Results 261 to 270 of about 6,320,743 (323)
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A Quantitative Metric for Pattern Fidelity of Bioprinted Cocultures
Artificial Organs, 2012AbstractThis article describes a quantitative metric for coculture pattern fidelity and its use in the assessment of bioprinting systems. Increasingly, bioprinting is used to create in vitro cell and tissue models for the purpose of studying cell behavior and cell–cell interaction. To create meaningful models, a bioprinting system must be able to place
Richard E Groff, T Burg, Karen J L Burg
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Pattern fidelity verification for logic design in EUV lithography
Proceedings of SPIE, 2014We verify image fidelity after mask 3D aware-OPC (using Mentor Graphics Domain Decomposition Method) and quantify pattern placement error (PPE) on wafer. First we show experimental pattern fidelity improvement of DDM-OPCed 2D-images of logic devices in 10 nm technology node with the latest NXE3300B EUV exposure tool. We then compare pattern fidelity in
Minoru Sugawara +2 more
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Pattern fidelity improvement of DSA hole patterns
Novel Patterning Technologies 2023, 2023Directed Self-Assembly (DSA) has been reported many times in the past decade as a technique for forming fine patterns1- 12. As processes for application to the semiconductor process, the grapho-epitaxy process forms a desired pattern in an isolated area ...
Makoto Muramatsu +6 more
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Pattern fidelity in multiple-patterning process
SPIE Proceedings, 2014Pattern roughness is expected to be an important issue in semiconductor scaling going forward. We performed smoothing of ArF photoresists (PRs) by a PR hardening technique called direct current superposition (DCS) cure,1) and we showed that this technique can achieve a roughness smoothing effect for PRs having various line edge roughness (LER ...
Masatoshi Yamato +5 more
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Pattern fidelity control in Multi-patterning towards 7nm node
2016 IEEE 16th International Conference on Nanotechnology (IEEE-NANO), 2016Multi-patterning technology using 193nm immersion lithography has been used since the 22nm logic node generation and it appears that it will continue to be used as far as the 14nm generation. At the same time, the industry trend is to simplify pattern design and reduce complexity in lithography though single directional (1D) layout[1].
H. Yaegashi
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Pattern fidelity enhancement with OPC pattern generation on laser lithography
SPIE Proceedings, 2006Laser pattern generators ALTA 3500 and 3700 are widely used for 0.18 micron and above technology nodes in photomask manufacturing. They have low butting, high throughput and high position accuracy, with some weaknesses such as, corner rounding, no proximity effect correction and poor CD linearity when compared to E-beam pattern generators.
Gaston Lee +7 more
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Understanding Pattern Formation and Improving Fidelity in Phototropic Growth [PDF]
, 2021 Phototropic growth of Se-Te yields highly anisotropic lamellar nanostructures and is achieved photoelectrochemically from an isotropic solution of oxidized Se and Te precursors deposited onto isotropic conductive substrates under conformal illumination.
Simonoff, Ethan
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Topographic and other effects on EUV pattern fidelity
SPIE Proceedings, 2014The ability to incorporate topographic and other effects of previously patterned layers in ground rule formulation could potentially lead to significant cost savings and shortened time needed for technology ramp-up. The effect of topgraphy coupled with the diminishing depth of focus (DOF) associated with design node shrinks could become a significant ...
Chandra Sarma +3 more
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Pattern transfer fidelity of nanoimprint lithography on six-inch wafers
Nanotechnology, 2002 We studied the pattern transfer fidelity of nanoimprint lithography (NIL) by patterning sub-micron MESFET gates on six-inch wafers. The critical dimensions (CD) of the gate patterns on the mould, imprinted in resist, as well as after oxygen reactive ion etching (RIE) and metal lift-off were measured, separately, using an ultrahigh-resolution scanning ...
Li, Mingtao +3 more
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Simulation and Optimization of Inkjet-printed Outlines to Improve Pattern Fidelity
2021 22nd International Conference on Electronic Packaging Technology (ICEPT), 2021Inkjet-printing has become a effective method for fabricating flexible electronics. This paper aims to improve the form fidelity via a numerical method. The properties of ink fluid and parameters of printing process are taken into consideration, and some rules for improve pattern fidelity are found.
Wanchun Yang, Mingyu Li
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