Results 21 to 30 of about 15,883 (266)

Investigation on structural and opto-electronic properties of substitutional Sn doped WS2 by co-sputtering technique

open access: yesJournal of Materials Research and Technology, 2021
The doping of two-dimensional materials provides them with tunable physical properties and broadens their application. In this study, the doping of tungsten disulfide with metallic Sn atoms via a co-sputtering technique was demonstrated.
Nabeel H. Alharthi   +5 more
doaj   +1 more source

Suppression of substrate temperature in DC magnetron sputtering deposition by magnetic mirror-type magnetron cathode

open access: yesAIP Advances, 2023
Magnetron sputtering generally increases the temperature of the substrate placed to face the sputtering target above 40 °C because the plasmas are transported through unbalanced magnetic field lines from the sputtering target to the substrate surface ...
Taisei Motomura   +4 more
doaj   +1 more source

Recent Progress on High-Entropy Films Deposited by Magnetron Sputtering

open access: yesCrystals, 2022
High-entropy films (HEFs) are of considerable interest in surface engineering applications due to their superior properties, such as good corrosion resistance, good thermal stability and excellent high temperature oxidation.
Mohamed El Garah   +2 more
doaj   +1 more source

RF Magnetron Sputtered Magnetic Nanowire

open access: yes2017 IEEE International Conference on Plasma Science (ICOPS), 2017
Nanomaterials are at the leading edge of the rapidly developing field of nanotechnology. Their unique sizedependent properties make these materials superior and indispensable in many areas of human activity [1]. Fuel-free nanomotors (generally hydrogen peroxide (H 2 O 2 ) is used as a fuel) are essential for future in-vivo biomedical transport and drug-
Karaca, Gozde Yurdabak   +3 more
openaire   +4 more sources

Effect of the Magnetron Sputtering Parameters on the Structure andSubstructural Characteristics of Tantalum Diboride Films [PDF]

open access: yesЖурнал нано- та електронної фізики, 2017
The effect of the RF- and DC-magnetron sputtering parameters on the structure and substructural characteristics of protective coatings based on tantalum diboride thin films was studied in this work.The results of the studies showed that the sign and ...
A.A.В Goncharov   +3 more
doaj   +1 more source

A Comparative Investigation on the Microstructure and Thermal Resistance of W-Film Sensor Using dc Magnetron Sputtering and High-Power Pulsed Magnetron Sputtering

open access: yesMagnetochemistry, 2023
Traditional dc magnetron sputtering has a low ionization rate when preparing metallic thin films. With the development of thin film science and the market demand for thin film material applications, it is necessary to improve the density of magnetron ...
Jing Huan   +4 more
doaj   +1 more source

Tailoring Functional Properties of Ti–Ni–Cu Shape Memory Alloy Thin Films for MEMS Actuators

open access: yesAdvanced Engineering Materials, EarlyView.
A comprehensive study of critical parameters required to develop well‐performing Ti–Ni–Cu thin film shape memory alloy microactuators is provided. Materials science and device integration aspects are integrated by addressing structural and physical relationships using complementary characterization techniques as well as a practical fabrication solution
Elaheh Akbarnejad   +6 more
wiley   +1 more source

Study on the Effects of Process Parameters on the Micro Properties of Ag Coatings Prepared by Magnetron Sputtering [PDF]

open access: yesCailiao Baohu
In this study,the orthogonal experimental method was employed to investigate the effects of magnetron sputtering processes such as sputtering temperature,magnetron target power and sputtering time on the adhesion performance and hydrophobic properties of
HUANG Xinyu, RONG Wenjuan, HUANG Yongling, WANG Jialin
doaj   +1 more source

Preparation of TiO2 electron transport layer by magnetron sputtering and its effect on the properties of perovskite solar cells

open access: yesEnergy Reports, 2022
Magnetron sputtering technology benefits from an easy process parameter adjustment strategy, good experimental reproducibility, and high-quality film formation; thus, it is widely used in thin-film electronic devices.
Hua Zhu   +7 more
doaj   +1 more source

Triple Junctions as Dislocation‐Like Defects: The Role of Grain Boundary Crystallography Revealed by Experiment and Atomistic Simulation

open access: yesAdvanced Engineering Materials, EarlyView.
Grain boundary triple junctions are an essential ingredient of the microstructure of polycrystalline materials. In this study, a triple junction is observed using atomic‐resolution scanning transmission electron microscopy and characterized. Computer simulations reveal that the junction has a dislocation character that is determined by the joining ...
Tobias Brink   +4 more
wiley   +1 more source

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