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Properties of dielectric coatings produced by ion assisted deposition
Applied Optics, 1989Some metal oxides, fluorides, and ZnS films deposited by ion assisted deposition are investigated as a function of ion energy, ion variety, and ion source type. Both optical and mechanical properties, such as optical stability, absorption and scattering losses, laser damage threshold, and durability, are examined for samples deposited with the ...
P F, Gu, Y M, Chen, X Q, Hu, J F, Tang
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Applications of ion-beam-assisted deposition
Materials Science and Engineering: A, 1991Abstract Irradiation of a substrate by an energetic ion beam during film deposition can drastically change the substrate surface, its structure, the surface chemistry, the nucleation processes and the type of coating which is produced. A wide range of novel coatings and improved adhesion to the substrate are possible as a result of the added energy ...
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Protective dielectric coatings produced by ion-assisted deposition
Applied Optics, 1984Optically transparent dielectric films, when prepared by thermal evaporation or sputtering, have had limited use for many applications due to their permeability and lack of stability. We report on protective dielectric films produced by ion-beam-assisted deposition which demonstrate significant improvements over films produced by conventional ...
W G, Sainty +2 more
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Optical properties of some ion assisted deposited oxides
Vacuum, 1991were deposited with starting materials Zr02, Yb2O3, Gd203, Er203 and Ta2O5 both on mineral(BK7 glass) and on plastic (CR39) substrates in the same cycle for each set of depositionparameters. The refractive indexes of Zr02, Yb203, Gd203, Er203 were measured as functionof ion energy and current; the refractive index of Ta2O5 was measured also as a ...
F. Andreani, S. Luridiana, Shuzheng Mao
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Ion-assisted sputter deposition of molybdenum-silicon multilayers
Applied Optics, 1993X-ray multilayer (ML) structures that are fabricated by the use of magnetron-sputter deposition exhibit a degradation in structural quality as the deposition pressure is increased. The observed change in morphology is attributed to a reduced mobility of surface adsorbed atoms, which inhibits the formation of smooth, continuous layers.
S P, Vernon, D G, Stearns, R S, Rosen
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Ion-Assisted Deposition of Thermally Evaporated Ag Films
Optical Interference Coatings, 1987Correlation of film properties and microstructure with ion beam parameters in ion-assisted deposition (IAD) provides insights for improving IAD thin films. It is well-known that the ion beam energy and ion flux are two main parameters which alter the microstructure of thin films and their optical properties.
C. K. Hwangbo +6 more
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Ion beam assisted deposition of Al films on Si
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 1995Ion beam assisted deposition (IBAD) was used to grow thin Al films (∼100 nm thick) onto Si substrates at room temperature. Al was deposited by electron gun evaporation, while an Ar+ ion beam bombarded the film during the growth. Ion beam energies of 300, 500, and 650 eV were used, with current densities ranging between 4 and 20 μA/cm2.
TERRASI, Antonio +4 more
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Ion-assisted deposition and metastable structures
Thin Solid Films, 1988Abstract Ion-assisted deposition (IAD) has become an established method for the synthesis of thin films and the modification of their structure, composition, hardness and electrical and optical properties. A variety of techniques are used to achieve the desired ion bombardment during film growth and to produce ionized species from which the film is ...
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Surface and Coatings Technology, 2007
Abstract Influences of plasma ion-beam assistance on the optical, structural and chemical properties of TiO2 films, MgF2 films and TiO2/MgF2 narrow band-pass filters deposited by conventional e-beam evaporation (CE) and plasma ion-assisted deposition (PIAD), respectively, were investigated.
Seouk-Hoon Woo, Chang Kwon Hwangbo
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Abstract Influences of plasma ion-beam assistance on the optical, structural and chemical properties of TiO2 films, MgF2 films and TiO2/MgF2 narrow band-pass filters deposited by conventional e-beam evaporation (CE) and plasma ion-assisted deposition (PIAD), respectively, were investigated.
Seouk-Hoon Woo, Chang Kwon Hwangbo
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Operation of a Gridless Ion Source for Ion Assisted Deposition
Optical Interference Coatings, 1997In a commercial optical coating environment, the significant benefits of the gridless end-Hall ion source have been exploited, resulting in a new design.
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