Results 41 to 50 of about 255,948 (257)

Dependence of Optical Emission Spectra on Argon Gas Pressure during Modulated Pulsed Power Magnetron Sputtering (MPPMS)

Plasma, 2021
Modulated pulsed power magnetron sputtering (MPPMS) of titanium was investigated as a function of argon gas pressure using optical emission spectroscopy (OES).
Masaomi Sanekata, Hiroshi Nishida, Yuki Nakagomi, Yoshihiro Hirai, Nobuo Nishimiya, Masahide Tona, Naoyuki Hirata, Hiroaki Yamamoto, Keizo Tsukamoto, Keijiro Ohshimo, Fuminori Misaizu, Kiyokazu Fuke   +11 more
doaj   +1 more source

Electrical and optical properties of copper oxide thin films prepared by DC magnetron sputtering

, 2020
Copper oxides (CuO, Cu2O) have promising application potential in sensors or solar cells. In this study, copper oxide thin films were prepared by reactive DC magnetron sputtering using helicon plasma.
Anmar H. Shukor, H. Alhattab, I. Takano
semanticscholar   +1 more source

Magnetron Sputtering Preserves Solid Electrolyte Toughness after Shot Peening and Enhances Critical Current Density in Lithium-Metal Anode All-Solid-State Batteries

Electrochemistry
To enable fast charging in lithium-metal anode all-solid-state batteries, the suppression of lithium dendrite formation at the solid electrolyte (SE) interface is critical.
Atsuro OKUMURA, Hito FUKUSUMI, Manabu KODAMA   +2 more
doaj   +1 more source

Effect of Ion Magnetron Sputtering Method on Scanning Electron Microscopy (SEM)Images of Materials with Different Surface Properties [PDF]

Cailiao Baohu
In order to investigate the effect of ion magnetron sputtering parameters on the scanning electron microscopy (SEM) images of nonconductive materials with different surface properties， the advantages and limitations of various ion magnetron sputtering ...
ZHANG Jie, ZOU Junwen, LIU Xueguang, LI Xiaoying
doaj   +1 more source

The Influence of Oxygen Pressure on ZnO:Al Thin Films Properties Grown Layer by Layer Growth Method at Magnetron Sputtering

Фізика і хімія твердого тіла, 2015
The influence of oxygen pressure in the deposition chamber on the structure, morphology, optical and electrical properties of aluminum doped ZnO films deposited by a layer by layer growth method in magnetron sputtering on glass substrates was studied ...
A. I. Evtushenko, O. I. Bykov, L. O. Klochkov, O. S. Lytvyn, V. M. Tkach, O. M. Kutsay, S. P. Staryk, V. A. Baturyn, O. Y. Karpenko, M. G. Dusheyko, G. V. Lashkarev   +10 more
doaj   +1 more source

Suppression of substrate temperature in DC magnetron sputtering deposition by magnetic mirror-type magnetron cathode

AIP Advances, 2023
Magnetron sputtering generally increases the temperature of the substrate placed to face the sputtering target above 40 °C because the plasmas are transported through unbalanced magnetic field lines from the sputtering target to the substrate surface ...
Taisei Motomura, Kenshin Takemura, Toshimi Nagase, Nobutomo Morita, Tatsuo Tabaru   +4 more
doaj   +1 more source

Investigation on structural and opto-electronic properties of substitutional Sn doped WS2 by co-sputtering technique

Journal of Materials Research and Technology, 2021
The doping of two-dimensional materials provides them with tunable physical properties and broadens their application. In this study, the doping of tungsten disulfide with metallic Sn atoms via a co-sputtering technique was demonstrated.
Nabeel H. Alharthi, Saud M. Almotairy, Hamad F. Alharbi, M. Shahinuzzaman, Monis Luqman, K. Sobayel   +5 more
doaj   +1 more source

Packet-Pulse Dual Magnetron Sputtering [PDF]

Russian Physics Journal, 2019
The paper presents the results of experimental study of the discharge formed by a dual (DU) magnetron sputtering system (MSS) with aluminum targets in the mode of packet-pulse magnetron sputtering of high power (called deep oscillation magnetron sputtering (DOMS) in foreign literature).
V.A. Semenov, S.V. Rabotkin, V.O. Oskirko, A.N. Zakharov, A.P. Pavlov   +4 more
openaire   +1 more source

Effect of the Magnetron Sputtering Parameters on the Structure andSubstructural Characteristics of Tantalum Diboride Films [PDF]

Журнал нано- та електронної фізики, 2017
The effect of the RF- and DC-magnetron sputtering parameters on the structure and substructural characteristics of protective coatings based on tantalum diboride thin films was studied in this work.The results of the studies showed that the sign and ...
A.A.В Goncharov, A.N.В Yunda, I.V.В Shelest, В V.V.В Buranich   +3 more
doaj   +1 more source

Preparation of TiO2 electron transport layer by magnetron sputtering and its effect on the properties of perovskite solar cells

Energy Reports, 2022
Magnetron sputtering technology benefits from an easy process parameter adjustment strategy, good experimental reproducibility, and high-quality film formation; thus, it is widely used in thin-film electronic devices.
Hua Zhu, Tian-hao Zhang, Quan-ya Wei, Shi-jin Yu, Hao Gao, Ping-chun Guo, Jia-ke Li, Yan-xiang Wang   +7 more
doaj   +1 more source