Results 21 to 30 of about 15,883 (266)
The doping of two-dimensional materials provides them with tunable physical properties and broadens their application. In this study, the doping of tungsten disulfide with metallic Sn atoms via a co-sputtering technique was demonstrated.
Nabeel H. Alharthi +5 more
doaj +1 more source
Magnetron sputtering generally increases the temperature of the substrate placed to face the sputtering target above 40 °C because the plasmas are transported through unbalanced magnetic field lines from the sputtering target to the substrate surface ...
Taisei Motomura +4 more
doaj +1 more source
Recent Progress on High-Entropy Films Deposited by Magnetron Sputtering
High-entropy films (HEFs) are of considerable interest in surface engineering applications due to their superior properties, such as good corrosion resistance, good thermal stability and excellent high temperature oxidation.
Mohamed El Garah +2 more
doaj +1 more source
RF Magnetron Sputtered Magnetic Nanowire
Nanomaterials are at the leading edge of the rapidly developing field of nanotechnology. Their unique sizedependent properties make these materials superior and indispensable in many areas of human activity [1]. Fuel-free nanomotors (generally hydrogen peroxide (H 2 O 2 ) is used as a fuel) are essential for future in-vivo biomedical transport and drug-
Karaca, Gozde Yurdabak +3 more
openaire +4 more sources
Effect of the Magnetron Sputtering Parameters on the Structure andSubstructural Characteristics of Tantalum Diboride Films [PDF]
The effect of the RF- and DC-magnetron sputtering parameters on the structure and substructural characteristics of protective coatings based on tantalum diboride thin films was studied in this work.The results of the studies showed that the sign and ...
A.A.В Goncharov +3 more
doaj +1 more source
Traditional dc magnetron sputtering has a low ionization rate when preparing metallic thin films. With the development of thin film science and the market demand for thin film material applications, it is necessary to improve the density of magnetron ...
Jing Huan +4 more
doaj +1 more source
Tailoring Functional Properties of Ti–Ni–Cu Shape Memory Alloy Thin Films for MEMS Actuators
A comprehensive study of critical parameters required to develop well‐performing Ti–Ni–Cu thin film shape memory alloy microactuators is provided. Materials science and device integration aspects are integrated by addressing structural and physical relationships using complementary characterization techniques as well as a practical fabrication solution
Elaheh Akbarnejad +6 more
wiley +1 more source
Study on the Effects of Process Parameters on the Micro Properties of Ag Coatings Prepared by Magnetron Sputtering [PDF]
In this study,the orthogonal experimental method was employed to investigate the effects of magnetron sputtering processes such as sputtering temperature,magnetron target power and sputtering time on the adhesion performance and hydrophobic properties of
HUANG Xinyu, RONG Wenjuan, HUANG Yongling, WANG Jialin
doaj +1 more source
Magnetron sputtering technology benefits from an easy process parameter adjustment strategy, good experimental reproducibility, and high-quality film formation; thus, it is widely used in thin-film electronic devices.
Hua Zhu +7 more
doaj +1 more source
Grain boundary triple junctions are an essential ingredient of the microstructure of polycrystalline materials. In this study, a triple junction is observed using atomic‐resolution scanning transmission electron microscopy and characterized. Computer simulations reveal that the junction has a dislocation character that is determined by the joining ...
Tobias Brink +4 more
wiley +1 more source

