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REACTOR FOR REACTIVE ION ETCHING, AND ETCHING PROCESS
1991BRANDEIS, CHRISTINE, ING. GRAD. +3 more
openaire +1 more source
The effect of hydrogen as an additive in reactive ion etching of GaAs for obtaining polished surface
Applied Surface Science, 2006F N Dultsev
exaly
Low‐temperature reactive ion etching and microwave plasma etching of silicon
Applied Physics Letters, 1988exaly

