Results 241 to 250 of about 61,657 (284)

Galvanoplating and sacrificial layers for surface micromachining

Microelectronic Engineering, 1995
For advanced surface micromachining3D UV-Microforming delivers excellent results. This low-cost technology, a combination of UV patterning of very thick photoresist layers and moulding of the resulting patterns by galvanoplating, opens a wide range of applications.
A. Maciossek, B. Lo¨chel, H.-J. Quenzer, B. Wagner, S. Schulze, J. Noetzel   +5 more
openaire   +1 more source

Sacrificial layer etching process in joint channels

Journal of Micromechanics and Microengineering, 2006
A sacrificial layer etching process in joint channels is studied in this paper. If the etching process proceeds from a wide channel to a narrow one, the etching front presents a straight line during the whole process according to the experiments. If the etching process proceeds from a narrow channel connected with a wide channel, it is an arc rather ...
Changju Wu, Zhonghe Jin, Huilian Ma, Shoufeng Lin, Yuelin Wang   +4 more
openaire   +1 more source

Cleaning graphene with a titanium sacrificial layer

Applied Physics Letters, 2014
Graphene is a promising material for future electronic applications and chemical vapor deposition of graphene on copper is a promising method for synthesizing graphene on the wafer scale. The processing of such graphene films into electronic devices introduces a variety of contaminants which can be difficult to remove.
C. A. Joiner, T. Roy, Z. R. Hesabi, B. Chakrabarti, E. M. Vogel   +4 more
openaire   +1 more source

Using porous silicon as a sacrificial layer

Journal of Micromechanics and Microengineering, 1993
A thick sacrificial layer for applications in bulk and surface micromachining can be achieved with porous silicon. The technology of freestanding parts of polysilicon is described. The etching process and the use of different masking layers are investigated.
P Steiner, A Richter, W Lang
openaire   +1 more source

Tip‐based Lithography with a Sacrificial Layer

Small
AbstractThe fabrication of a highly controlled gold (Au) nanohole (NH) array via tip‐based lithography is improved by incorporating a sacrificial layer—a tip‐crash buffer layer. This inclusion mitigates scratches during the nano‐indentation process by employing a 300 nm thick poly(methyl methacrylate) layer as a sacrificial layer on top of the Au film.
Jeong‐Sik Jo, Jinho Lee, Chiwon Choi, Jae‐Won Jang   +3 more
openaire   +2 more sources

Nanogap electrode formation by sacrificial layer technique

2014 IEEE 2nd International Conference on Emerging Electronics (ICEE), 2014
This paper presents a controlled lateral etching-based technique for realizing nanogap structures. These structures have applications in different bio-medical/ biochemical sensors. The sensitivity of such sensors depends on the gap size. The method method uses single mask lithography, followed by etching for the first electrode material and lift-off ...
Sachin Dhariwal, Rahul Prajesh, Ajay Agarwal, Sachin Dhariwal, Rahul Prajesh, Ajay Agarwal   +5 more
openaire   +1 more source

Sacrificial Oxide Layer for Drug Delivery

2007
Since the invention of silicon microfabrication technology in early 1960s, the integrated circuit (IC) has changed our world. During last 40 years, the semiconductor industry has come up as the fastest growing industry in our history. From a modest beginning, that allowed few transistors on a chip, we have reached integration level of tens of millions ...
Piyush M. Sinha, Mauro Ferrari
openaire   +1 more source

Surface micromachined platforms using electroplated sacrificial layers

TRANSDUCERS '91: 1991 International Conference on Solid-State Sensors and Actuators. Digest of Technical Papers, 2002
A technique for the surface micromachining of structures suspended many tens of microns above a substrate surface is presented. Electroplated metal sacrificial layers are used in a standard surface micromachining process to achieve the necessary sacrificial layer thickness. The process is demonstrated using copper as the sacrificial layer and polyimide
Y.W. Kim, M.G. Allen
openaire   +1 more source

Single- and multi-layer surface-micromachined platforms using electroplated sacrificial layers

Sensors and Actuators A: Physical, 1992
Abstract The use of electroplated sacrificial layers in the fabrication of surface-micromachined structures is discussed. Electroplated sacrificial layers offer two benefits: first, structures suspended several tens of microns above a substrate can be fabricated due to the ability to deposit relatively thick electroplated layers; secondly, the ...
Young W. Kim, Mark G. Allen
openaire   +1 more source

Nanothick Layer Transfer of Hydrogen-implanted Wafer Using Polysilicon Sacrificial Layer

MRS Proceedings, 2006
AbstractAn ion implantation-wafer bonding-layer splitting based 2-D nanostructure material fabrication method using polysilicon sacrificial layer for forming nanothick SOI materials without using post-thinning processes is presented in this paper. Polysilicon layer was initially deposited on the thermal oxidized surface of silicon wafer prior to the ...
C. H. Huang, C. L. Chang, Y. Y. Yang, T. Suryasindhu, W. -C. Liao, Y. -H. Su, P. W. Li, C. -Y. Liu, C. S. Lai, J. -H. Ting, C. S. Chu, C, -S Lee, T. -H. Lee   +12 more
openaire   +1 more source