Results 61 to 70 of about 255,948 (257)
Development of Thin Films Formed by Ti-Zr Alloys at Different Frequencies by the HiPIMS Technique
In this work, thin films based on the Ti-Zr system were studied, deposited on a silicon substrate by the magnetron sputtering technique using simultaneously a combination of High-Power Impulse Magnetron Sputtering (HiPIMS) and Direct Current Magnetron ...
C. J. R. Lustosa +5 more
doaj +1 more source
Numerical methods and time-dependent physical models for the design and diagnostic of pulsed-dc magnetrons [PDF]
Pulsed DC operation of magnetrons is a relatively new sputtering technique that significantly improves the properties of deposited layers. The understanding and control of phenomena taking place during pulsed DC sputtering requires new time-resolved ...
Moiseev, Tamara
core
Characterization of HfO2 Optical Coatings Deposited by MF Magnetron Sputtering
The aim of this work is to determine the influence of medium frequency magnetron sputtering powers on the various properties of hafnium dioxide (HfO2) thin films. Microstructure observations show that an increase in the sputtering power has a significant
A. Wiatrowski +4 more
semanticscholar +1 more source
W-Cr-C-N Nanocomposite Thin-Film Coatings via Reactive Magnetron Sputtering [PDF]
While binary tungsten carbide can form smooth, hard films, these suffer from low fracture toughness. Tungsten nitride films are frequently harder, but are more brittle.
WALOCK, Michael J. +5 more
core
High power impulse magnetron sputtering (HiPIMS) is well known in modern physical vapor deposition (PVD) owing to its high peak power density, high degree of ionization, high plasma density and hence high ion flux towards the substrate that allows ones ...
Haibao Zhang, J. Cherng, Qiang Chen
semanticscholar +1 more source
Hardware and power management for high power impulse magnetron sputtering
The work that led to the development of the HiPIMS technique was initiated at the Moscow Engineering and Physics Institute (MEPhI) in the late 1960s, where high power pulses were applied to diode sputter sources.
Zdeněk Hubička +7 more
core +1 more source
Titanium nitride (TiN) coating has been used in various application as it gives excellent performance in many aspects. It has been proven to prolong machining tool life since the mid-1960s.
C. Kuo +3 more
semanticscholar +1 more source
Growth of WC-Cr-N and WC-Al-N coatings in a RF-magnetron sputtering process [PDF]
Tungsten carbide-based coatings have been used in a wide variety of industrial applications such as high speed cutting tools, extrusion dies, drills, aerospace industries, and more.
Stanishevsky, Andrei V +7 more
core +1 more source
Highly transparent thin film electroluminescent structures offering excellent switch on characteristics, high luminance and large break-down voltages have been deposited onto glass and flexible polymeric materials with no substrate heating using high ...
Thwaites, M +15 more
core +1 more source
Thin films of aluminum-doped zinc oxide (AZO) were prepared using magnetron sputtering and atomic layer deposition (ALD) techniques. Atomic force microscopy (AFM) studies of AZO films surface morphology show that the surface of produced by ALDfilms is a ...
G.K. Mussabek +7 more
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