V characteristic. This can give advantages over single and double Langmuir probes for the measurement of fast, non-periodic events1.
Francis Lockwood Estrin +1 more
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HIPIMS: The New PVD Technology
Vakuum in Forschung und Praxis, 2008HIPIMS (high power impulse magnetron sputtering) represents the most recent development in the field of PVD pulse sputtering technology. Utilizing extreme high pulse power densities (4-6MW) discharge conditions are created similar to the well-known cathodic arc discharge, yet completely avoiding the appearance of droplets. High metal ion concentrations
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Characterization of electromagnetic fluctuations in a HiPIMS plasma
Plasma Sources Science and Technology, 2016A high power impulse magnetron sputtering (HiPIMS) plasma has been characterized by means of Langmuir probes measuring floating potential, electron temperature and density. Moreover, magnetic sensors have been employed in the analysis of the magnetic fluctuations.
Spagnolo S +6 more
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Enhanced ionized sputtering in HIPIMS
Vakuum in Forschung und Praxis, 2013AbstractThe present paper aims to shortly review a relatively new approach to magnetron sputtering, namely “enhanced ionization sputtering” (EIS) or as it is more commonly known “High Power Pulsed Magnetron Sputtering“ (HIPIMS). The EIS concept describes a range of plasmas that have the common features of exhibiting a higher (than what is commonly ...
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2015
AlTiN is a promising anti-oxidation and corrosion protective material. Thanks to the formation of a coherent, compact and adherent alumina scale, it can be applied in harsh environments. In this work, the intrinsic properties of AlTiN films produced by reactive High Power Impulse Magnetron Sputtering (HiPIMS) have been investigated.
Deambrosis S. M. +6 more
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AlTiN is a promising anti-oxidation and corrosion protective material. Thanks to the formation of a coherent, compact and adherent alumina scale, it can be applied in harsh environments. In this work, the intrinsic properties of AlTiN films produced by reactive High Power Impulse Magnetron Sputtering (HiPIMS) have been investigated.
Deambrosis S. M. +6 more
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HiPIMS of MoS2 – Current-voltage characteristics
Materials Letters, 2022Wolfgang Tillmann +6 more
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