Determination of the kinetic constants of the process of plasma gasification of coal-water fuel [PDF]
E3S Web of Conferences, 2019 The chemical kinetics of processes of thermal transformations of carbon-containing media was studied at high-temperature processing (2000 K ≤ T ≤ 5000 K) in the chamber of a plasma-jet reactor using water vapor as an oxidizer. The chemical reactions rate
Kholiavchenko Leonid +3 more
doaj +1 more source
Predictive functional control for the temperature control of a chemical batch reactor [PDF]
, 2006 A predictive functional control (PFC) technique is applied to the temperature control of a pilot-plant batch reactor equipped with a mono-fluid heating/cooling system.
Cabassud, Michel +2 more
core +1 more source
Efficiency analysis of ignition by Nanosecond Repetitively Pulsed discharges using a low-order model
Applications in Energy and Combustion Science, 2023 Plasma-assisted combustion is an interesting method to promote the ignition of a lean reactive mixture instead of conventional spark plugs. Especially, Nanosecond Repetitively Pulsed (NRP) discharges technique is an energy-efficient way to initiate and ...
Stéphane Q.E. Wang +3 more
doaj +1 more source
Plasma Chemical Oxygen Conversion in an Industry‐Oriented Reactor Design
Chemie Ingenieur Technik, 2022 AbstractThe use of non‐thermal plasma enables chemical conversions as well as the removal of trace gas components. This application purpose has already been demonstrated for volume flow rates on a laboratory scale using a coaxial dielectric barrier discharge reactor.
Tim Nitsche +2 more
openaire +1 more source
Development of an original model for the synthesis of silicon nanodots by Low Pressure Chemical Vapor Deposition [PDF]
, 2008 Using the Computational Fluid Dynamics code Fluent, a simulation model of an industrial Low Pressure Chemical Vapor Deposition reactor has been developed for the synthesis of silicon nanodots from silane SiH4 on silicon dioxide SiO2 substrates.
Billon, Thierry +4 more
core +1 more source
RF reactor with asymmetrical electrodes for reactive ion etching of semiconductors [PDF]
Tekhnologiya i Konstruirovanie v Elektronnoi Apparature, 2011 Results of experimental and theoretical study of RF CCP reactor for reactive ion etching of semiconductors are presented. Breakdown curve and domain of the discharge existence are measured in various gases (argon, fluorocarbon, oxygen).
Dudin S. V. +3 more
doaj +2 more sources
CrystalsThe present study presents the results of an analytical and experimental investigation on the behaviour of Al2O3 particles injected into the plasma jet.
Viktorija Grigaitienė +3 more
doaj +1 more source
Modelling of an industrial moving belt chemical vapour deposition reactor forming SiO2 films [PDF]
, 2005 In order to improve the efficiency of an industrial atmospheric pressure chemical vapour deposition (APCVD) moving belt reactor depositing silicon dioxide SiO2 films from tetraethoxysilane Si(OC2H5)4 (TEOS) andozone O3, a 2D simulation model based on the
Caussat, Brigitte +5 more
core +1 more source
Advanced Engineering Materials, EarlyView.Mass density governs the protective behavior of oxide layers on nuclear fuel cladding. Ptychographic X‐ray computed tomography measures zirconium oxide grown on Zircaloy‐4 under reactor and autoclave conditions, revealing nearly identical bulk densities of 5.1 ± 0.80 g cm−3.
Okan Yetik +9 more
wiley +1 more source
Co-Generation of C2+ Hydrocarbons and Synthesis Gas from Methane and Carbon Dioxide using Dielectric-Barrier Discharge Plasma Reactor without Catalyst at Low Temperature [PDF]
, 2005 Co-generation of C2+ hydrocarbons and synthesis gas from methane and carbon dioxide has been an important issue in tackling the global warming effects from the two greenhouse gases.
Istadi, I., Saidina Amin, N.A.
core +1 more source