Results 31 to 40 of about 104,812 (296)
Magnetron sputtering generally increases the temperature of the substrate placed to face the sputtering target above 40 °C because the plasmas are transported through unbalanced magnetic field lines from the sputtering target to the substrate surface ...
Taisei Motomura +4 more
doaj +1 more source
Recent Progress on High-Entropy Films Deposited by Magnetron Sputtering
High-entropy films (HEFs) are of considerable interest in surface engineering applications due to their superior properties, such as good corrosion resistance, good thermal stability and excellent high temperature oxidation.
Mohamed El Garah +2 more
doaj +1 more source
Obtenção e caracterização de filmes de TiO2 depositados sobre cerâmica de revestimento via magnetron sputtering DC [PDF]
Tese (doutorado) - Universidade Federal de Santa Catarina, Centro Tecnológico. Programa de Pós-graduação em Ciência e Engenharia de MateriaisO dióxido de titânio (TiO2) na presença de luz ultravioleta atua como catalisador de reações químicas.
Pascoali, Suzy
core
Morphology, Transport, and Dynamics of Protein Adsorption in Open‐Cell Metal Foam
Stainless steel (SS) open‐cell foams are shown to adsorb more protein per unit area than previously reported 316L SS and chromium oxide surfaces under static and flow conditions. An integrated approach combining 3D pore imaging, flow simulation, and protein adsorption experiments characterizes the foam’s performance.
Chinmaya Prerana Inguva +2 more
wiley +1 more source
Effect of the Magnetron Sputtering Parameters on the Structure andSubstructural Characteristics of Tantalum Diboride Films [PDF]
The effect of the RF- and DC-magnetron sputtering parameters on the structure and substructural characteristics of protective coatings based on tantalum diboride thin films was studied in this work.The results of the studies showed that the sign and ...
A.A.В Goncharov +3 more
doaj +1 more source
Investigating the Low‐Temperature Phase Stability of the Binary Ta–W System
Atomistic simulations show that the binary Ta–W system forms ordered intermetallic phases, B2‐TaW and D03‐TaW3, as 0 K ground states. Configurational entropy, however, lowers the free energy of the disordered bcc solid solution, which becomes the stable phase above about 400 K.
Klemens Lechner +7 more
wiley +1 more source
Traditional dc magnetron sputtering has a low ionization rate when preparing metallic thin films. With the development of thin film science and the market demand for thin film material applications, it is necessary to improve the density of magnetron ...
Jing Huan +4 more
doaj +1 more source
Desenvolvimento e caracterização de filmes de materiais fracamente condutores depositados por magnetron sputtering para uso em isoladores elétricos de porcelana [PDF]
Dissertação (mestrado) - Universidade Federal de Santa Catarina, Centro Tecnológico. Programa de Pós-Graduação em Ciência e Engenharia de Materiais.A Corrente de fuga superficial em isoladores de baixa e alta voltagem contribui com as perdas na ...
Teixeira, Jaime Domingos
core
Reactive high power impulse magnetron sputtering
Reactive magnetron sputtering is essential in many industrial processes where it is applied to deposit compound films or coatings. Reactive sputtering is attractive because a range of compounds can be prepared from a low-cost metal target by addition of ...
Kubart, T. +7 more
core +1 more source
HEA interlayers offer a versatile route for joining high‐performance structural materials. Their compositional and structural design regulates interfacial reactions, suppresses brittle IMCs, and improves metallurgical bonding. Sandwich interlayers further integrate defect healing with precipitation strengthening, enabling improved strength–ductility ...
Lin Yuan +4 more
wiley +1 more source

