TiO<sub>2</sub> nanolayer-assisted top-interface engineering for disturbance-free FeFETs: a blueprint for future van der Waals memory. [PDF]
Kang H +11 more
europepmc +1 more source
Research on the gate reliability of HZO FeFETs with different interface layers
Abstract The gate reliability of Hf0.5Zr0.5O2 (HZO) ferroelectric field-effect transistors (FeFETs) with varying interface layers was investigated in this paper, specifically SiO2 and Y2O3. By employing voltage-ramp and time-dependent dielectric breakdown (TDDB) tests, along with an analysis of different gate dimensions, we provide ...
openaire +1 more source
Emergence of unconventional ferroelectric phase in ultrathin Hf<sub>0.5</sub>Zr<sub>0.5</sub>O<sub>2</sub> films. [PDF]
Lee S +14 more
europepmc +1 more source
First Demonstration of HZO/beta-Ga2O3 Ferroelectric FinFET with Improved Memory Window
We have experimentally demonstrated the effectiveness of beta-gallium oxide (beta-Ga2O3) ferroelectric fin field-effect transistors (Fe-FinFETs) for the first time.
Bae, Hagyoul +10 more
core
The cylindrical devices with tunable positive, infinite, and negative capacitance for dynamic random access memory. [PDF]
Park HW +17 more
europepmc +1 more source
Malignancy Risk after Ophthalmic Herpes Infection within a Diverse United States Cohort. [PDF]
Mihalache A +3 more
europepmc +1 more source
The Coupling of Ferroelectric Polarization and Oxygen Vacancy Migration Enables Electrically Controlled Thermal Memories. [PDF]
Barneo D +13 more
europepmc +1 more source
Endurance Paradox in Hafnium-Oxide-Based Silicon-Channel Ferroelectric Transistors. [PDF]
Das A +14 more
europepmc +1 more source
Sub-2 nm Equivalent-Oxide-Thickness Ferroelectric Transistors for Cryogenic Memory and Computing. [PDF]
Das A +18 more
europepmc +1 more source
Approaching theoretical polarization limit in HfZrO2/HfLaO2 multilayers. [PDF]
Shi S +16 more
europepmc +1 more source

