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Protein patterning using germanium as a sacrificial layer

2017 39th Annual International Conference of the IEEE Engineering in Medicine and Biology Society (EMBC), 2017
With the rise of microfluidic diagnostics, there is a need for more efficient methods of patterning surface-attached moieties, including proteins like antibodies, onto microchannel surfaces. This arises because almost all of the solvents and processes used for surface-attachment chemistries (or their payloads) are incompatible with sacrificial layers ...
Bochao Lu, Michel M. Maharbiz
openaire   +2 more sources

Dendritic material as a dry-release sacrificial layer

Journal of Microelectromechanical Systems, 1999
A dry-release process using highly structured dendritic material, specifically, hyperbranched polymers (HBP's), has been developed. A particular HBP under study, known as HB560, has been characterized and successfully integrated with microelectromechanical systems processing. An array of electroplated nickel cantilever beams 100 /spl mu/m/spl times/100
H. Suh   +3 more
openaire   +1 more source

Water‐Soluble Sacrificial Layers for Surface Micromachining

Small, 2005
AbstractThis manuscript describes the use of water‐soluble polymers for use as sacrificial layers in surface micromachining. Water‐soluble polymers have two attractive characteristics for this application: 1) They can be deposited conveniently by spin‐coating, and the solvent removed at a low temperature (95–150 °C), and 2) the resulting layer can be ...
Vincent, Linder   +4 more
openaire   +2 more sources

Sacrificial layer etching in bubble structure

Sensors and Actuators A: Physical, 2007
Sacrificial layer etching through a small circle window is studied in this work. It is found that the etching rate decreases with etching time quickly and the etching rate decreases more quickly with a smaller etching window. The existing model cannot fit the experimental data well.
Changju Wu   +3 more
openaire   +1 more source

Galvanoplating and sacrificial layers for surface micromachining

Microelectronic Engineering, 1995
For advanced surface micromachining3D UV-Microforming delivers excellent results. This low-cost technology, a combination of UV patterning of very thick photoresist layers and moulding of the resulting patterns by galvanoplating, opens a wide range of applications.
A. Maciossek   +5 more
openaire   +1 more source

A study on etching profiles of sacrificial layers

Proceedings. 7th International Conference on Solid-State and Integrated Circuits Technology, 2004., 2005
Chemical etching of sacrificial layers is a widely used technique in surface micromachining. The causes of the triangle at the etch front are analyzed. The viewpoint that stress is the major factor of the triangle's formation is put forward. Through a study of the mechanism of the effects of annealing on etch rate, several rules about different ...
null WuChang-ju   +3 more
openaire   +1 more source

Cleaning graphene with a titanium sacrificial layer

Applied Physics Letters, 2014
Graphene is a promising material for future electronic applications and chemical vapor deposition of graphene on copper is a promising method for synthesizing graphene on the wafer scale. The processing of such graphene films into electronic devices introduces a variety of contaminants which can be difficult to remove.
C. A. Joiner   +4 more
openaire   +1 more source

Sacrificial layers for widely tunable capacitors

IEE Proceedings - Science, Measurement and Technology, 2004
Micromachined two-gap widely tunable capacitors have been fabricated with a tuning ratio of 7.3:1. The design presented requires sub-micron air gaps to enable low voltage operation and to reduce electrode curvature during operation. Photoresist and titanium have been evaluated for use as sacrificial layers in these devices.
A.J. Gallant, D. Wood
openaire   +1 more source

Tip‐based Lithography with a Sacrificial Layer

Small
AbstractThe fabrication of a highly controlled gold (Au) nanohole (NH) array via tip‐based lithography is improved by incorporating a sacrificial layer—a tip‐crash buffer layer. This inclusion mitigates scratches during the nano‐indentation process by employing a 300 nm thick poly(methyl methacrylate) layer as a sacrificial layer on top of the Au film.
Jeong‐Sik Jo   +3 more
openaire   +2 more sources

Application of porous silicon as a sacrificial layer

Sensors and Actuators A: Physical, 1994
Abstract Using porous silicon as a sacrificial layer a surface micromachining (SMM) process with a large distance from the structure to the substrate is realized. The application of this process for making free standing structures of polysilicon and flow channels is described.
W. Lang   +5 more
openaire   +1 more source

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