Results 91 to 100 of about 187,352 (298)

Application of Microwave Plasma Pre-treatment in Enhancement of the Desizing Efficiency of WSP-Sized Woven PET

open access: yesChemical Engineering Transactions, 2017
This paper aims to replace the traditional alkali desizing of PET fabrics with the combination of microwave plasma treatment and water desizing. To this end, the microwave plasma pre-treatment was applied to enahnce the desizing efficiency of PET fabrics
Banghai Wang   +4 more
doaj   +1 more source

VUV irradiance measurement of a 2.45 GHz microwave-driven hydrogen discharge

open access: yes, 2015
Absolute values of VUV-emission of a 2.45 GHz microwave-driven hydrogen discharge are reported. The measurements were performed with a robust and straightforward method based on a photodiode and optical filters.
Kalvas, T.   +6 more
core   +1 more source

Additive Manufacture of Diamond:Titanium Hybrid Quantum Sensors

open access: yesAdvanced Materials Interfaces, EarlyView.
ABSTRACT Additive manufacture represents one of the most advanced techniques for the creation of complex parts for applications as diverse as aerospace and implant surgery. However, a challenge with bespoke manufacture of metal parts is the incorporation of sensor elements in a fashion compatible with the 3D printing process.
Daniel Stavrevski   +12 more
wiley   +1 more source

Exploring the Potential of Zero‐Dimensional Carbon Nanomaterials in Photoluminescent, Electrochemiluminescent and Electrochemical Sensors

open access: yesAdvanced Materials Interfaces, EarlyView.
Zero‐dimensional carbon nanomaterials are presented as multifunctional platforms linking structure, property, and sensing performance. Surface engineering and heteroatom doping modulate electron‐transfer and luminescent behavior, enabling electrochemical, photoluminescent, and electrochemiluminescent detection. Fundamental design principles, analytical
Gustavo Martins   +8 more
wiley   +1 more source

In situ electromagnetic field diagnostics with an electron plasma in a Penning–Malmberg trap

open access: yesNew Journal of Physics, 2014
We demonstrate a novel detection method for the cyclotron resonance frequency of an electron plasma in a Penning–Malmberg trap. With this technique, the electron plasma is used as an in situ diagnostic tool for the measurement of the static magnetic ...
C Amole   +39 more
doaj   +1 more source

Systematic research on the performance of self-designed microwave plasma reactor for CVD high quality diamond

open access: yesDefence Technology, 2018
Optical grade diamond, in particular, high-end products, are mainly used for aerospace and defense purposes. How to manufacture them with higher quality and lower cost was critical technology.
Xiao-Jing Li   +8 more
doaj   +1 more source

Experimental and theoretical study of artificial plasma layers produced by two intersecting beams in a chamber [PDF]

open access: yes
The work done on the Bragg scattering of electromagnetic waves by microwave produced plasma layers is reported. Also summarized is the work accomplished on the propagation of high power microwave pulses in an air breakdown environment.
Kuo, S. P., Zhang, Y. S.
core   +1 more source

The Process of Plasma Chemical Photoresist Film Ashing from the Surface of Silicon Wafers [PDF]

open access: yes, 2017
At present, the research for finding new technical methods of treating materials with plasma, including the development of energy and resource saving technologies for microelectronic manufacturing, is particularly actual.In order to improve the ...
Bordusau , Siarhei   +2 more
core  

Evolution of Materials and Device Stacks for HfO2‐Based Ferroelectric Memories

open access: yesAdvanced Materials Interfaces, EarlyView.
This review summarizes engineering strategies for HfO2 based ferroelectric memories with focus on FeCAP and FeFET structures. It describes how dopant design, stress effects, and interface engineering improve the bulk ferroelectric response. It further discusses how channel engineering supports reliable memory characteristics and scalable integration ...
Eunjin Kim, Jiyong Woo
wiley   +1 more source

The Process of Plasma Chemical Photoresist Film Ashing from the Surface of Silicon Wafers

open access: yesActa Polytechnica, 2013
At present, the research for finding new technical methods of treating materials with plasma, including the development of energy and resource saving technologies for microelectronic manufacturing, is particularly actual.In order to improve the ...
Siarhei Bordusau   +2 more
doaj  

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