Results 21 to 30 of about 255,948 (257)
Российский технологический журнал, 2022 Objectives. When designing production equipment for the implementation of metal film deposition processes, the selection of technological sources for providing the required quality (structure, appearance), maximum process efficiency, and productivity ...
M. V. Nazarenko
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Physics and technology of magnetron sputtering discharges
Plasma Sources Science & Technology, 2020 Magnetron sputtering deposition has become the most widely used technique for deposition of both metallic and compound thin films and is utilized in numerous industrial applications.
J. Gudmundsson
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Materials Research Express, 2020 To improve the interfacial performance of carbon fiber (CF) and epoxy resin, the surface of CF was modified using magnetron sputtering technology, and a CF epoxy resin (CFER) composite was prepared using injection molding technology.
Li Yang +4 more
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Materials Research Express, 2020 We report a comprehensive study on influence of oxygen partial pressure on NiO thin films grown on glass substrates in a combined argon and oxygen ambience by reactive dc magnetron sputtering.
P. Salunkhe, Muhammed Ali A V, D. Kekuda
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Features Multilevel Metallization Forming a Submicron Structures of Large Integrated Circuits
Фізика і хімія твердого тіла, 2017 This paper analyzesaluminum alloys that are used to form multilevel metallization in the submicron LSI/VLSI and magnetic alloys that are used for the production of magnetic disks of external storage devices with a large amount of memory.
S. P. Novosyadlyj +2 more
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Synthesis and Mechanical Characterization of a CuMoTaWV High-Entropy Film by Magnetron Sputtering
ACS Applied Materials and Interfaces, 2020 Development of high-entropy alloy (HEA) films is a promising and cost-effective way to incorporate these materials of superior properties in harsh environments. In this work, a refractory high-entropy alloy (RHEA) film of equimolar CuMoTaWV was deposited
S. Alvi +7 more
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Preparation and characterization of the defect–conductivity relationship of Ga-doped ZnO thin films deposited by nonreactive radio-frequency–magnetron sputtering [PDF]
, 2010 Ga-doped ZnO (ZnO:Ga) thin films were prepared by radio-frequency–magnetron sputtering on conventional glass substrates at room temperature. The structural, electrical, and optical properties of these films as a function of argon pressure and film ...
Pasquet, Isabelle +11 more
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AIP Advances, 2021 The thrusts induced by the 45-mm-diameter DC and high power impulse magnetron sputtering [DC magnetron sputtering (DCMS) and high power impulse magnetron sputtering (HiPIMS)] sources are assessed by using the pendulum thrust balance, where the ...
Kazunori Takahashi, Hidemasa Miura
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Water vapor in DC reactive magnetron sputtering plasma : characteristics and applications [PDF]
, 2023 DC反応性マグネトロンスパッタリングにおける水蒸気プラズマを用いた酸化亜鉛薄膜の成膜について、薄膜成膜とプラズマソースでの検討を行いました。DCマグネトロンスパッタリングプラズマの特性は、ターゲット表面、基板蒸着領域、バルクプラズマの3つの重要な領域で詳細に調査しました。プラズマソースからの制御された輸送は、パルス化されたコンジットタイプの取り出し電極まで拡張しました。プラズマにさらされた表面への水の吸着とプラズマ中の負イオンの存在は、局所的なプラズマパラメータに大きな影響を与えました。The ...
31069 +2 more
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The Corrosion Resistance of Al Film on AZ31 Magnesium Alloys by Magnetron Sputtering
Metals, 2021 Nano Al films were prepared on AZ31 magnesium alloy samples by DC magnetron sputtering. The effects of sputtering power on the microstructure and corrosion resistance of the Al film were investigated. The results show that the surface of aluminum film is
Zhengyuan Gao +5 more
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