Results 21 to 30 of about 106,837 (225)
Ultraviolet Laser Damage Dependence on Contamination Concentration in Fused Silica Optics during Reactive Ion Etching Process. [PDF]
Sun L +8 more
europepmc +3 more sources
Advanced Etching Techniques of LiNbO3 Nanodevices
Single LiNbO3 (LNO) crystals are widely utilized in surface acoustic wave devices, optoelectronic devices, and novel ferroelectric memory devices due to their remarkable electro-optic and piezoelectric properties, and high saturation and remnant ...
Bowen Shen +7 more
doaj +1 more source
Exploring Strategies to Contact 3D Nano-Pillars
This contribution explores different strategies to electrically contact vertical pillars with diameters less than 100 nm. Two process strategies have been defined, the first based on Atomic Force Microscope (AFM) indentation and the second based on ...
Esteve Amat +10 more
doaj +1 more source
Recently, it has been demonstrated that Silicon Carbide (SiC) membranes can be used in quantum sensing and MEMS applications. One of the important steps for the production of such membranes is the removal of the substrate material in order to form ...
Mahsa Mokhtarzadeh +3 more
doaj +1 more source
Effect of Plasma Etching Depth on Subsurface Defects in Quartz Crystal Elements
After the plasma etching of quartz crystal, the crystal lattice underwent changes in response to the length of plasma etching time. The lattice arrangement of quartz crystal was the most orderly after plasma etching for 1000 nm, and with the increase in ...
Qingzhi Li +4 more
doaj +1 more source
Deep reactive-ion etching (DRIE) is commonly used for high aspect ratio silicon micromachining. However, scalloping, which is the result of the alternating Bosch process of DRIE, can cause many problems in the subsequent process and degrade device ...
Jin Soo Park +7 more
doaj +1 more source
Figuring of optical aluminium devices by reactive ion beam etching [PDF]
Ion beam figuring (IBF) is an established method in high-end surface manufacturing. However, the direct processing of desired materials as standard Al alloys (e.g.
Bauer Jens +3 more
doaj +1 more source
Reactive ion beam etching – based finishing of optical aluminium surfaces [PDF]
Reactively driven low-energy ion beam machining is a widely used finishing technique for optical aluminium surfaces. Direct RIBE machining with oxygen or nitrogen process gas permits figure error correction of diversely shaped aluminium optics while ...
Ulitschka Melanie +3 more
doaj +1 more source
Reactive Ion Etching Process of Micro Mechanical Pendulum
This paper describes the reactive ion etching (RIE) technique of micro mechanical pendulum chip. Micro mechanical pendulum chip processed by the RIE has excellent performances and surface of the chip is smoother than the chip by wet etching.
Zhang Wei +3 more
doaj +1 more source
Residual-free reactive ion etching of gold layers
Metal contacts on semiconductors devices are normally defined by lift-off process, because no well-defined etch processes exist for some rare metals.
Gerhard Franz +3 more
doaj +1 more source

