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Influence of illumination non-uniformity on pattern fidelity
Optical Microlithography XVIII, 2005As projection optics have drastically improved over time, the effects of illumination non-uniformity have a more significant impact on the pattern fidelity. For instance elliptical uniformity results in a difference in sigma for horizontal and vertical features and radial non-uniformity results in a difference in through pitch patterning.
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Patterns to Improve Fidelity for Model-Based Testing
2022 IEEE International Conference on Software Testing, Verification and Validation Workshops (ICSTW), 2022Yasuaki Hiruta +2 more
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Nucleation, Pattern Development, and Fidelity in the Photoelectrodeposition of Se-Te Nanostructures
ECS Meeting Abstracts, 2020The electrochemical growth of Se-Te under polarized illumination results in anisotropic, highly-ordered lamellar nanostructures, tunable by input wavelength. This spontaneous growth occurs at room temperature, in an isotropic solution, with no templating or chemically-directing agents, and with mW-cm-2 illumination intensity with no requirement for ...
Ethan Simonoff +3 more
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Can visual fixation patterns improve image fidelity assessment?
2008 15th IEEE International Conference on Image Processing, 2008This paper presents the results of a computational experiment designed to investigate the extent to which metrics of image fidelity can be improved through knowledge of where humans tend to fixate in images. Five common metrics of image fidelity were augmented using two sets of fixation data, one set obtained under task-free viewing conditions and ...
Eric C. Larson +2 more
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Holistic lithography and metrology's importance in driving patterning fidelity
SPIE Proceedings, 2016There has been 43 years of overlay metrology in microlithography, and how did we get here? This presentation covered three areas: stepper metrology improvements, improved correction potential, and extended feedback loop outside stepper. The presenter went on to discuss where we are today In terms of holistic lithography, as well as where we are going ...
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Novel method for quality assurance of two-dimensional pattern fidelity
SPIE Proceedings, 2007This paper proposes an evaluation pattern generating method that realizes stable printing for any two-dimensional feature. Below 65nm design node, even in the case of using the most advanced optical techniques, the resolution limit is approached. As a result, patterning fidelity to the target worsens in low k 1 lithography conditions. Complex layout
Shimon Maeda +3 more
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Pattern fidelity improvement of chemo-epitaxy DSA process for high-volume manufacturing
SPIE Advanced Lithography, 2016M. Muramatsu +11 more
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Impact of sequential infiltration synthesis on pattern fidelity of DSA lines
Advanced Lithography, 2015Arjun Singh +6 more
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Auto-Pytorch: Multi-Fidelity MetaLearning for Efficient and Robust AutoDL
IEEE Transactions on Pattern Analysis and Machine Intelligence, 2021Lucas Zimmer, M. Lindauer, F. Hutter
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