Results 111 to 120 of about 301,025 (376)
Measurement of Wafer Focus by Grating Shearing Interferometry
A method applied for improving the measurement precision and efficiency of wafer focusing in an optical lithography instrument (OLI) is introduced. Based on grating shearing interferometry, the defocus and tilt of the wafer are measured by testing the ...
Jian Wang, Song Hu, Xianchang Zhu
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This research investigates an electro‐active chiral optical response (EACOR)‐driven dual‐channel metasurfaces with fast electrical switching rates of 52 ms, and a low operating voltage of 0.5 V. The combination of polyaniline (PANI) thin film and the exceptional topological (ET) phase of chiral gold (Au) meta‐atoms modulate holographic images through ...
Jaekyung Kim+4 more
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Эстампы Виталия Куликова. Своеобразие и развитие его творческой манеры
Виталий Куликов (1935–2015) был одним из крупнейших художников Украины второй половины XX – начала XXI века. В статье рассмотрены особенности его творческой манеры в трактовке формы и образов. Он выработал свой авторский стиль – соединение академического
Есюнин, Егор Алексеевич
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Electroplating has been favored to date as a surface treatment technology in various industries in the development of semiconductors, automobiles, ships, and steel due to its advantages of being a simple, solution-based process, with low cost and high ...
Jinseong Ahn+3 more
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Ternary Transistors With Reconfigurable Polarities
Polarity‐reconfigurable ternary transistors are demonstrated using black phosphorus homojunction with asymmetric contacts and split‐gate structures. Suppression of majority carrier injection, while Fowler–Nordheim tunneling of low‐density minority carriers persists, enables a well‐defined intermediate state with improved on/off ratios.
Dongju Yeom+11 more
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Electrically conductive and room temperature magnetic atomically thin (≈0.8 nm) vanadium doped MoS2 (V‐MoS2) is demonstrated for its spintronic applications. Here, the spin transport at the interface of permalloy (Py) and high spin‐orbit coupling V‐MoS2 magnetic monolayers is shown.
Krishna Rani Sahoo+8 more
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This article discusses the transition of a form of nanoimprint lithography technology, known as Jet and Flash Imprint Lithography (J-FIL), from research to a commercial fabrication infrastructure for leading-edge semiconductor integrated circuits (ICs ...
S. Sreenivasan
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The continuous demand for small portable electronics is pushing the semiconductor industry to develop novel lithographic methods to fabricate the elementary structures for microelectronics devices with dimensions below 10 nm.
Tommaso Jacopo Giammaria+2 more
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An additive and initiator‐free photoresin based on a prepolymer decorated with photoreactive step‐growth units as crosslinkers allows for the fabrication of 3D microstructures with strongly disparate mechanical properties ranging from stiff to soft. Abstract Manufacturing three‐dimensional (3D) microstructures with multi‐material properties via two ...
Tugce Nur Eren+7 more
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COPYRIGHT PROTECTED PLASTIC ARTWORK IN THE LIGHT OF THE EUROPEAN AND ROMANIAN LAWS AND THE ARTWORK VALUE RELEVANCE [PDF]
The plastic artwork, as a species of the "work of art" genre, is subjected to copyright. However, the law does not define plastic artworks, which are generally included in non-exhaustive listings, in phrases of the types: "plastic or graphical artworks,
Mihai OLARIU
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