Results 81 to 90 of about 255,948 (257)
Reactive sputtering by high power impulse magnetron sputtering (HiPIMS) and direct current magnetron sputtering (DCMS) of a Zr target in Ar/H2 plasmas was employed to deposit Zr-H films on Si(100) substrates, and with H content up to 61 at. % and O contents typically below 0.2 at. % as determined by elastic recoil detection analysis.
Högberg, Hans +7 more
openaire +3 more sources
Recent Progress in Magnetron Sputtering Technology Used on Fabrics
The applications of magnetron sputtering technology on the surface coating of fabrics have attracted more and more attention from researchers. Over the past 15 years, researches on magnetron sputtering coated fabrics have been mainly focused on ...
Xuerui Tan +4 more
semanticscholar +1 more source
Tratamentos de superfície e resistência à corrosão por pites dos aços-ferramenta AISI H12 e H13 [PDF]
Dissertação (mestrado) - Universidade Federal de Santa Catarina, Centro de Ciências Físicas e Matemáticas, Programa de Pós-Graduação em Química, Florianópolis, 2011A resistência à corrosão por pites dos aços-ferramenta AISI H12 revestido com carbeto de ...
Souza, Fernando Sílvio de
core
Avaliação das características resistivas de filmes finos absorvedores de radiação eletromagnética [PDF]
TCC (graduação) - Universidade Federal de Santa Catarina. Campus Joinville. Engenharia Aeroespacial.Filmes finos denotam uma alternativa na solução de problemáticas associadas à blindagem e interferência eletromagnética.
Quadros, Hugo Borges de
core
Time-resolved in-situ nanoparticle size evolution during magnetron sputtering onto liquids
Aggregation and growth of silver nanoparticles (Ag NPs) occur both at the plasma-liquid interface and inside the silicone oil during and after the magnetron sputtering.
Pinar, Eneren +5 more
core +1 more source
The necessary information on the formation of high manganese silicide (Mn4Si7) coating by magnetron sputtering method is presented in this work. The technology and basic modes of creating the necessary targets for a magnetron sputtering device are ...
B.D. Igamov +5 more
doaj +1 more source
Development of lead-free thin-film dielectrics for capacitor applications [PDF]
This PhD project aims to develop lead-free thin-film dielectric materials for fixed value, voltage tunable and high-k zipping variable capacitors using growth techniques that can be scaled for silicon batch fabrication.
Darbyshire, David Anthony
core
Application of CrAlN coatings on carbide substrates in routing of MDF [PDF]
This study deals with the development of Chromium Aluminium Nitride (CrAlN) hard coatings (by varying the nitrogen content in the plasma, the target bias voltage, the working pressure and the deposition time) and their characterization by physical and ...
Martin, J.P.F. +9 more
core +1 more source
Objective: This study aimed to evaluate the effect of coating titanium (Ti) dental implant with polyether ketone ketone (PEKK) polymer using magnetron sputtering on osseointegration, trying to overcome some of the problems associated with Ti alloys ...
Aseel Mohammed Al-Khafaji +4 more
doaj +1 more source
Spokes in high power impulse magnetron sputtering plasmas
High-power impulse magnetron sputtering is a deposition technique where a metal magnetron target is sputtered in a high-density plasma to synthesise thin layers with superior properties on a substrate material.
A. Hecimovic, A. von Keudell
semanticscholar +1 more source

