Results 51 to 60 of about 255,948 (257)

Paradigm shift in thin-film growth by magnetron sputtering: From gas-ion to metal-ion irradiation of the growing film

, 2019
Ion irradiation is a key tool for controlling the nanostructure, phase content, and physical properties of refractory ceramic thin films grown at low temperatures by magnetron sputtering.
G. Greczynski, I. Petrov, J. Greene, L. Hultman   +3 more
semanticscholar   +1 more source

Obtenção e caracterização de filmes de TiO2 depositados sobre cerâmica de revestimento via magnetron sputtering DC [PDF]

, 2007
Tese (doutorado) - Universidade Federal de Santa Catarina, Centro Tecnológico. Programa de Pós-graduação em Ciência e Engenharia de MateriaisO dióxido de titânio (TiO2) na presença de luz ultravioleta atua como catalisador de reações químicas.
Pascoali, Suzy
core  

A Comparative Investigation on the Microstructure and Thermal Resistance of W-Film Sensor Using dc Magnetron Sputtering and High-Power Pulsed Magnetron Sputtering

Magnetochemistry, 2023
Traditional dc magnetron sputtering has a low ionization rate when preparing metallic thin films. With the development of thin film science and the market demand for thin film material applications, it is necessary to improve the density of magnetron ...
Jing Huan, Zhengtao Wu, Qimin Wang, Shihong Zhang, Se-Hun Kwon   +4 more
doaj   +1 more source

Reactive high power impulse magnetron sputtering

, 2019
Reactive magnetron sputtering is essential in many industrial processes where it is applied to deposit compound films or coatings. Reactive sputtering is attractive because a range of compounds can be prepared from a low-cost metal target by addition of ...
Kubart, T., Gudmundsson, Jon Tomas,, Tomáš Kubart, Jon Tomas Gudmundsson, Lundin, Daniel,, Lundin, D., Daniel Lundin, Kubart, Tomas,   +7 more
core   +1 more source

Study on the Effects of Process Parameters on the Micro Properties of Ag Coatings Prepared by Magnetron Sputtering [PDF]

Cailiao Baohu
In this study，the orthogonal experimental method was employed to investigate the effects of magnetron sputtering processes such as sputtering temperature，magnetron target power and sputtering time on the adhesion performance and hydrophobic properties of
HUANG Xinyu, RONG Wenjuan, HUANG Yongling, WANG Jialin
doaj   +1 more source

Desenvolvimento e caracterização de filmes de materiais fracamente condutores depositados por magnetron sputtering para uso em isoladores elétricos de porcelana [PDF]

, 2007
Dissertação (mestrado) - Universidade Federal de Santa Catarina, Centro Tecnológico. Programa de Pós-Graduação em Ciência e Engenharia de Materiais.A Corrente de fuga superficial em isoladores de baixa e alta voltagem contribui com as perdas na ...
Teixeira, Jaime Domingos
core  

Surface Characterization of PEKK Modified by stron-tium –hydroxyapatite coating as implant material Via the magnetron sputtering Deposition technique

Journal of Baghdad College of Dentistry, 2022
Background: The best material for dental implants is polyetherketoneketone (PEKK). However, this substance is neither osteoinductive nor osteoconductive, preventing direct bone apposition.
Ghasak H Jani, Abdalbseet A Fatalla
doaj   +1 more source

Enhanced electrical and optical properties of room temperature deposited Aluminium doped Zinc Oxide (AZO) thin films by excimer laser annealing

, 2016
High quality transparent conductive oxides (TCOs) often require a high thermal budget fabrication process. In this study, Excimer Laser Annealing (ELA) at a wavelength of 248 nm has been explored as a processing mechanism to facilitate low thermal budget
Koutsogeorgis, DC, El Hamali, SO, El Hamali, S.O., Kalfagiannis, N, Kalfagiannis, N., Hou, X., Hou, X, Cranton, WM, Ranson, R, Cranton, W.M., Koutsogeorgis, D.C., Ranson, R.   +11 more
core   +1 more source

Plasma Systems in Thin Film Technology

Доклады Белорусского государственного университета информатики и радиоэлектроники
The article discusses the current trends in the development of ion-plasma systems for ion processing and thin film deposition. Application of pulsed reactive magnetron sputtering for deposition of vanadium oxide films and dependence of process parameters
A. P. Dostanko, S. I. Madveyko, E. V. Telesh, S. N. Melnikov, S. M. Zavadski, D. A. Golosov   +5 more
doaj   +1 more source

Properties and application of multi-functional and structurally colored textile prepared by magnetron sputtering

Journal of Industrial Textiles, 2022
Adopting magnetron sputtering continuous automatic production line equipment for industrial production, polyester fabrics as the substrates were coated with nano-Ag/TiO 2 composite films prepared by direct current sputtering method and direct current ...
Xiaohong Yuan, Wei Yin, Huizhen Ke, Qufu Wei, Zujian Huang, Dongsheng Chen   +5 more
doaj   +1 more source