Results 291 to 300 of about 86,621 (303)

High‐Performance Macroporous Bulk Silicon Anodes Synthesized by Template‐Free Chemical Etching

Advanced Energy Materials, 2012
Jung-In Lee, Jaephil Cho, Soojin Park
exaly  

Plasma etching behavior of Y2O3 ceramics: Comparative study with Al2O3

Applied Surface Science, 2016
Ke Wang, Jing-Feng Li, Jin Luo
exaly  

Plasma-induced chemical etching generating Ni3S2 for formaldehyde detection

Chinese Chemical Letters, 2022
exaly  

Atmospheric pressure pecvd coating and plasma chemical etching for continuous processing

The 33rd IEEE International Conference on Plasma Science, 2006. ICOPS 2006. IEEE Conference Record - Abstracts., 2006
openaire   +1 more source

Fluorocarbon assisted atomic layer etching of SiO2 using cyclic Ar/C4F8 plasma

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 2014
Dominik Metzler, Robert L Bruce, S U Engelmann   +2 more
exaly  

Basic chemistry and mechanisms of plasma etching

Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena, 1983
Daniel L Flamm
exaly  

Effects of ion bombardment and chemical reaction on wafer temperature during plasma etching

Journal of Applied Physics, 1990
exaly  

Guide to references on III–V semiconductor chemical etching

Materials Science and Engineering Reports, 2001
exaly  

Design and development of medium-pressure plasma process for optical substrate finishing: A comparative study with wet chemical etching

Journal of Manufacturing Processes
Manas Das, Abhijeet Sethi
exaly  

Role of N2 addition on CF4/O2 remote plasma chemical dry etching of polycrystalline silicon

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 1997
exaly