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Selective cobalt and nickel separation by bioacid-mediated electrowinning. [PDF]

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Ion-Assisted Deposition Of Fluorides

SPIE Proceedings, 1986
Ion-assisted deposition (IAD) has been used to deposit magnesium fluoride, cryolite (Na3A1F6), and lanthanum fluoride films on ambient temperature substrates. IAD magnesium fluoride coatings show increased density and moisture resistance, while IAD lanthanum fluoride coatings exhibit increased refractive indices.
J D. Targove   +7 more
openaire   +1 more source

Ion-beam-assisted deposition of thin films

Applied Optics, 1983
Some effects on the properties of electron-beam evaporated thin films produced by ion bombardment of the growing film are reported. Substantial increases in the packing densities of SiO2 , TiO2 , and ZrO2 films have been produced as measured by the reduction in the adsorption of moisture when the films are exposed to a humid atmosphere.
P J, Martin   +4 more
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Low-temperature growth and ion-assisted deposition

Physical Review B, 1995
Using standard molecular-dynamics methods, we have simulated silicon molecular-beam epitaxy on a (100) substrate, subject to a second beam of low-energy argon atoms. We find that the presence of the ion beam has an important effect on the structure of the deposits formed: good crystalline material forms at significantly lower temperatures, where ...
, Strickland, , Roland
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Optical coatings deposited using ion assisted deposition

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 1987
The properties of Ta2O5 and Al2O3 optical coatings deposited using oxygen-ion assisted deposition (IAD) were investigated. Previously,1 we reported preliminary results for Ta2O5 and Al2O3 coatings deposited using IAD. In this paper, we present results illustrating the effects of oxygen-ion bombardment on film optical constants, environmental durability,
James J. McNally   +3 more
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Ion–assisted sputter deposition

Philosophical Transactions of the Royal Society of London. Series A: Mathematical, Physical and Engineering Sciences, 2003
A review of the development of the ion-assisted sputter-deposition process is given. The special features of thin films produced by this technique are outlined and some main applications and future developments are discussed.
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Ion-assisted deposition of optical coatings

SPIE Proceedings, 1996
ABSTRACT Ion assisted deposition technique (lAD) and effects of this technique on properties of optical coatingsare investigated inthis paper.We have produced thin-film samples by bombarding with different ions such asoxygen,argon and mixture of thetwo during deposition,of which the refractive index,the extinctive coefficient and the laser induced ...
Zhengxiu Fan, Rui-Ying Fan, Xuefei Tang
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Ion-assisted pulsed-laser deposition

Review of Scientific Instruments, 1995
Ion bombardment on the surface of a substrate during deposition of a thin film [ion-assisted (IA) deposition] is used to control thin-film crystalline orientation and phase. Ion-assisted deposition is demonstrated with the relatively new pulsed-laser deposition (PLD) technique, a method of thin-film growth that has shown promise for the synthesis of ...
R. P. Reade, S. R. Church, R. E. Russo
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The role of ion-assisted deposition in PVD

SPIE Proceedings, 2008
An optimal energy interval in ion-assisted deposition of high crystalline films is predicted in the modeling of ion impacting on surface. The result is in good agreement with the presented experiments. The possible application of the evaluation of ion role for the fabrication of potential thin film materials is expected.
Z. Q. Ma   +5 more
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