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Phase-shifting masks for microlithography: automated design and mask requirements
Journal of the Optical Society of America A, 1994The problem of automated design of phase-shifting masks for enhanced-resolution optical lithography is examined. We propose a computationally viable algorithm for the rapid design of phase-shifting masks for arbitrary two-dimensional patterns. Our approach is based on the use of a class of optimal coherent approximations to partially coherent imaging ...
Y. C. Pati, T. Kailath
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Effect of mask reduction ratio in alternating phase-shift masks
SPIE Proceedings, 2001In this paper we analyze the effect of mask reduction ratio in alternating phase shift masks. To properly predict image imbalance for different reduction ratios, a topography simulator was used. As the mask reduction ratio is increased, the aerial image imbalance is improved. As the reduction ratio is decreased, the amount of undercutting to compensate
In-Gyun Shin +6 more
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Phase-only optical decryption of a fixed mask
Applied Optics, 2001We present a system for the implementation of phase-only optical decryption of an encrypted fixed phase mask. We achieve decryption by superimposing a decrypting phase key, implemented on a phase-only spatial light modulator with an encrypted phase mask in two equivalent image planes in an optical system. The decrypted phase information is retrieved by
P C, Mogensen, J, Glückstad
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Phase-Mask Control and Stabilization of Optical Filamentation
15th International Conference on Ultrafast Phenomena, 2006Applying a circular phase mask before focusing improves the pointing stability of optical filamentation and helps to enhance the coherent supercontinuum bandwidth. The experiment is supported by simulations showing stabilized guiding without a waveguide structure.
Thomas Pfeifer +4 more
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Transient phase masks in high-harmonic generation
Optics Letters, 2007We present a method for controlling the spatial properties of high-harmonic beams with high efficiency. The high nonlinearity of harmonic generation allows weak control beams to induce a phase mask for the extreme UV light as it is formed. We fabricate a phase grating and demonstrate efficient diffraction in the far field.
Mairesse, Y. +6 more
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Optically controlled imaging phase mask element
Optics Letters, 1996We demonstrate a new optical element consisting of a phase mask made of a nonlinear material. The element uses the nonlinearity to produce an intensity-dependent lens that controls its imaging properties. We demonstrate this element by optically controlling the imaging of an array produced by a diffractive spot generator in direct contact with a thin ...
S D, Vartak, N M, Lawandy
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Attenuated Phase-Shifting Mask
2009If the opaque regions on a COG mask become partially transmitting with a 180° phase relative to the bright regions, as shown in Fig. 6.1, an attenuated PSM results [15, 16]. As opposed to an alternating PSM where all phase regions image onto the wafer, the partially transmitting background of an attenuated PSMâusually with an intensity transmission ...
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Alternating Phase-Shifting Mask
2009The principle of an alternating PSM [18â22] is compared with a COG mask in Fig. 5.1. The A¥=0.4 line is bordered by transmitting regions with 180° phase difference on an alternating PSM and by clear areas of the same phase on a COG mask. Phase difference on the alternating PSM leads to destructive interference, resulting in a sharp dark image.
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