Results 71 to 80 of about 255,948 (257)
Magnetron sputtering is a well-known technique that is commonly used for the deposition of thin compact films. However, as was shown in the 1990s, when sputtering is performed at pressures high enough to trigger volume nucleation/condensation of the ...
O. Kylián +11 more
semanticscholar +1 more source
Physics of high power impulse magnetron sputtering discharges
The most striking difference between HiPIMS and other magnetron sputtering discharges, in terms of the plasma process itself, lies in the high-power discharge pulses applied and the large discharge currents generated.
Brenning, Nils, +11 more
core +1 more source
Design and Analysis of a New Excitation Structure for Magnetron Sputtering
Magnetron sputtering systems are widely used for depositing industrially important coatings. Research has been conducted to optimize and improve these structures to increase coating effectiveness and target utilization.
Ze-da Su +6 more
doaj +1 more source
A fluid model of pulsed direct current planar magnetron discharge
We simulated a pulsed direct current (DC) planar magnetron discharge using fluid model, solving for species continuity, momentum, and energy transfer equations, coupled with Poisson equation and Lorentz force for electromagnetism. Based on a validated DC
Si Bui Quang Tran +3 more
doaj +1 more source
Applications of CrAlN ternary system in wood machining of Medium Density Fibreboard (MDF) [PDF]
Nowadays, medium density fibreboard (MDF) composite wood is more and more used in the furniture industry to replace bulk wood such as oak, beech, etc. Indeed, this material presents good mechanical properties, is easy to machine, homogeneous, exists in ...
Marchal, R. +10 more
core +1 more source
Effect of magnetron sputtering process parameters on the conductivity of thin metal film
This paper focuses on the effect of magnetron sputtering process parameters on the performance of thin metal film. Copper–tin alloy metal film was deposited on both sides of the PVDF film using direct current magnetron sputtering technology, and the ...
Shuangjie Liu +4 more
doaj +1 more source
Properties of titanium thin film deposited by RF and DC magnetron sputtering at low temperatures
Ti thin films with superior surface properties are deposited in a low-temperature processing environment. The properties of Ti films deposited by magnetron sputtering at substrate temperatures below 200 °C and different RF (radio frequency, 13.56 MHz ...
Chiyun Bang, Ju-Hong Cha
doaj +1 more source
Advanced coatings play an important role in a wide range of industrial applications. These coatings are commonly used in machining tools due to their high hardness and wear resistance, but also can be applied in jewellery and decorative purposes ...
A. Baptista +5 more
semanticscholar +1 more source
Fabrication and Characterization of Titanium-doped Hydroxyapatite Thin Films
Hydroxyapatite [Ca10(PO4)6(OH)2, HA] is used in many biomedical applications including bone grafts and joint replacements. Due to its structural and chemical similarities to human bone mineral, HA promotes growth of bone tissue directly on its surface ...
core +1 more source
Influence of Yttrium on the Thermal Stability of Ti-Al-N Thin Films [PDF]
Ti(1-x)Al(x)N coated tools are commonly used in high-speed machining, where the cutting edge of an end-mill or insert is exposed to temperatures up to 1100 degrees C.
Kiener, Daniel +7 more
core +1 more source

