Precision micro-mechanical components in single crystal diamond by deep reactive ion etching. [PDF]
Microsyst Nanoeng, 2018 The outstanding material properties of single crystal diamond have been at the origin of the long-standing interest in its exploitation for engineering of high-performance micro- and nanosystems.
Toros A +5 more
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Freestanding nanostructures via reactive ion beam angled etching
APL Photonics, 2017 Freestanding nanostructures play an important role in optical and mechanical devices for classical and quantum applications. Here, we use reactive ion beam angled etching to fabricate optical resonators in bulk ...
Haig A. Atikian +7 more
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Crystallographic Orientation Dependent Reactive Ion Etching in Single Crystal Diamond [PDF]
Advances in Materials, 2018 Sculpturing desired shapes in single crystal diamond is ever more crucial in the realization of complex devices for nanophotonics, quantum computing, and quantum optics. The crystallographic orientation dependent wet etch of single crystalline silicon in
Ling Xie +3 more
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Etch rate optimization in reactive ion etching of epoxy photoresists
Procedia Chemistry, 2009 AbstractIn this paper, the influence of several reactive ion etching (RIE) process parameters on epoxy photoresist etch rates is compared and optimized. Four types of epoxies were examined: SU-8 2050, EpoCore, hardbaked and non-hardbaked EpoClad. The parameters that were tested are: O2 flow, SF6 flow, chamber pressure and RF power. For the experiments,
Kristof Wouters +2 more
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17.6% Conversion Efficiency Multicrystalline Silicon Solar Cells Using the Reactive Ion Etching with the Damage Removal Etching [PDF]
International Journal of Photoenergy, 2012 For lower reflectance, we applied a maskless plasma texturing technique using reactive ion etching (RIE) on acidic-textured multicrystalline silicon (mc-Si) wafer. RIE texturing had a deep and narrow textured surface and showed excellent low reflectance.
Ji-Myung Shim +12 more
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A practical approach to reactive ion etching
Journal of Physics D: Applied Physics, 2014 In this paper, general aspects of the reactive ion etching (RIE) technique will be described, such as anisotropy, loading effect, lag effect, RIE chemistries and micro-masking, followed by a brief overview of etching dielectrics (SiOx, SiNx) and crystalline Si. The second section of the paper is dedicated to etching III–V compound semiconductors where,
F. Karouta
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Towards high-throughput large-area metalens fabrication using UV-nanoimprint lithography and Bosch deep reactive ion etching. [PDF]
Optics Express, 2020 We demonstrate the fabrication of diffraction-limited dielectric metasurface lenses for NIR by the use of standard industrial high-throughput silicon processing techniques: UV nano imprint lithography (UV-NIL) combined with continuous reactive ion ...
Christopher A. Dirdal +5 more
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Stochastic antireflection structures on silicon fabricated by reactive ion etching [PDF]
EPJ Web of Conferences, 2023 Stochastic Si nanostructures for antireflection (AR) fabricated by reactive ion etching (RIE) are presented for use in different spectral ranges. The lithography-free fabrication enables its application on highly curved surfaces. ALD-coatings of Al2O3 of
Schmelz David +2 more
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Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki, 2022 Regularities of the reflected signal intensity changing in time, recorded by the detector of the laser interferometer with the operating frequency of 670 nm during the inductively coupled plasma reactive ion etching in a Cl2/N2/O2 atmosphere of GaN, p ...
A. D. Yunik, A. H. Shydlouski
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Time multiplexed deep reactive ion etching of germanium and silicon-A comparison of mechanisms and application to x-ray optics. [PDF]
J Vac Sci Technol B Nanotechnol Microelectron, 2018 Genova VJ, Agyeman-Budu DN, Woll AR.
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