Results 141 to 150 of about 3,384,291 (161)
Some of the next articles are maybe not open access.
Canadian Journal of Physics, 2014
The interface formed between Cu3BiS3 thin films and the buffer layer is a potentially limiting factor to the performance of solar cells based on Al/Cu3BiS3/buffer heterojunctions. The buffer layers of ZnS and In2S3 were grown by co-evaporation, and tested as an alternative to the traditional CdS deposited by chemical bath deposition.
F. Mesa, D. Fajardo
openaire +1 more source
The interface formed between Cu3BiS3 thin films and the buffer layer is a potentially limiting factor to the performance of solar cells based on Al/Cu3BiS3/buffer heterojunctions. The buffer layers of ZnS and In2S3 were grown by co-evaporation, and tested as an alternative to the traditional CdS deposited by chemical bath deposition.
F. Mesa, D. Fajardo
openaire +1 more source
Cross-Talk Artefacts in Kelvin Probe Force Microscopy Imaging: A Comprehensive Study
We provide in this article a comprehensive study of the role of ac cross-talk effects in Kelvin Probe Force Microscopy (KPFM), and their consequences onto KPFM imaging.
Heinrich Diesinger, Thierry Mélin
exaly +2 more sources
Surface Potential Studies of Self-Assembling Monolayers Using Kelvin Probe Force Microscopy
The local contact potential difference (CPD) of different self-assembled n-alkanethiol monolayers on Au substrates has been measured using Kelvin probe force microscopy (KPFM).
Ernst Meyer +2 more
exaly +1 more source
Contrast Formation in Kelvin Probe Force Microscopy of Single π-Conjugated Molecules [PDF]
We report the contrast formation in the local contact potential difference (LCPD) measured by Kelvin probe force microscopy (KPFM) on single charge-transfer complexes (CTCs) on a NaCl bilayer on Cu(111).
Shi-Xia Liu, Silvio Decurtins, Leo Gross
exaly +2 more sources
Kelvin Probe Force Microscopy (KPFM) for nanoelectronic device characterisation [PDF]
This project is to develope a new method of characterization for Silicon-nano-wire (SiNW) FET and SET devices by using KPFM technology to derive the information of local surface potential change on the channel of SiNW devices. The surface potential is related to many important parameters on material's surface, e.g.
openaire
Pulsed Force Kelvin Probe Force Microscopy Through Integration of Lock-In Detection
Nano Letters, 2023Zahra Fakhraai, Hui Fang, Devon S Jakob
exaly
Torsional Harmonic Kelvin Probe Force Microscopy for High-Sensitivity Mapping of Surface Potential
IEEE Transactions on Industrial Electronics, 2022Junyuan Geng +2 more
exaly

