Results 291 to 300 of about 560,798 (337)

Simpler attenuated phase-shifting mask

SPIE Proceedings, 2000
The structure, principle and manufacturing process of a single layer attenuated phase-shifting mask which is compatible with the traditional Cr mask fabrication technology are introduced in the paper. Partial experimental results are provided.
Jin Zhang, Boru Feng, Desheng Hou, Chongxi Zhou, HanMin Yao, Yongkang Guo, Fen Chen, Fang Sun, Ping Su   +8 more
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Measurement of phase-shift masks

SPIE Proceedings, 1993
We discuss in this paper the use of the confocal microscope and an interferometric microscope for measurement of phase-shift masks. It is shown that phase measurements are more accurate than intensity measurements for determining the depth and slope of the sides of a notch.
Fang C. Chang, Gordon S. Kino, William K. Studenmund, Stanley S. C. Chim, Ching-Hua Chou   +4 more
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X-ray phase mask: nanostructures

SPIE Proceedings, 1997
In this paper we report the results of simulations and experiments on application of phase-shifting mask to x-ray lithography (XPM). We have built an XPM with PMMA as a phase shifter; we printed patterns using the XPM and characterized the linewidth dependence on gap and dose. Small lines around 70 nm were printed at 25 micrometer gap. The resist lines
Zheng Chen, Quinn J. Leonard, Mumit Khan, Franco Cerrina   +3 more
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IntenCD and mask phase uniformity

SPIE Proceedings, 2010
The allowable wafer Critical Dimension Uniformity (CDU) budget of the 2x node poses stringent requirements on mask induced errors at wafer level. The total CDU budget of 2 nm which is partially consumed by across wafer and field process and imaging variations, leaves little room for additional mask errors to still comply to the overall CDU budget ...
Yaron Cohen, Shmoolik Mangan, Shay Attal, Michael Ben-Yishay, Ilan Englard   +4 more
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Stellar Coronograph with Phase Mask

Publications of the Astronomical Society of the Pacific, 1997
The detection of faint light sources very close to a bright star is primarily limited by light scattered by the Earth's atmosphere. This source of scattered light can now be reduced by means of adaptive optics, or totally eliminated by using a telescope in space.
F. Roddier, C. Roddier
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Wavefront Engineering: Phase Conjugate Masks

2021
In this chapter, we revisit the basic principles, behind the pioneering efforts for implementing varifocal lenses, as a good example of wavefront engineering. Next, we define the concept of phase conjugated pairs (PCP), which is applied for linking varifocal lenses with the phase masks employed for reducing the impact of focus error on the MTF, as is ...
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EUVL alternating phase shift mask

SPIE Proceedings, 2011
Extreme ultra-violet Lithography (EUVL) alternating phase shift mask (APSM) or other optical enhancement techniques are likely needed for 16nm (half pitch) technology generation and beyond. One possible option is the combination of EUVL and APSM. The fabrication of EUVL APSM is more difficult than either the fabrication of an EUVL binary mask or a ...
Pei-Yang Yan, Alan Myers, Yashesh Shroff, Manish Chandhok, Guojing Zhang, Eric Gullikson, Farhad Salmassi   +6 more
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Alternating Phase-Shifting Mask

2009
The principle of an alternating PSM [18–22] is compared with a COG mask in Fig. 5.1. The A¥=0.4 line is bordered by transmitting regions with 180° phase difference on an alternating PSM and by clear areas of the same phase on a COG mask. Phase difference on the alternating PSM leads to destructive interference, resulting in a sharp dark image.
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Metrology for phase-shifting masks

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 1993
Metrology test reticles that include a wide variety of structures typically encountered on phase-shifting masks were fabricated using a subtractive process. The test masks have been used to assess the ability of metrology instruments to measure linewidth, height, edge slope, roughness, critical dimension uniformity, and placement of the various ...
H. M. Marchman, S. Vaidya, C. Pierrat, J. Griffith   +3 more
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X-ray Phase Shifting Masks

1994
X-ray Lithography has demonstrated the capabilities for patterning 0.25 μm features in production. Both theoretical and experimental studies have demonstrated that the inherent resolution of the X-ray can be achieved when the exposure system is designed correctly.
F. Cerrina, J. Xiao, Z. Y. Guo
openaire   +1 more source