Results 31 to 40 of about 156,728 (358)
Plasma removal of Parylene C [PDF]
, 2008 Parylene C, an emerging material in microelectromechanical systems, is of particular interest in biomedical and lab-on-a-chip applications where stable, chemically inert surfaces are desired.
Li, Po-Ying, Meng, Ellis, Tai, Yu-Chong
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Reactive Ion Etching Process of Micro Mechanical Pendulum
MATEC Web of Conferences, 2017 This paper describes the reactive ion etching (RIE) technique of micro mechanical pendulum chip. Micro mechanical pendulum chip processed by the RIE has excellent performances and surface of the chip is smoother than the chip by wet etching.
Zhang Wei +3 more
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Residual-free reactive ion etching of gold layers
AIP Advances, 2018 Metal contacts on semiconductors devices are normally defined by lift-off process, because no well-defined etch processes exist for some rare metals.
Gerhard Franz +3 more
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Thermally assisted ion beam etching of polytetrafluoroethylene, a new technique for high aspect ratio etching of MEMS [PDF]
, 1996 In micromechanics, the etching of high aspect ratio structures in polymers is a prime technology. Normally, oxygen-based reactive ion etching or the LIGA technique are used to achieve this goal.
Berenschot, Erwin +4 more
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Fabrication of bismuth nanowires with a silver nanocrystal shadowmask [PDF]
, 2000 We fabricated bismuth (Bi) nanowires with low energy electron beam lithography using silver (Ag) nanocrystal shadowmasks and a subsequent chlorine reactive ion etching. Submicron-size metal contacts on the single Bi nanowire were successfully prepared by
Abraham, M. +13 more
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Nanophotonics, 2022 Scanned reactive-ion-beam etching method was proposed to transfer two-dimensional mask patterns into quartz substrate, which would produce a larger-size and polarization-independent two-dimensional grating.
Zhang Wei +6 more
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Double heterostructure lasers with facets formed by a hybrid wet and reactive-ion-etching technique [PDF]
, 1985 Double heterostructure lasers were fabricated in which one of the laser facets was produced by a hybrid wet and reactive-ion-etching technique. This technique is suitable for GaAs/GaAlAs heterostructure lasers and utilizes the selectivity of the plasma ...
Margalit, S. +3 more
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Micromachines, 2018 A three-dimensional topography simulation of deep reactive ion etching (DRIE) is developed based on the narrow band level set method for surface evolution and Monte Carlo method for flux distribution.
Jia-Cheng Yu +6 more
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Micro and Nano Engineering, 2022 Recently, it has been demonstrated that Silicon Carbide (SiC) membranes can be used in quantum sensing and MEMS applications. One of the important steps for the production of such membranes is the removal of the substrate material in order to form ...
Mahsa Mokhtarzadeh +3 more
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Recent Progress of Black Silicon: From Fabrications to Applications
Nanomaterials, 2020 Since black silicon was discovered by coincidence, the special material was explored for many amazing material characteristics in optical, surface topography, and so on.
Zheng Fan +9 more
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