Results 291 to 300 of about 6,644,773 (301)

Structuring of DLC:Ag nanocomposite thin films employing plasma chemical etching and ion sputtering

Nuclear Instruments & Methods in Physics Research B, 2014
Šaru Nas Meškinis, Sigitas Tamulevicius, Tomas Tamulevičius   +2 more
exaly  

Plasma-Chemical and Reactive Ion Etching of Gallium Arsenide in Difluorodichloromethane with Helium

Russian Microelectronics
D. B. Murin, I. A. Chesnokov, I. A. Gogulev, A. L. Anokhin, A. E. Moloskin   +4 more
openaire   +1 more source

Effect of additive gases and injection methods on chemical dry etching of silicon nitride, silicon oxynitride, and silicon oxide layers in F2 remote plasmas Available to Purchase

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 2007
N ‐E Lee
exaly  

Simulations of Si and SiO etching in SF+O plasma

Vacuum, 2009
Rimantas Knizikevičius
exaly  

Investigation of the Effect of Atomic Composition on the Plasma-Chemical Etching Rate of Silicon Nitride in High-Power Transistors Based on an AlGaN/GaN Heterojunction

Semiconductors, 2020
exaly  

Combining Methods of Scanning Probe Nanolithography and Plasma Chemical Etching for the Formation of Vertical Optoelectronic Structures

2023
exaly  

Evaluation of COF as etch gas for plasma-chemical 2 etching at atmospheric pressure for crystalline silicon wafer processing

2009
Lopez, Elena, Linaschke, Dorit, Mäder, Gerrit, Leistner, Matthias, Dani, Ines, Kaskel, Stefan, Beyer, Eckhard, Riva, Marcello   +7 more
openaire   +1 more source

Design and development of medium-pressure plasma process for optical substrate finishing: A comparative study with wet chemical etching

Journal of Manufacturing Processes
Manas Das
exaly  

Atmospheric pressure pecvd coating and plasma chemical etching for continuous processing

The 33rd IEEE International Conference on Plasma Science, 2006. ICOPS 2006. IEEE Conference Record - Abstracts., 2006
openaire   +1 more source

Plasma chemical etching of silicon in MEMS-technology

B K Bogomolov
exaly