Results 51 to 60 of about 1,885,146 (393)
Modeling of novel resist technologies [PDF]
, 2019 In response to the difficulties posed by the resolution, line edge roughness, sensitivity (RLS) trade-off to traditional chemically amplified resist (CAR) systems used for extreme ultraviolet lithography, a number of novel resist technologies have been ...
Long, L, Naulleau, PP, Neureuther, AR
core +1 more source
Spectacles of Resistance and Resistance of Spectacles
Management Communication Quarterly, 2008 The author explores organizational controls in an era dominated by spectacles, images, and pictures and seeks to identify forms of resistance that subvert and undermine these controls. The author analyzes new forms of resistance, such as whistle-blowing, that are particularly aimed at besmirching an organization's image and reputation and argues that ...
openaire +10 more sources
FEBS Letters, EarlyView.In vivo IL‐10 produced by tissue‐resident tolDC is involved in maintaining/inducing tolerance. Depending on the agent used for ex vivo tolDC generation, cells acquire common features but prime T cells towards anergy, FOXP3+ Tregs, or Tr1 cells according to the levels of IL‐10 produced. Ex vivo‐induced tolDC were administered to patients to re‐establish/
Konstantina Morali +3 more
wiley +1 more source
Pengembangan Desain Tekstil 3 Budaya dengan Tema Etnik Kontemporer
Dinamika Kerajinan dan Batik: Majalah Ilmiah, 2016 Kegiatan membuat celup rintang dilakukan banyak negara di dunia. Sejarah asal-usul teknik ini diperkirakan berasal dari Asia dan berkembang ke wilayah India, bersambung ke wilayah Malaysia.
Isti Kartika
doaj +1 more source
Metal mask free dry-etching process for integrated optical devices applying highly photostabilized resist. [PDF]
, 2006 Photostabilization is a widely used post lithographic resist treatment process, which allows to harden the resist profile in order to maintain critical dimensions and to increase selectivity in subsequent process steps such as reactive ion etching.
Driessen, A. +3 more
core +1 more source
Novel EUV resist development for sub-14nm half pitch
Advanced Lithography, 2015 Extreme ultraviolet (EUV) lithography has emerged as a promising candidate for the manufacturing of semiconductor devices at the sub-14nm half pitch lines and spaces (LS) pattern for 7 nm node and beyond.
M. Hori +10 more
semanticscholar +1 more source
FEBS Letters, EarlyView.Metabolic dysfunction‐associated steatotic liver disease (MASLD) affects nearly one‐third of the global population and poses a significant risk of progression to cirrhosis or liver cancer. Here, we discuss the roles of hepatic dendritic cell subtypes in MASLD, highlighting their distinct contributions to disease initiation and progression, and their ...
Camilla Klaimi +3 more
wiley +1 more source
Micro and Nano Engineering, 2020 A new type of a specifically tailored resist for Soft Nanoimprint Lithography (Soft UV-NIL) namely mr-NIL213FC has been developed. It aims for a significant improvement of its etch-resistance with regard to underlying oxide substrates such as glass. This
Shuhao Si +5 more
doaj
Sexual reproduction as an adaptation to resist parasites (a review).
Proceedings of the National Academy of Sciences of the United States of America, 1990 Darwinian theory has yet to explain adequately the fact of sex. If males provide little or no aid to offspring, a high (up to 2-fold) extra average fitness has to emerge as a property of a sexual parentage if sex is to be stable.
W. Hamilton, R. Axelrod, Reiko Tanese
semanticscholar +1 more source
Insights into PI3K/AKT signaling in B cell development and chronic lymphocytic leukemia
FEBS Letters, EarlyView.This Review explores how the phosphoinositide 3‐kinase and protein kinase B pathway shapes B cell development and drives chronic lymphocytic leukemia, a common blood cancer. It examines how signaling levels affect disease progression, addresses treatment challenges, and introduces novel experimental strategies to improve therapies and patient outcomes.
Maike Buchner
wiley +1 more source