Results 41 to 50 of about 104,812 (296)
Magnetron sputtering technology benefits from an easy process parameter adjustment strategy, good experimental reproducibility, and high-quality film formation; thus, it is widely used in thin-film electronic devices.
Hua Zhu +7 more
doaj +1 more source
Supporting AI Readiness Through Digital Workflows in Materials Science
Digitalization drives innovation in materials science by connecting data silos and turning heterogeneous processes into reusable research pipelines. Across 13 MaterialDigital projects, digital workflows reveal complementary pathways toward AI‐ready materials research, founded on structured data, persistent artifacts, executable orchestration, and ...
Marian Bruns +67 more
wiley +1 more source
Study on the Effects of Process Parameters on the Micro Properties of Ag Coatings Prepared by Magnetron Sputtering [PDF]
In this study,the orthogonal experimental method was employed to investigate the effects of magnetron sputtering processes such as sputtering temperature,magnetron target power and sputtering time on the adhesion performance and hydrophobic properties of
HUANG Xinyu, RONG Wenjuan, HUANG Yongling, WANG Jialin
doaj +1 more source
ABSTRACT Electronic waste has emerged as a major environmental challenge, driven by the massive consumption and a limited lifetime of modern electronic devices, stimulating the development of sustainable electronics. Here, an all‐biomaterial gelatin‐choline‐citric acid ([Ch][CA]) ionogel is developed as an active binder to realize self‐sintered ...
Lin Guo +10 more
wiley +1 more source
The relevance of the work is caused by the necessity to form nanoscale resistive Ni-Ti films with reproducible parameters for being used in measuring devices operating at high temperatures.
Valery Vasilev, Alexander Khoshev
doaj +2 more sources
Plasma Systems in Thin Film Technology
The article discusses the current trends in the development of ion-plasma systems for ion processing and thin film deposition. Application of pulsed reactive magnetron sputtering for deposition of vanadium oxide films and dependence of process parameters
A. P. Dostanko +5 more
doaj +1 more source
Development of Thin Films Formed by Ti-Zr Alloys at Different Frequencies by the HiPIMS Technique
In this work, thin films based on the Ti-Zr system were studied, deposited on a silicon substrate by the magnetron sputtering technique using simultaneously a combination of High-Power Impulse Magnetron Sputtering (HiPIMS) and Direct Current Magnetron ...
C. J. R. Lustosa +5 more
doaj +1 more source
Significant nanoscale oxygen diffusion coefficient variations are measured in ferroelectric hafnium zirconium oxide films with grain boundaries and electrode interfaces exhibiting values 104 times larger than the grain cores. Overall coefficients are 10X larger for films prepared with metal nitride electrodes compared to refractory metals. New insights
Liron Shvilberg +6 more
wiley +1 more source
Advances in Flexible Thermoelectric Materials and Devices Fabricated by Magnetron Sputtering
Due to the direct conversion between thermal and electrical energy, thermoelectric materials and their devices exhibit great potential for power generation and refrigeration.
Boxuan Hu +8 more
doaj +1 more source
Adopting magnetron sputtering continuous automatic production line equipment for industrial production, polyester fabrics as the substrates were coated with nano-Ag/TiO 2 composite films prepared by direct current sputtering method and direct current ...
Xiaohong Yuan +5 more
doaj +1 more source

