Results 151 to 160 of about 11,186 (164)
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Fabrication of metal–oxide–semiconductor devices with extreme ultraviolet lithography
Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena, 1996Hu C, Tennant D M, Bokor J
exaly
Lithography : Manufacturing Technologies in Semiconductor Device
Journal of the Society of Mechanical Engineers, 1986openaire +1 more source
Improved particle control for high volume semiconductor manufacturing for nanoimprint lithography
Proceedings of SPIE, 2017Yukio Takabayashi
exaly
Lithography reticle scheduling in semiconductor manufacturing
Engineering OptimizationChia-Yen Lee
exaly
EL-3 application to 0.5 μm semiconductor lithography
Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena, 1983exaly
Measuring flare in semiconductor lithography
2006ZIGER DAVID, ZIEBOLD RALF, GOODWIN FRANK
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System and apparatus for lithography in semiconductor fabrication
2023WU CHENG-KUAN +3 more
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Sub-100 nm KrF lithography for complementary metal–oxide–semiconductor circuits
Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena, 1999exaly
Semiconductor technology roadmaps and lithography implications
Advances in Patterning Materials and Processes XLIIKarey Holland, Steven P. Holland
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