Results 31 to 40 of about 106,837 (225)

A large-size and polarization-independent two dimensional grating fabricated by scanned reactive-ion-beam etching

Nanophotonics, 2022
Scanned reactive-ion-beam etching method was proposed to transfer two-dimensional mask patterns into quartz substrate, which would produce a larger-size and polarization-independent two-dimensional grating.
Zhang Wei, Li Wenhao, Zhang Tong, Zheng Zhongming, Chi Zhendong, Jiang Yanxiu, Wu Na   +6 more
doaj   +1 more source

Dry etching of monocrystalline silicon using a laser-induced reactive micro plasma

Applied Surface Science Advances, 2021
Dry etching is a prevalent technique for pattern transfer and material removal in microelectronics, optics and photonics due to its high precision material removal with low surface and subsurface damage.
Robert Heinke, Martin Ehrhardt, Pierre Lorenz, Klaus Zimmer   +3 more
doaj   +1 more source

The preparation of V2CTx by facile hydrothermal-assisted etching processing and its performance in lithium-ion battery

Journal of Materials Research and Technology, 2020
In this study, high-purity V2CTx MXene was successfully synthesized by etching V2AlC with fluoride and hydrochloric acid mixed solution using a hydrothermal-assisted method. This method is more concise and effective and has a low level of danger.
Libo Wang, Darong Liu, Weiwei Lian, Qianku Hu, Xuqing Liu, Aiguo Zhou   +5 more
doaj   +1 more source

Three-Dimensional Simulation of DRIE Process Based on the Narrow Band Level Set and Monte Carlo Method

Micromachines, 2018
A three-dimensional topography simulation of deep reactive ion etching (DRIE) is developed based on the narrow band level set method for surface evolution and Monte Carlo method for flux distribution.
Jia-Cheng Yu, Zai-Fa Zhou, Jia-Le Su, Chang-Feng Xia, Xin-Wei Zhang, Zong-Ze Wu, Qing-An Huang   +6 more
doaj   +1 more source

Recent Progress of Black Silicon: From Fabrications to Applications

Nanomaterials, 2020
Since black silicon was discovered by coincidence, the special material was explored for many amazing material characteristics in optical, surface topography, and so on.
Zheng Fan, Danfeng Cui, Zengxing Zhang, Zhou Zhao, Hongmei Chen, Yanyun Fan, Penglu Li, Zhidong Zhang, Chenyang Xue, Shubin Yan   +9 more
doaj   +1 more source

The Influence of Etching Method on the Occurrence of Defect Levels in III-V and II-VI Materials

Nanomaterials
The influence of the etching method on the occurrence of defect levels in InAs/InAsSb type-II superlattice (T2SLs) and MCT photodiode is presented. For both analyzed detectors, the etching process was performed by two methods: wet chemical etching and ...
Kinga Majkowycz, Krzysztof Murawski, Małgorzata Kopytko, Krzesimir Nowakowski-Szkudlarek, Marta Witkowska-Baran, Piotr Martyniuk   +5 more
doaj   +1 more source

Optimizing reactive ion etching to remove sub-surface polishing damage on diamond

Journal of Applied Physics, 2019
Low defect smooth substrates are essential to achieve high quality diamond epitaxial growth and high performance devices. The optimization of the Ar/O 2/CF 4 reactive ion etching (RIE) plasma treatment for diamond substrate smoothing and its ...
Marie-Laure Hicks, A. Pakpour-Tabrizi, V. Zuerbig, L. Kirste, C. Nebel, R. Jackman   +5 more
semanticscholar   +1 more source

Tuning Metasurface Dimensions by Soft Nanoimprint Lithography and Reactive Ion Etching

Advanced Photonics Research, 2022
Metasurfaces are ultrathin and flat layers of subwavelength nanostructures composed of metallic or high‐refractive‐index materials. They can alter lightwave properties effectively and show significant application potential in various nanophotonic ...
Xinyi Cao, Yibo Xiao, Qiao Dong, Shaobo Zhang, Junzhuan Wang, Lianhui Wang, Li Gao   +6 more
doaj   +1 more source

Silicone engineered anisotropic lithography for ultrahigh-density OLEDs

Nature Communications, 2022
Ultrahigh-resolution patterning with high-throughput and high-fidelity is highly in demand for expanding the potential of OLEDs. Here, the authors report that silicone-incorporated organic light-emitting semiconductors can achieve anisotropic lithography
Hyukmin Kweon, Keun-Yeong Choi, Han Wool Park, Ryungyu Lee, Ukjin Jeong, Min Jung Kim, Hyunmin Hong, Borina Ha, Sein Lee, Jang-Yeon Kwon, Kwun-Bum Chung, Moon Sung Kang, Hojin Lee, Do Hwan Kim   +13 more
doaj   +1 more source

The role of fluorine-containing ultra-thin layer in controlling boron thermal diffusion into silicon

Journal of Telecommunications and Information Technology, 2023
We have investigated the influence of silicon dioxide reactive ion etching (RIE) parameters on the composition of the polymer layer that is formed during this process on top of the etched layer, and finally, the role of this layer in high- temperature ...
Małgorzata Kalisz, Romuald B. Beck, Adam Barcz, Michał Ćwil   +3 more
doaj   +1 more source