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Stochastic antireflection structures on silicon fabricated by reactive ion etching [PDF]
EPJ Web of Conferences, 2023 Stochastic Si nanostructures for antireflection (AR) fabricated by reactive ion etching (RIE) are presented for use in different spectral ranges. The lithography-free fabrication enables its application on highly curved surfaces. ALD-coatings of Al2O3 of
Schmelz David +2 more
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Time multiplexed deep reactive ion etching of germanium and silicon-A comparison of mechanisms and application to x-ray optics. [PDF]
J Vac Sci Technol B Nanotechnol Microelectron, 2018 Genova VJ, Agyeman-Budu DN, Woll AR.
europepmc +2 more sources
Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki, 2022 Regularities of the reflected signal intensity changing in time, recorded by the detector of the laser interferometer with the operating frequency of 670 nm during the inductively coupled plasma reactive ion etching in a Cl2/N2/O2 atmosphere of GaN, p ...
A. D. Yunik, A. H. Shydlouski
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Ultraviolet Laser Damage Dependence on Contamination Concentration in Fused Silica Optics during Reactive Ion Etching Process. [PDF]
Materials (Basel), 2018 Sun L +8 more
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Exploring Strategies to Contact 3D Nano-Pillars
Nanomaterials, 2020 This contribution explores different strategies to electrically contact vertical pillars with diameters less than 100 nm. Two process strategies have been defined, the first based on Atomic Force Microscope (AFM) indentation and the second based on ...
Esteve Amat +10 more
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Advanced Etching Techniques of LiNbO3 Nanodevices
Nanomaterials, 2023 Single LiNbO3 (LNO) crystals are widely utilized in surface acoustic wave devices, optoelectronic devices, and novel ferroelectric memory devices due to their remarkable electro-optic and piezoelectric properties, and high saturation and remnant ...
Bowen Shen +7 more
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Effect of Plasma Etching Depth on Subsurface Defects in Quartz Crystal Elements
Crystals, 2023 After the plasma etching of quartz crystal, the crystal lattice underwent changes in response to the length of plasma etching time. The lattice arrangement of quartz crystal was the most orderly after plasma etching for 1000 nm, and with the increase in ...
Qingzhi Li +4 more
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Figuring of optical aluminium devices by reactive ion beam etching [PDF]
EPJ Web of Conferences, 2019 Ion beam figuring (IBF) is an established method in high-end surface manufacturing. However, the direct processing of desired materials as standard Al alloys (e.g.
Bauer Jens +3 more
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Micro and Nano Systems Letters, 2020 Deep reactive-ion etching (DRIE) is commonly used for high aspect ratio silicon micromachining. However, scalloping, which is the result of the alternating Bosch process of DRIE, can cause many problems in the subsequent process and degrade device ...
Jin Soo Park +7 more
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Reactive ion beam etching – based finishing of optical aluminium surfaces [PDF]
EPJ Web of Conferences, 2019 Reactively driven low-energy ion beam machining is a widely used finishing technique for optical aluminium surfaces. Direct RIBE machining with oxygen or nitrogen process gas permits figure error correction of diversely shaped aluminium optics while ...
Ulitschka Melanie +3 more
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