Results 211 to 220 of about 9,926 (249)

Quiet Cascade: Measuring QCL Intrinsic Linewidth

Optics and Photonics News, 2010
Absent
Bartalini S, Borri S, Cancio P, Castrillo A, Galli I, Giusfredi G, Mazzotti D, Gianfrani L, De Natale P   +8 more
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Spatial filtering microscope for linewidth measurements

Applied Optics, 1989
High pass filtering has been relatively little used in microscopy, yet it may have application to linewidth measurement and visualization of phase objects. I have designed and built a spatial filtering microscope entirely of conventional microscope objectives.
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Measurement of Lorentzian linewidths by pulse propagation delay

Physical Review A, 1996
Two related methods for determining the Lorentzian linewidth of oneand two-photon transitions in an atomic medium are presented. In each method, the linewidth is determined by the relationship between the energy transmission and propagation delay of a series of laser pulses sent through the medium; precise knowledge of the laser frequency, atom density,
, Kasapi, , Yin, , Jain, , Harris
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Device for Measuring Spectral Linewidths

Applied Spectroscopy, 1967
Conventional methods of microphotometry measure the portion of an incident beam of light that is transmitted through a given spectral line on a photographic film or plate. This percentage transmittance is, in effect, a measure of the density of the line; for density is equal to the logarithm of the reciprocal of the transmittance.
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Comparison of linewidth measurements on COG masks

SPIE Proceedings, 2001
We report on comparison measurements for linewidths of test structures on chrome on glass photomasks by means of different types of light optical transmission microscopy and low voltage scanning electron microscopy (LVSEM). The investigated linewidth or critical dimension range was chosen to be between 0.3 micrometers and 5 micrometers on isolated and ...
Harald Bosse, Werner Mirande, Carl G. Frase, Hans-Juergen Brueck, Sigrid Lehnigk   +4 more
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Linewidth Measurement By Low Voltage SEM

SPIE Proceedings, 1988
The reduction of integrated circuit dimensions to the submicron range has necessitated the use of low voltage scanning electron microscopy (SEM) for linewidth metrology 1,2. SEM offers advantages of higher resolution and increased depth of focus relative to optical linewidth measurement systems. Low voltage SEM offers a nondestructive method to acquire
Bhanwar Singh, William H. Arnold
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New Technique For Submicron Linewidth Measurement

SPIE Proceedings, 1988
We propose a novel technique to accurately measure submi-cron linewidths on photomasks and wafers. We do this by translating a phase-shifting mask across the surface containing the line whose width we wish to measure. With a Fourier-transform lens, we detect the intensity of the zero-order spatial component of the light coming from the surface as a ...
Yiping Xu, Alan Mar, Glen Wade, Evelyn Hu, John Landry   +4 more
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Improving the uncertainty of photomask linewidth measurements

SPIE Proceedings, 2004
The National Institute of Standards and Technology (NIST) is currently developing a photomask linewidth standard (SRM 2059) with a lower expected uncertainty of calibration than the previous NIST standards (SRMs 473, 475, 476). In calibrating these standards, optical simulation modeling has been used to predict the microscope image intensity profiles ...
J. M. Pedulla, James Potzick, Richard M. Silver   +2 more
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Rayleigh linewidth measurements in liquid helium

Journal of Low Temperature Physics, 1977
A small-angle intensity fluctuation spectrometer has been constructed and used to measure the width Γ of the Rayleigh component of 514.5-nm light scattered from liquid helium. The techniques utilized to maximize the weak scattered signal are described.
E. A. Lazarus, N. C. Ford, R. B. Hallock, K. H. Langley   +3 more
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Improved Accuracy For SEM Linewidth Measurements

SPIE Proceedings, 1987
The diminishing size of VLSI features necessitates the use of a scanning electron microscope (SEM) for making inprocess CD measurements. The intent of this paper is to establish a methodology for improving the accuracy and precision of such measurements.
D. K. Atwood, D. C. Joy
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