Results 31 to 40 of about 17,195 (246)

Physical model-based ArF photoresist formulation development

AIP Advances
Since the logic 28 nm technology and beyond, ArF immersion lithography has been widely used in manufacturing. To fully utilize the potential of the lithographic resolution, process simulation has been used since the lithography process setup step.
Liwan Yue, Zhibiao Mao, Qiang Wu, Yanli Li, Yanqiu Li   +4 more
doaj   +1 more source

A Study on the Resolution and Depth of Focus of ArF Immersion Photolithography

Micromachines, 2022
In this study, the resolution and depth of focus (DOF) of the ArF immersion scanner are measured experimentally according to numerical aperture (NA).
Jungchul Song, Chae-Hwan Kim, Ga-Won Lee
doaj   +1 more source

Three‐dimensional Antimony Sulfide Based Flat Optics

Advanced Functional Materials, EarlyView.
This work presents the development of a grayscale electron beam lithography (g‐EBL) method for fabricating antimony trisulfide (Sb2S3) nanostructures with customizable 3D profiles. The refractive index of g‐EBL patterned Sb2S3 is determined based on the synergy of genetic algorithm and transfer matrix method.
Wei Wang, Uwe Hübner, Anne Gärtner, Tao Chen, Joseph Köbel, Franka Jahn, Daniel Repp, Abhrodeep Dey, Henrik Schneidwind, Andrea Dellith, Jan Dellith, Torsten Wieduwilt, Matthias Zeisberger, Tanveer Ahmed Shaik, Astrid Bingel, Markus A. Schmidt, Jer‐Shing Huang, Ulf Peschel, Volker Deckert   +18 more
wiley   +1 more source

Photoresist-enabled assembly of BN/graphene/BN heterostructure and fabrication of one-dimensional contact electrode

Materials Research Express, 2020
A poly(methyl methacrylate) (PMMA) substrate is easily soluble in acetone and cannot withstand high temperatures, thereby restricting the application of graphene or boron nitride (BN) on it.
Anjiang Cai, Wang Yu, Guodong Zhang, Yulong Zhao, Jing Sun, Yuan Liu, Dongpeng Zhang   +6 more
doaj   +1 more source

Flexible White Lighting Fabricated With Quantum Dots Color Conversion Layers Excited by Blue Organic Light-Emitting Diodes

IEEE Photonics Journal, 2022
In this study, HATCN is coated on flexible PET/indium tin oxide (ITO) substrate as a modified layer and a hole injection layer to improve the hole injection from ITO.
Fuh-Shyang Juang, Chong Zhe Jian, Krishn Das Patel, Hao Xuan Wang   +3 more
doaj   +1 more source

Spectrally Tunable 2D Material‐Based Infrared Photodetectors for Intelligent Optoelectronics

Advanced Functional Materials, EarlyView.
Intelligent optoelectronics through spectral engineering of 2D material‐based infrared photodetectors. Abstract The evolution of intelligent optoelectronic systems is driven by artificial intelligence (AI). However, their practical realization hinges on the ability to dynamically capture and process optical signals across a broad infrared (IR) spectrum.
Junheon Ha, Yingshan Ma, Yong Nam An, Sung‐Un An, Hyeon Hak Jung, Suvi‐Tuuli Varjamo, Jiwon Yoo, Junho Min, Hanvit Kim, Faisal Ahmed, Sang Hoon Chae, Young Min Song, Weiwei Cai, Tawfique Hasan, Zhipei Sun, Dong‐Ho Kang, Hyeon‐Jin Shin, Yunyun Dai, Hoon Hahn Yoon   +18 more
wiley   +1 more source

Reflective Absorption IR Fourier-Spectroscopy of Photoresistive Films on Silicon

Приборы и методы измерений
A comparative analysis of the reflectance-absorption spectroscopy method’s application using the diffuse reflection factory prefix DRIFT of the ALPHA IR spectrophotometer and the method of attenuated total reflection for study of the optical ...
D. I. Brinkevich, E. V. Grinyuk, V. S. Prosolovich, S. D. Brinkevich, V. V. Kolos, O. A. Zubova   +5 more
doaj   +1 more source

Study of optimization condition for spin coating of the photoresist film on rectangular substrate by Taguchi design of an experiment [PDF]

Songklanakarin Journal of Science and Technology (SJST), 2009
There are four parameters concerning the spin coating of a positive photoresist film. This paper focuses on spin coating of the positive photoresist Clariantz AZ-P4620 on a 2x7 cm rectangular substrate.
Nithi Atthi, On-uma Nimittrakoolchai, Wutthinan Jeamsaksiri, Sitthisuntorn Supothina, Charndet Hruanun, Amporn Poyai   +5 more
doaj  

Review on dry film photoresist-based patterning of Ag nanowire flexible electrodes for wearable electronics

Fashion and Textiles, 2022
Silver (Ag) nanowires have attracted significant attention as flexible electrodes for various wearable electronic devices owing to their excellent optical and electrical properties.
Byungil Hwang, Paolo Matteini
doaj   +1 more source

Electron–Matter Interactions During Electron Beam Nanopatterning

Advanced Functional Materials, EarlyView.
This article reviews the electron–matter interactions important to nanopatterning with electron beam lithography (EBL). Electron–matter interactions, including secondary electron generation routes, polymer radiolysis, and electron beam induced charging, are discussed.
Camila Faccini de Lima, Prathiba Thamizhavel, Taylor J. Woehl   +2 more
wiley   +1 more source