Results 71 to 80 of about 299,640 (375)
Fabrication of Integrated Lensless Cameras via UV-Imprint Lithography
We report on the construction of a lensless camera with a phase-modulating mask layer integrated directly on an image sensor using the UV-imprint lithography method.
Yujin Lee+6 more
doaj +1 more source
Ultrahigh Piezoelectricity in Truss‐Based Ferroelectric Ceramics Metamaterials
By leveraging the unique combination of polarization direction and loading state, ultrahigh piezoelectricity is achieved through careful tuning of the relative density and scaling ratio in truss‐based ferroelectric metamaterials. This approach enables the simultaneous realization of extremely high piezoelectric constants and ultralow dielectric ...
Jiahao Shi+6 more
wiley +1 more source
On the efficiency of quantum lithography
Quantum lithography promises, in principle, unlimited feature resolution, independent of wavelength. However, in the literature at least two different theoretical descriptions of quantum lithography exist. They differ in to which extent they predict that
Born M+9 more
core +1 more source
Two-photon lithography for 3D magnetic nanostructure fabrication [PDF]
Ferromagnetic materials have been utilized as recording media in data storage devices for many decades. The confinement of a material to a two-dimensional plane is a significant bottleneck in achieving ultra-high recording densities, and this has led to ...
Gwilym Williams+10 more
semanticscholar +1 more source
Structurally Colored Physically Unclonable Functions with Ultra‐Rich and Stable Encoding Capacity
This study reports a design strategy for generating bright‐field resolvable physically unclonable functions with extremely rich encoding capacity coupled with outstanding thermal and chemical stability. The optical response emerges from thickness‐dependent structural color formation in ZnO features, which are fabricated by physical vapor deposition ...
Abidin Esidir+8 more
wiley +1 more source
Robust and adjustable C-shaped electron vortex beams
Wavefront engineering is an important quantum technology, often applied to the production of states carrying orbital angular momentum (OAM). Here, we demonstrate the design and production of robust C-shaped beam states carrying OAM, in which the usual ...
M Mousley+3 more
doaj +1 more source
Reduced basis method for source mask optimization
Image modeling and simulation are critical to extending the limits of leading edge lithography technologies used for IC making. Simultaneous source mask optimization (SMO) has become an important objective in the field of computational lithography.
Burger, S.+6 more
core +1 more source
Plasmonic nanostructures through DNA-assisted lithography
DALI combines DNA origami with conventional top-down fabrication for creating designer high-resolution plasmonic nanostructures. Programmable self-assembly of nucleic acids enables the fabrication of custom, precise objects with nanoscale dimensions ...
B. Shen+8 more
semanticscholar +1 more source
Carbon Nanotube 3D Integrated Circuits: From Design to Applications
As Moore's law approaches its physical limits, carbon nanotube (CNT) 3D integrated circuits (ICs) emerge as a promising alternative due to the miniaturization, high mobility, and low power consumption. CNT 3D ICs in optoelectronics, memory, and monolithic ICs are reviewed while addressing challenges in fabrication, design, and integration.
Han‐Yang Liu+3 more
wiley +1 more source
Nanopatterning with Photonic Nanojets: Review and Perspectives in Biomedical Research
Nanostructured surfaces and devices offer astounding possibilities for biomedical research, including cellular and molecular biology, diagnostics, and therapeutics.
Salvatore Surdo+2 more
doaj +1 more source