Results 141 to 150 of about 3,384,291 (161)
Some of the next articles are maybe not open access.

Study of heterostructures of Cu3BiS3–buffer layer measured by Kelvin probe force microscopy measurements (KPFM)

Canadian Journal of Physics, 2014
The interface formed between Cu3BiS3 thin films and the buffer layer is a potentially limiting factor to the performance of solar cells based on Al/Cu3BiS3/buffer heterojunctions. The buffer layers of ZnS and In2S3 were grown by co-evaporation, and tested as an alternative to the traditional CdS deposited by chemical bath deposition.
F. Mesa, D. Fajardo
openaire   +1 more source

Cross-Talk Artefacts in Kelvin Probe Force Microscopy Imaging: A Comprehensive Study

open access: yesJournal of Applied Physics, 2014
We provide in this article a comprehensive study of the role of ac cross-talk effects in Kelvin Probe Force Microscopy (KPFM), and their consequences onto KPFM imaging.
Heinrich Diesinger, Thierry Mélin
exaly   +2 more sources

Surface Potential Studies of Self-Assembling Monolayers Using Kelvin Probe Force Microscopy

open access: yesSurface and Interface Analysis, 1999
The local contact potential difference (CPD) of different self-assembled n-alkanethiol monolayers on Au substrates has been measured using Kelvin probe force microscopy (KPFM).
Ernst Meyer   +2 more
exaly   +1 more source

Contrast Formation in Kelvin Probe Force Microscopy of Single π-Conjugated Molecules [PDF]

open access: yesNano Letters, 2014
We report the contrast formation in the local contact potential difference (LCPD) measured by Kelvin probe force microscopy (KPFM) on single charge-transfer complexes (CTCs) on a NaCl bilayer on Cu(111).
Shi-Xia Liu, Silvio Decurtins, Leo Gross
exaly   +2 more sources

Kelvin Probe Force Microscopy (KPFM) for nanoelectronic device characterisation [PDF]

open access: possible, 2016
This project is to develope a new method of characterization for Silicon-nano-wire (SiNW) FET and SET devices by using KPFM technology to derive the information of local surface potential change on the channel of SiNW devices. The surface potential is related to many important parameters on material's surface, e.g.
openaire  

Pulsed Force Kelvin Probe Force Microscopy Through Integration of Lock-In Detection

Nano Letters, 2023
Zahra Fakhraai, Hui Fang, Devon S Jakob
exaly  

Torsional Harmonic Kelvin Probe Force Microscopy for High-Sensitivity Mapping of Surface Potential

IEEE Transactions on Industrial Electronics, 2022
Junyuan Geng   +2 more
exaly  

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