Results 161 to 170 of about 1,458,991 (299)

Surrogate‐Optimized Flow‐Guided Miniature Condenser for Rapid Exhaled Glucose Detection

Advanced Materials Technologies, EarlyView.
A surrogate‐optimized miniature condenser guides humid exhaled flow toward cold surfaces to accelerate exhaled breath condensate collection. By improving vapor access within a compact footprint, the design increases sample yield. This enables post‐collection enrichment and rapid colorimetric glucose detection from dilute exhaled biomarkers within a 5 ...
Yiming Thomas Lu, Yamin Mansur, Sai Peri, Jiangyuan Wan, Amio Pronoy Das Ritwik, Emily L. Johnson, Jingcheng Ma   +6 more
wiley   +1 more source

Amorphous IGZO, Crystalline IGO, Amorphous IGZO Triple Active Layer With 2D Electron Gas at Both Interfaces for High Performance TFTs

Advanced Materials Technologies, EarlyView.
The dual‐gate coplanar a‐IGZO/C‐IGO/a‐IGZO TFT is investigated, exhibiting a high filed‐effect mobility of 53.81 cm2 V−1s−1 with excellent stability. The amorphous IGZO layer provides smooth surface, which carrier scattering and high‐quality interface between gate insulator and active layer.
Solbee Lee, Taebin Lim, Seungho Lee, Sunaina Priyadarshi, Jin Jang   +4 more
wiley   +1 more source

Induced Hydrophilicity and Oxidation of β‑Iron Disilicide Films by Varying Ar Plasma Etching Durations. [PDF]

ACS Omega
Borwornpornmetee N, Kardkaew T, Sansit R, Kaewsai C, Srisom K, Phatthanakun R, Janphuang P, Nakajima H, Paosawatyanyong B, Yoshitake T, Promros N.   +10 more
europepmc   +1 more source

Batch Fabrication of Silicon Nanometer Tip Using Isotropic Inductively Coupled Plasma Etching. [PDF]

Micromachines (Basel), 2020
Wang L, Liu M, Zhao J, Zhao J, Zhu Y, Yang J, Yang F.   +6 more
europepmc   +1 more source

Recent Advances in Transparent Microelectrode Device Architecture and Fabrication Strategies for Biomedical Applications

Advanced Materials Technologies, EarlyView.
Transparent microelectrode arrays enable simultaneous optical and electrical electrophysiology with high spatiotemporal resolution, allowing multimodal observations of dynamic biological systems. Advances in materials and device architectures improve device performance by addressing key trade‐offs between optical transparency, impedance, and ...
Michael Abraham Listyawan, Tran Bach Dang, Chi Cong Nguyen, Yee Lap Pong, Tianruo Guo, Thanh Nho Do, Hoang‐Phuong Phan   +6 more
wiley   +1 more source

Fabrication of Silicon Monolithic Tubes with High-Aspect-Ratio Cavities Using Langmuir-Blodgett Colloidal Lithography and Bayesian-Optimized Continuous Plasma Etching. [PDF]

ACS Omega
Osipov A, Fumina A, Belyanov I, Speshilova A, Endiiarova E, Gerdt A.   +5 more
europepmc   +1 more source

Inductively coupled plasma etching in fabrication of 2D InP-based photonic crystals

, 2009
The authors developed an inductively coupled plasma etching process for the fabrication of hole-type photonic crystals in InP. The etching was performed at 70 degrees C using BCl3/Cl-2 chemistries. A high etch rate of 1.4 mu m/min was obtained for 200 nm
Wang HL, Ren G, Zheng WH Chinese Acad Sci Inst Semicond Nanooptoelect Lab Beijing 100083 Peoples R China. E-mail Address: whzheng@red.semi.ac.cn, Zheng WH, Xing MX   +4 more
core  

Wafer‐Scale Top‐Down Patterning of Metal Halide Perovskites

Advanced Materials Technologies, EarlyView.
Wafer‐scale patterning of metal halide perovskite films is demonstrated on 150 mm substrates using a chemically amplified resist, polymethyl methacrylate (CAR‐PMMA) and a single reactive ion etching step. The streamlined process preserves film luminescence while defining submicrometer features across the full wafer, enabling dense, scalable integration
Federico Fabrizi, Ardeshir Esteki, Holger Lerch, Saeed Goudarzi, Liudmila Starodubtceva, Gerhard Müller‐Newen, Maryam Mohammadi, Max C. Lemme   +7 more
wiley   +1 more source

Experimental study of inductively coupled plasma etching of patterned single crystal diamonds. [PDF]

Sci Rep
Zhao L, Wang X, Jiang N, Nishimura K, Yi J, Fang S.   +5 more
europepmc   +1 more source

Wafer-scale 3D shaping of high aspect ratio structures by multistep plasma etching and corner lithography. [PDF]

Microsyst Nanoeng, 2020
Ni S, Berenschot EJW, Westerik PJ, de Boer MJ, Wolf R, Le-The H, Gardeniers HJGE, Tas NR.   +7 more
europepmc   +1 more source