Results 281 to 290 of about 6,320,743 (323)

A fast process variation and pattern fidelity aware mask optimization algorithm

2014 IEEE/ACM International Conference on Computer-Aided Design (ICCAD), 2014
Ahmed Awad 0002, Atsushi Takahashi 0001, Satoshi Tanaka, Chikaaki Kodama   +3 more
openaire   +2 more sources

Patterns of Communication in High-Fidelity Simulation

Journal of Nursing Education, 2015
High-fidelity simulation is commonplace in nursing education. However, critical thinking, decision making, and psychomotor skills scenarios are emphasized. Scenarios involving communication occur in interprofessional or intraprofessional settings.
Judy K, Anderson, Kimberly, Nelson
openaire   +2 more sources

DiffSwap: High-Fidelity and Controllable Face Swapping via 3D-Aware Masked Diffusion

Computer Vision and Pattern Recognition, 2023
In this paper, we propose DiffSwap, a diffusion model based framework for high-fidelity and controllable face swapping. Unlike previous work that relies on carefully designed network architectures and loss functions to fuse the information from the ...
Wenliang Zhao, Yongming Rao, Weikang Shi, Zuyan Liu, Jie Zhou, Jiwen Lu   +5 more
semanticscholar   +1 more source

Pattern fidelity improvement by considering the underlying patterns at defocus

SPIE Proceedings, 2002
The model-based OPC is considered in 0.13um and beyond generation. However, the accuracy of model-based OPC is based on the measurement of test patterns on bare silicon wafers using the optimized exposure condition. The through pitch patterns and systematic patterns should be contained in the test patterns design.
Karl Chiou, Jerry Huang, S. Lee, Chih Yu Lee, Nail Tang, Janet Peng   +5 more
openaire   +1 more source

Mask pattern fidelity quantification

SPIE Proceedings, 2003
In this paper, a quantitative evaluation of mask quality in the domain of 2D pattern fidelity and a method of assessing the OPC model effectiveness are investigated. The spirit of our algorithm is to characterize the wafer lithographic performances of both the real physical mask and the ideal OPCed layout mask that the physical mask is based on.
Wen-Chuan Wang, Shih-Ming Chang, Chih-Cheng C. Chin, Chi-Lun Lu, Angus S.J. Chin, Hung-Chang Hsieh, Shinn-Sheng Yu   +6 more
openaire   +1 more source

Patterning in the era of atomic scale fidelity

SPIE Proceedings, 2015
Relentless scaling of advanced integrated devices drives feature dimensions towards values which can be expressed in small multiples of the lattice spacing of silicon. One of the consequences of dealing with features on such an atomic scale is that surface properties start to play an increasingly important role. To encompass both dimensional as well as
Thorsten Lill, Samantha Tan, Keren J. Kanarik, Yoshie Kimura, Gowri Kamarthy, Meihua Shen, Vahid Vahedi, Jeffrey Marks, Richard A. Gottscho   +8 more
openaire   +1 more source

Spherical Fidelity Patterns of UWB Antennas

IEEE Transactions on Antennas and Propagation, 2011
The time domain radiation properties of UWB antennas are analyzed, especially the angular dependent impulse distortion, with respect to the signal transmitted in the main beam direction, is investigated. The correlation properties of the radiated pulses are determined by the so called fidelity F. The fidelity F is together with the peak pulse amplitude
Elena Pancera, Thomas Zwick, Werner Wiesbeck   +2 more
openaire   +1 more source

Experimental comparison of resolution and pattern fidelity in single- and double-layer planar lens lithography [PDF]

, 2006
An experimental comparison of the performance of single- and double-layer planar lens lithography (PLL) has been carried out. A direct comparison is made with a single 50nm silver lens and a double silver lens with two 30nm layers.
D. Melville, R. Blaikie
semanticscholar   +2 more sources

High-fidelity chemical patterning on oxide-free germanium

Journal of Physics: Condensed Matter, 2012
Oxide-free germanium can be chemically patterned directly with self-assembled monolayers of n-alkanethiols via submerged microcontact printing. Native germanium dioxide is water soluble; immersion activates the germanium surface for self-assembly by stripping the oxide.
J Nathan, Hohman, Moonhee, Kim, Jeffrey A, Lawrence, Patrick D, McClanahan, Paul S, Weiss   +4 more
openaire   +2 more sources

Evaluation of the impact of pattern fidelity on photomask inspectability

SPIE Proceedings, 1999
In recent years a manufacturable inspection recipe has been limited by the number of nuisance defects instead of the true sensitivity capability of the inspection tool for the top of the line products. In general, the nuisance defects are a result from either sub-resolution mask design or non- uniformity issue of mask pattern fidelity. Pattern fidelity
Kevin S. Woolverton, Gang Liu, Peter Zwigl, Wayne E. Ruch   +3 more
openaire   +1 more source